公开(公告)号：US20090126571A1

公开(公告)日：2009-05-21

申请号：US12270925

申请日：2008-11-14

申请人： Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Taku Hirakawa ,  Hiroyuki Shimada

发明人： Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Taku Hirakawa ,  Hiroyuki Shimada

IPC分类号： B01D53/22

CPC分类号： F26B17/1441 ,  F26B9/063

摘要： A particulate material processing apparatus has a vessel and a processing tank. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The upper part of the processing tank has lower gas permeability than the lower part of the processing tank.

摘要翻译： 颗粒材料处理装置具有容器和处理槽。 容器具有用于将颗粒材料装入容器中的装料口。 处理槽接收从充电口充入的颗粒物质。 处理槽的形状使得朝向底部变窄。 处理槽的至少下部由透气材料制成，其允许用于处理颗粒材料的处理气体通过。 处理槽的上部具有比处理槽下部低的透气性。

公开(公告)号：US20090126217A1

公开(公告)日：2009-05-21

申请号：US12272003

申请日：2008-11-17

申请人： Taku Hirakawa ,  Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Hiroyuki Shimada

发明人： Taku Hirakawa ,  Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Hiroyuki Shimada

IPC分类号： F26B19/00 ,  F26B25/06 ,  F26B3/02

CPC分类号： F26B17/1441 ,  F26B9/063

摘要： A particulate material processing apparatus has a vessel, a processing tank, and a dispersing member. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The dispersing member is disposed below the charging port. The dispersing member disperses and flattens the particulate material on the processing tank.

摘要翻译： 颗粒材料处理装置具有容器，处理槽和分散构件。 容器具有用于将颗粒材料装入容器中的装料口。 处理槽接收从充电口充入的颗粒物质。 处理槽的形状使得朝向底部变窄。 处理槽的至少下部由透气材料制成，其允许用于处理颗粒材料的处理气体通过。 分散构件设置在充电口下方。 分散构件将颗粒材料分散并平坦化在处理槽上。

公开(公告)号：US08007736B2

公开(公告)日：2011-08-30

申请号：US12272003

申请日：2008-11-17

申请人： Taku Hirakawa ,  Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Hiroyuki Shimada

发明人： Taku Hirakawa ,  Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Hiroyuki Shimada

IPC分类号： B01J8/08 ,  B01J19/00 ,  B01J8/18 ,  F27B15/00

CPC分类号： F26B17/1441 ,  F26B9/063

摘要： A particulate material processing apparatus has a vessel, a processing tank, and a dispersing member. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The dispersing member is disposed below the charging port. The dispersing member disperses and flattens the particulate material on the processing tank.

摘要翻译： 颗粒材料处理装置具有容器，处理槽和分散构件。 容器具有用于将颗粒材料装入容器中的装料口。 处理槽接收从充电口充入的颗粒物质。 处理槽的形状使得朝向底部变窄。 处理槽的至少下部由透气材料制成，其允许用于处理颗粒材料的处理气体通过。 分散构件设置在充电口下方。 分散构件将颗粒材料分散并平坦化在处理槽上。

公开(公告)号：US08157899B2

公开(公告)日：2012-04-17

申请号：US12270925

申请日：2008-11-14

申请人： Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Taku Hirakawa ,  Hiroyuki Shimada

发明人： Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Taku Hirakawa ,  Hiroyuki Shimada

IPC分类号： B01D53/22 ,  B01J8/18 ,  B01J19/00

CPC分类号： F26B17/1441 ,  F26B9/063

摘要： A particulate material processing apparatus has a vessel and a processing tank. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The upper part of the processing tank has lower gas permeability than the lower part of the processing tank.

摘要翻译： 颗粒材料处理装置具有容器和处理槽。 容器具有用于将颗粒材料装入容器中的装料口。 处理槽接收从充电口充入的颗粒物质。 处理槽的形状使得朝向底部变窄。 处理槽的至少下部由透气材料制成，其允许用于处理颗粒材料的处理气体通过。 处理槽的上部具有比处理槽下部低的透气性。

公开(公告)号：US12038705B2

公开(公告)日：2024-07-16

申请号：US18060566

申请日：2022-11-30

申请人： Yuusuke Furuichi ,  Hiroyuki Shimada ,  Yukimichi Someya

发明人： Yuusuke Furuichi ,  Hiroyuki Shimada ,  Yukimichi Someya

IPC分类号： G03G15/20

CPC分类号： G03G15/2053 ,  G03G15/2028 ,  G03G15/2064 ,  G03G2215/2038

摘要： A nip forming device includes an endless belt that is flexible and rotates and a nip former that is disposed opposite an inner circumferential face of the endless belt. A pressure rotator presses against the nip former via the endless belt to form a nip between the endless belt and the pressure rotator, through which a conveyed object is conveyed. A separator is disposed downstream from the nip in a conveyance direction of the conveyed object. The separator separates the conveyed object from the endless belt. The separator includes a non-contact portion separated from the endless belt and a contact portion that contacts the endless belt. The contact portion retains a gap having a predetermined size between the non-contact portion and the endless belt.

公开(公告)号：US20230408959A1

公开(公告)日：2023-12-21

申请号：US18329201

申请日：2023-06-05

申请人： Yukimichi SOMEYA ,  Yuusuke Furuichi ,  Tomoya Adachi ,  Hiroyuki Shimada

发明人： Yukimichi SOMEYA ,  Yuusuke Furuichi ,  Tomoya Adachi ,  Hiroyuki Shimada

IPC分类号： G03G15/20

CPC分类号： G03G15/2053 ,  G03G15/2028

摘要： A fixing device includes a first rotator, a second rotator, a heater, a nip formation pad, and a separator. The second rotator contacts an outer circumferential surface of the first rotator to form a nip between the first rotator and the second rotator. The heater includes a resistive heat generator to heat the first rotator. The nip formation pad contacts an inner circumferential surface of the first rotator to form the nip. The separator separates a recording medium passing through the nip from the first rotator. The separator includes a separating surface and a contact. The separating surface is separated from the outer circumferential surface of the first rotator and separates the recording medium from the first rotator. The contact contacts the outer circumferential surface of the first rotator at a position where the first rotator is pinchable between the contact and the nip formation pad.

公开(公告)号：US10884365B2

公开(公告)日：2021-01-05

申请号：US16736876

申请日：2020-01-08

申请人： Hiroyuki Shimada

发明人： Hiroyuki Shimada

IPC分类号： G03G15/20

摘要： A fixing device includes an endless fixing rotator, a heater, a nip formation pad, and a pressure rotator. The heater is disposed opposite an inner circumferential surface of the fixing rotator to heat the fixing rotator. The nip formation pad is disposed opposite the inner circumferential surface of the fixing rotator that is slidable over the nip formation pad. The pressure rotator is configured to press against the nip formation pad via the fixing rotator to form a fixing nip through which a recording medium bearing a toner image is conveyed while being sandwiched between the fixing rotator and the pressure rotator. The nip formation pad includes a base and a thermal equalizer having a thermal conductivity higher than a thermal conductivity of the base. The nip formation pad has a nip face opposite the fixing nip. The thermal equalizer is disposed in at least part of the nip face.

公开(公告)号：US10261432B2

公开(公告)日：2019-04-16

申请号：US15451539

申请日：2017-03-07

申请人： Toshiyuki Kabata ,  Hiroyuki Shimada ,  Takeshi Shibuya

发明人： Toshiyuki Kabata ,  Hiroyuki Shimada ,  Takeshi Shibuya

IPC分类号： G03G9/087 ,  G03G15/20

摘要： An ester wax is provided. The ester wax includes a long-chain aliphatic ester represented by the following formula: R—COO—R′ wherein R represents an alky group having 13 to 23 carbon atoms and R′ represents an alkyl group having 18 to 22 carbon atoms. The ester wax further includes an aliphatic alcohol having 18 to 22 carbon atoms in an amount less than 3% by mass based on a total mass of the ester wax.

公开(公告)号：US10162283B2

公开(公告)日：2018-12-25

申请号：US15647393

申请日：2017-07-12

申请人： Hiroyuki Shimada ,  Toshiyuki Kabata ,  Takashi Fujita ,  Hiroshi Seo

发明人： Hiroyuki Shimada ,  Toshiyuki Kabata ,  Takashi Fujita ,  Hiroshi Seo

IPC分类号： G03G15/05 ,  G03G15/00 ,  G03G15/06 ,  G03G21/20 ,  H01T23/00

摘要： An image forming apparatus includes an exhaust duct to guide air inside the image forming apparatus to an outside of the image forming apparatus. A positive ion generator emits a positive ion into the exhaust duct. A negative ion generator emits a negative ion into the exhaust duct. The negative ion generator is shifted from the positive ion generator in one of an air flow direction of the air moving inside the exhaust duct and a direction perpendicular to the air flow direction.

公开(公告)号：US08906487B2

公开(公告)日：2014-12-09

申请号：US13173646

申请日：2011-06-30

申请人： Hiroyuki Shimada

发明人： Hiroyuki Shimada

IPC分类号： B32B3/24 ,  B32B3/30 ,  C30B25/02 ,  C30B25/04 ,  C30B25/18 ,  H01L21/20 ,  H01L21/205 ,  C30B29/36 ,  H01L21/02 ,  C30B29/06

CPC分类号： C30B29/06 ,  C30B25/02 ,  C30B29/36 ,  H01L21/02381 ,  H01L21/0243 ,  H01L21/02488 ,  H01L21/02494 ,  H01L21/02529 ,  H01L21/02639 ,  H01L21/0265 ,  Y10S117/913 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24612

摘要： In a base material with a single-crystal silicon carbide film according to an embodiment of the invention, a plurality of recessed portions is formed on the surface of a silicon substrate, an insulating film including silicon oxide is formed across the surface of the silicon substrate including the inner surfaces of the recessed portions, the top surfaces of side wall portions of recessed portions of the insulating film form flat surfaces, a single-crystal silicon carbide film is joined on the flat surfaces, and the recessed portions below the single-crystal silicon carbide film form holes.

摘要翻译： 在根据本发明的实施方案的具有单晶碳化硅膜的基材中，在硅衬底的表面上形成多个凹部，在硅衬底的表面上形成包括氧化硅的绝缘膜 包括凹部的内表面，绝缘膜的凹部的侧壁部的顶面形成平坦面，在平坦面上接合单晶碳化硅膜，并且单晶的下方的凹部 碳化硅膜形成孔。