PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    74.
    发明申请
    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME 审中-公开
    用于制造包含层的工艺和材料及其制品

    公开(公告)号:US20130323880A1

    公开(公告)日:2013-12-05

    申请号:US13981327

    申请日:2012-02-10

    IPC分类号: H01L51/00

    摘要: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of developed priming layer, wherein the pattern of developed priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of developed priming layer on the first layer. The priming material has at least one unit of Formula I In Formula I: R1 through R6 are D, alkyl, aryl, or silyl, where adjacent R groups can join together to form an aromatic ring; X is a single bond, H, D, or a leaving group; Y is H, D, alkyl, aryl, silyl, or vinyl; a-f are an integer from 0-4; m, p and q are an integer of 0 or greater.

    摘要翻译: 提供了一种用于在第一层上形成包含的第二层的方法,包括以下步骤:形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层,导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层,从而产生具有显影起泡层图案的第一层,其中显影起始层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的显影起始层的图案上的液体沉积形成第二层。 起始材料具有式I中至少一个单元。在式I中:R 1至R 6为D,烷基,芳基或甲硅烷基,其中相邻的R基团可以连接在一起形成芳环; X是单键,H,D或离去基团; Y是H,D,烷基,芳基,甲硅烷基或乙烯基; a-f是0-4的整数; m,p和q是0以上的整数。

    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    75.
    发明申请
    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME 审中-公开
    用于制造包含层的工艺和材料及其制品

    公开(公告)号:US20130248848A1

    公开(公告)日:2013-09-26

    申请号:US13990812

    申请日:2011-12-19

    IPC分类号: H01L51/00

    摘要: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. The priming material has Formula I In Formula I: Ar1 through Ar4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is the same or different at each occurrence and is D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group, where adjacent R1 groups can be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and in an integer from 0-4; and n is an integer greater than 0.

    摘要翻译: 提供了一种用于在第一层上形成包含的第二层的方法,包括以下步骤:形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层,导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层,从而产生具有起泡层图案的第一层,其中底漆层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的起动层的图案上的液体沉积形成第二层。 起始材料具有式I在式I中:Ar 1至Ar 4相同或不同,为芳基; L是螺基,金刚烷基,双环环己基,氘代类似物或其取代衍生物; R 1在每次出现时相同或不同,为D,F,烷基,芳基,烷氧基,甲硅烷基或可交联基团,其中相邻的R 1基团可以连接在一起形成芳环; R2在每次出现时相同或不同,为H,D或卤素; a在每次出现时相同或不同,整数为0-4; 并且n是大于0的整数。