公开(公告)号：US06909492B2

公开(公告)日：2005-06-21

申请号：US10412258

申请日：2003-04-14

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B17/08 ,  G02B13/18 ,  G02B27/18 ,  G03B21/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70275 ,  G03B21/006

摘要： Disclosed is a projection optical system having relatively large image-side numerical aperture and projection field and being excellent in mechanical stability in respect of vibrations, and the like. The projection optical system includes a first image-forming optical system for forming a first intermediate image of a first surface (R), a second image-forming optical system having a concave reflective mirror and for forming a second intermediate image based on a radiation beam from the first intermediate image, and a third image-forming optical system for forming a final image on a second surface based on a radiation beam from the second intermediate image. Then, predetermined conditional expressions are satisfied with regard to a clear aperture diameter of the concave reflective mirror, a distance (L) between the first surface and the second surface, and a distance (H) between the concave reflective mirror and a reference optical axis.

摘要翻译： 公开了具有相对大的图像侧数值孔径和投影场的投影光学系统，并且在振动方面的机械稳定性优异等。 投影光学系统包括用于形成第一表面（R）的第一中间图像的第一图像形成光学系统，具有凹面反射镜的第二图像形成光学系统，并且用于基于辐射束形成第二中间图像 以及第三图像形成光学系统，用于基于来自第二中间图像的辐射束在第二表面上形成最终图像。 然后，关于凹面反射镜的透明孔径，第一表面和第二表面之间的距离（L）以及凹面反射镜与参考光轴之间的距离（H），满足预定条件表达式 。

公开(公告)号：US06844982B2

公开(公告)日：2005-01-18

申请号：US10421737

申请日：2003-04-24

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B13/18 ,  G02B1/02 ,  G02B13/24 ,  G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B3/00

CPC分类号： G02B17/0892 ,  G02B1/02 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70958 ,  G03F7/70966

摘要： A projection optical system includes a plurality of light-transmissive members and projects an image of a first surface onto a second surface. The projection optical system includes a light-transmissive crystal member made of crystal material. At least one of the light-transmissive crystal members satisfies 0.3

摘要翻译： 投影光学系统包括多个透光构件，并且将第一表面的图像投影到第二表面上。 投影光学系统包括由晶体材料制成的透光晶体构件。 透光性晶体构件中的至少一个满足透光晶体构件的透明孔径由ED表示，并且透光晶体构件的外径由LD表示。

公开(公告)号：US06674513B2

公开(公告)日：2004-01-06

申请号：US10252427

申请日：2002-09-24

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G03B2754

CPC分类号： G03F7/70883 ,  G02B13/143 ,  G02B13/18 ,  G02B13/22 ,  G02B13/24 ,  G03F7/70241 ,  G03F7/70741 ,  G03F7/70958

摘要： A dioptric projection optical system for imaging a reduced image of a pattern on a first surface onto a second surface using radiation-transmitting refractors. The projection optical system has a front lens unit of a positive refracting power and a rear lens unit of a positive refracting power. An aperture stop is located in the vicinity of a rear focal point of the front lens unit.

摘要翻译： 一种折射投影光学系统，用于使用辐射透射折射体将第一表面上的图案的缩小图像成像到第二表面上。 投影光学系统具有正折射率的前透镜单元和正折射率的后透镜单元。 孔径光阑位于前透镜单元的后焦点附近。

公开(公告)号：US06661499B2

公开(公告)日：2003-12-09

申请号：US10226347

申请日：2002-08-23

申请人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

发明人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

IPC分类号： G03B2772

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70566

摘要： A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

公开(公告)号：US06639734B2

公开(公告)日：2003-10-28

申请号：US10140169

申请日：2002-05-08

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B1700

CPC分类号： G02B17/0892 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225

摘要： The object of the present invention is to provide a catadioptric imaging system, or the like, which is capable of obtaining a desired image-side NA and an image circle without increasing the size of a reflecting mirror with a smaller number of lenses. This catadioptric imaging system comprises a first imaging optical system and a second imaging optical system, wherein the first imaging optical system is provided with a positive first lens group, an aperture stop, and a positive second lens group in the order from the object side, and the second imaging optical system is provided with a primary mirror comprising a concave first reflecting surface having a first radiation transmitting portion at the center thereof, and a secondary mirror comprising a second reflecting surface having a second radiation transmitting portion at the center thereof. In this case, all of the refracting members for constituting the optical system is formed of the same optical material, or at least one of the refracting surfaces and the reflecting surfaces is formed to be aspherical, or a refracting member is disposed to be separated from the first reflecting surface or the second reflecting surface.

公开(公告)号：US06606144B1

公开(公告)日：2003-08-12

申请号：US10252426

申请日：2002-09-24

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G03B2742

CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B13/18 ,  G02B13/22 ,  G02B13/24 ,  G03F7/70741 ,  G03F7/70883

摘要： A projection exposure method and apparatus and method of fabricating a projection exposure apparatus that has an illumination optical system for supplying exposure light of a wavelength of not more than 200 nm to the projection master and a projection optical system for forming an image of a pattern on the projection master. The projection optical system has a front lens unit of a positive refracting power and a rear lens unit of a positive refracting power. An aperture stop is located in the vicinity of a rear focal point of the front lens unit.

摘要翻译： 一种投影曝光方法及其制造方法，该投影曝光装置具有用于向投影母版提供波长不大于200nm的曝光光的照明光学系统和用于形成图案的图像的投影光学系统 投影大师。 投影光学系统具有正折射率的前透镜单元和正折射率的后透镜单元。 孔径光阑位于前透镜单元的后焦点附近。

公开(公告)号：US06466303B1

公开(公告)日：2002-10-15

申请号：US09330442

申请日：1999-06-11

申请人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

发明人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70566

摘要： A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

摘要翻译： 一种投影曝光装置（10），用于将存在于诸如光罩（R）的第一物体上的图案的图像形成在诸如晶片（W）的第二物体上。 该装置包括沿着三个光轴（AZ1，AX，AZ2），能够以部分偏振光照射掩模版的照明光学系统，以及布置在掩模版附近并与照明光学系统相对的反射折射投射光学系统（40-70） 。 反折射投影光学系统包括一个或多个基本上为球面的反射镜（48），多个折射构件（42,48,72,74）和一个或多个平面镜（60,66）。 平面镜被设计和布置为允许在晶片上形成用部分偏振光照射的标线图案的基本非偏振图像。

公开(公告)号：US06208473B1

公开(公告)日：2001-03-27

申请号：US09070536

申请日：1998-04-30

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B1700

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225

摘要： A catadioptric projection lens comprising a first lens group (G1) disposed along a first optical axis (16a), a mirror (18) which creates a second optical axis (16b), a beam splitter (20) which creates a third optical axis (16c), a second lens group (G2) including a concave mirror (L22) disposed along the third optical axis on one side of the beam splitter, and a third lens group (G3) disposed along the third optical axis on the side of the beam splitter. The first and third optical axes are parallel, a configuration which reduces aberrations arising from gravitational deformation of the lens elements, when the first and third axes are aligned with the direction of gravity.

摘要翻译： 一种反射折射投影透镜，包括沿着第一光轴（16a）设置的第一透镜组（G1），产生第二光轴（16b）的反射镜（18），产生第三光轴的分束器（20） 16c），包括沿着分束器一侧的第三光轴设置的凹面镜（L22）的第二透镜组（G2）和沿着第三透镜组（G3）的第三透镜组 分束器。 第一和第三光轴是平行的，这是当第一和第三轴与重力方向对准时减少由于透镜元件的重力变形引起的像差的构造。

公开(公告)号：US6069749A

公开(公告)日：2000-05-30

申请号：US152532

申请日：1998-09-14

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B17/00

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70358

摘要： A catadioptric reduction optical system capable of imaging an object by scanning in a scanning direction. The system comprises, objectwise to imagewise, a first optical system, a beam splitter, and a second optical system arranged adjacent the beam splitter opposite the image side thereof. The second optical system includes at least one concave mirror. The system also includes a third optical system arranged adjacent said beam splitter imagewise thereof, an aperture stop, and a fourth optical system having positive refractive power. The third and fourth optical systems include a plurality of lens elements preferably comprising of at least two glass types for facilitating the correction of aberrations. The system is designed such that the beam splitter is of a practical size, while allowing for a suitable working distance on the image side, a large numerical aperture, and sub-quarter micron resolution in the ultraviolet wavelength range.

摘要翻译： 能够通过扫描方向进行扫描而成像物体的反折射减少光学系统。 该系统包括对象成像的第一光学系统，分束器和与分束器相邻的分束器相邻设置的第二光学系统。 第二光学系统包括至少一个凹面镜。 该系统还包括与其成像的分束相邻布置的第三光学系统，孔径光阑和具有正屈光力的第四光学系统。 第三和第四光学系统包括多个透镜元件，优选地包括至少两种玻璃类型，以便于校正像差。 该系统被设计成使得分束器具有实际尺寸，同时允许在图像侧具有合适的工作距离，大的数值孔径和在紫外线波长范围内的亚四分之一微米的分辨率。

公开(公告)号：US5969802A

公开(公告)日：1999-10-19

申请号：US88140

申请日：1998-06-01

申请人： Tetsuo Takahashi ,  Shigeo Mizoroke ,  Yasuhiro Omura

发明人： Tetsuo Takahashi ,  Shigeo Mizoroke ,  Yasuhiro Omura

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  H05K3/00 ,  G03B27/54 ,  G03B27/42 ,  G03B9/60

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70858

摘要： An exposure apparatus for transferring a pattern on a mask (M) onto a photosensitive substrate (W) via a projection-optical system can reduce gas fluctuation even if the length of the optical path through gas is relatively long, and even if the diameter of light flux through the gas is relatively large.The projection-optical system satisfies the condition ##EQU1## where .lambda. is a wavelength of exposure light used in the apparatus, .SIGMA.i is a summary of gas sections i in an optical path from the mask to the photosensitive substrate, Li is a length of a gas section i along the optical axis, in m, and Ri is an average of a mask-side diameter and a substrate-side diameter of a light flux in each gas section, the light flux emerging from a maximum image height and advancing within meridional plane, wherein at least one gas section i is filled with helium or neon.

摘要翻译： 用于通过投影光学系统将掩模（M）上的图案转印到感光基板（W）上的曝光装置即使通过气体的光路的长度相对较长也能够减小气体波动，并且即使直径 通过气体的光通量比较大。 投影光学系统满足λ是装置中使用的曝光光的波长的条件，SIGMA i是从掩模到感光基板的光路中的气体部分i的总结，Li是气体截面的长度 i沿着光轴，以m为单位，Ri是每个气体部分中的光通量的掩模侧直径和基板侧直径的平均值，从最大图像高度出现并在子午面内前进的光通量， 其中至少一个气体部分i填充有氦或氖。