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    Projection exposure apparatus with a catadioptric projection optical system
    2.
    发明授权
    Projection exposure apparatus with a catadioptric projection optical system 失效
    具有反射折射投影光学系统的投影曝光装置

    公开(公告)号：US06466303B1

    公开(公告)日：2002-10-15

    申请号：US09330442

    申请日：1999-06-11

    申请人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

    发明人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

    IPC分类号： G03B2754

    CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70566

    摘要： A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

    摘要翻译： 一种投影曝光装置（10），用于将存在于诸如光罩（R）的第一物体上的图案的图像形成在诸如晶片（W）的第二物体上。 该装置包括沿着三个光轴（AZ1，AX，AZ2），能够以部分偏振光照射掩模版的照明光学系统，以及布置在掩模版附近并与照明光学系统相对的反射折射投射光学系统（40-70） 。 反折射投影光学系统包括一个或多个基本上为球面的反射镜（48），多个折射构件（42,48,72,74）和一个或多个平面镜（60,66）。 平面镜被设计和布置为允许在晶片上形成用部分偏振光照射的标线图案的基本非偏振图像。

    Projection optical system, exposure apparatus, and exposure method
    3.
    发明授权
    Projection optical system, exposure apparatus, and exposure method 有权
    投影光学系统，曝光装置和曝光方法

    公开(公告)号：US06768537B2

    公开(公告)日：2004-07-27

    申请号：US10417120

    申请日：2003-04-17

    申请人： Takeshi Suzuki ,  Hideki Komatsuda ,  Yasuhiro Omura

    发明人： Takeshi Suzuki ,  Hideki Komatsuda ,  Yasuhiro Omura

    IPC分类号： G03B2748

    CPC分类号： G03F7/70941 ,  G03B27/48

    摘要： A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern around the dark pattern is projected onto the second plane, an average illuminance in a area where a projected image of the dark pattern is formed in the second plane is 8 or less, where an illuminance of an image of the light pattern around the dark pattern in the second plane is set to be 100.

    摘要翻译： 一种投影光学系统，用于在短于200nm的波长区域中使用曝光光将第一平面中的图案的图像形成到第二平面上。 当放置在第一平面中并且具有暗图案和围绕暗图案的光图案的投影图案被投影到第二平面上时，在第二平面中形成暗图案的投影图像的区域中的平均照度为 8或更小，其中在第二平面中暗图案周围的光图案的图像的照度设置为100。

    Production method of projection optical system
    6.
    发明授权
    Production method of projection optical system 失效
    投影光学系统的制作方法

    公开(公告)号：US06788389B2

    公开(公告)日：2004-09-07

    申请号：US10191428

    申请日：2002-07-10

    申请人： Youhei Fujishima ,  Hironori Ikezawa ,  Toshihiko Ozawa ,  Yasuhiro Omura ,  Takeshi Suzuki

    发明人： Youhei Fujishima ,  Hironori Ikezawa ,  Toshihiko Ozawa ,  Yasuhiro Omura ,  Takeshi Suzuki

    IPC分类号： G03B2754

    CPC分类号： G03F7/70241 ,  C30B11/00 ,  C30B29/12 ,  G03F7/705 ,  G03F7/706 ,  G03F7/70966 ,  G03F7/70975

    摘要： A projection optical system in which an image of a first surface is projected onto a second surface based on a light beam having a predetermined wavelength. The projection optical system having at least one isometric system refractive member made of an isometric system crystal material. The isometric system crystal material transmits a light beam having the predetermined wavelength. The projection optical system also has an amorphous refractive member made of an amorphous material for compensating deterioration of optical performance due to intrinsic birefringence of the isometric system refractive member.

    摘要翻译： 一种投影光学系统，其中基于具有预定波长的光束将第一表面的图像投影到第二表面上。 投影光学系统具有至少一个等距系统折射构件，其由等轴系统晶体材料制成。 等轴系统晶体材料透射具有预定波长的光束。 投影光学系统还具有由非晶材料制成的非晶折射构件，用于补偿等距系统折射构件的固有双折射引起的光学性能劣化。

    Optical system, exposure system, and exposure method
    7.
    发明授权
    Optical system, exposure system, and exposure method 失效
    光学系统，曝光系统和曝光方法

    公开(公告)号：US08339578B2

    公开(公告)日：2012-12-25

    申请号：US12656637

    申请日：2010-02-05

    申请人： Yasuhiro Omura

    发明人： Yasuhiro Omura

    IPC分类号： G02B5/30 ,  G02B27/28 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

    CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G02B27/28 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70566 ,  G03F7/70966

    摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.

    摘要翻译： 基于简单的配置，光学系统能够在抑制光量损失的同时实现透镜孔中的基本方位极化状态。 本发明的光学系统设置有用于实现基本圆周分布或基本上径向分布作为透镜孔径中的快轴分布的双折射元件，以及位于双折射元件后面并适于旋转偏振状态的旋转器 在镜头光圈。 双折射元件具有由单轴晶体材料制成的光学透明构件，其晶轴基本上与光学系统的光轴平行。 呈基本圆形极化状态的大致球形的光束入射到光学透明构件。

    Exposure method, exposure apparatus and device manufacturing method
    8.
    发明授权
    Exposure method, exposure apparatus and device manufacturing method 有权
    曝光方法，曝光装置和装置制造方法

    公开(公告)号：US08253924B2

    公开(公告)日：2012-08-28

    申请号：US11919669

    申请日：2006-05-23

    申请人： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

    发明人： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

    IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70341 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70558

    摘要： An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.

    摘要翻译： 曝光装置设置有包括液体的光学系统，用于获取入射在液体上的能量束的能量信息的传感器系统，以及控制器，其预测由于能量而包括液体的光学系统的光学特性的变化 基于使用传感器系统获取的能量信息来吸收液体，并且基于预测结果控制相对于物体的曝光操作。 根据曝光装置，不会受到由液体的能量吸收引起的包括液体的光学系统的光学特性的变化的影响的曝光操作成为可能。

    Exposure apparatus, exposure method, and method for producing device
    9.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权
    曝光装置，曝光方法和制造装置的方法

    公开(公告)号：US08208119B2

    公开(公告)日：2012-06-26

    申请号：US10588297

    申请日：2005-02-03

    申请人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

    发明人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/7075 ,  G03F7/70891

    摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).

    摘要翻译： 曝光装置（EX）通过液体（LQ）在基板（P）上照射曝光光（EL）而曝光基板（P）。 曝光装置（EX）具有用于保持基板（P）的基板保持器（PH），能够移动由基板保持件（PH）保持的基板（P）的基板台（PST）和温度调节系统 60），用于调节衬底保持器（PH）的温度。 控制基板（P）的温度，使得基板（P）和液体（LQ）之间的温度没有差异，从而防止由液体（LQ）的温度变化引起的曝光精度的降低。

    Projection optical system, exposure apparatus, exposure system, and exposure method
    10.
    发明授权
    Projection optical system, exposure apparatus, exposure system, and exposure method 有权
    投影光学系统，曝光装置，曝光系统和曝光方法

    公开(公告)号：US08009271B2

    公开(公告)日：2011-08-30

    申请号：US11793402

    申请日：2005-12-09

    申请人： Yasuhiro Omura

    发明人： Yasuhiro Omura

    IPC分类号： G03B27/42

    CPC分类号： G02B26/0891 ,  G02B13/24 ,  G02B27/0068 ,  G03F7/70308

    摘要： A projection optical system PL for forming an image of a first plane M on a second plane P has at least one first wedge prism 4 each of an entrance surface and an exit surface of which has a plane and in which a predetermined first wedge angle is made between the plane of the entrance surface and the plane of the exit surface, and when a coordinate system is so defined that a Z-axis direction is set along a direction of a normal to the first plane M, an X-axis direction along a direction of an intersecting line between the plane of the entrance surface and the plane of the exit surface, and a Y-axis direction along a direction perpendicular to the Z-axis direction and the X-axis direction, the first wedge prism 4 is arranged rotatably substantially around the Y-axis direction.

    摘要翻译： 用于在第二平面P上形成第一平面M的图像的投影光学系统PL具有至少一个第一楔形棱镜4，每个第一楔形棱镜4的入射表面和出射表面具有平面，预定的第一楔形角 在入射面的平面与出射面的平面之间形成的坐标系，并且当沿着与第一平面M的法线方向设定Z轴方向的坐标系时，沿着X轴方向 入射面的平面和出射面的平面之间的交线的方向和沿着与Z轴方向和X轴方向垂直的方向的Y轴方向，第一楔形棱镜4是 基本上围绕Y轴方向可旋转地布置。