公开(公告)号：US5969802A

公开(公告)日：1999-10-19

申请号：US88140

申请日：1998-06-01

申请人： Tetsuo Takahashi ,  Shigeo Mizoroke ,  Yasuhiro Omura

发明人： Tetsuo Takahashi ,  Shigeo Mizoroke ,  Yasuhiro Omura

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  H05K3/00 ,  G03B27/54 ,  G03B27/42 ,  G03B9/60

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70858

摘要： An exposure apparatus for transferring a pattern on a mask (M) onto a photosensitive substrate (W) via a projection-optical system can reduce gas fluctuation even if the length of the optical path through gas is relatively long, and even if the diameter of light flux through the gas is relatively large.The projection-optical system satisfies the condition ##EQU1## where .lambda. is a wavelength of exposure light used in the apparatus, .SIGMA.i is a summary of gas sections i in an optical path from the mask to the photosensitive substrate, Li is a length of a gas section i along the optical axis, in m, and Ri is an average of a mask-side diameter and a substrate-side diameter of a light flux in each gas section, the light flux emerging from a maximum image height and advancing within meridional plane, wherein at least one gas section i is filled with helium or neon.

摘要翻译： 用于通过投影光学系统将掩模（M）上的图案转印到感光基板（W）上的曝光装置即使通过气体的光路的长度相对较长也能够减小气体波动，并且即使直径 通过气体的光通量比较大。 投影光学系统满足λ是装置中使用的曝光光的波长的条件，SIGMA i是从掩模到感光基板的光路中的气体部分i的总结，Li是气体截面的长度 i沿着光轴，以m为单位，Ri是每个气体部分中的光通量的掩模侧直径和基板侧直径的平均值，从最大图像高度出现并在子午面内前进的光通量， 其中至少一个气体部分i填充有氦或氖。

公开(公告)号：US06362926B1

公开(公告)日：2002-03-26

申请号：US09721956

申请日：2000-11-27

申请人： Yasuhiro Omura ,  Yutaka Ichihara ,  Tetsuo Takahashi

发明人： Yasuhiro Omura ,  Yutaka Ichihara ,  Tetsuo Takahashi

IPC分类号： G02B1700

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member(M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

摘要翻译： 本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。 光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统（A）形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。

公开(公告)号：US06757051B2

公开(公告)日：2004-06-29

申请号：US09883253

申请日：2001-06-19

申请人： Tetsuo Takahashi ,  Jin Nishikawa ,  Yasuhiro Omura

发明人： Tetsuo Takahashi ,  Jin Nishikawa ,  Yasuhiro Omura

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/0808 ,  G02B17/0856 ,  G02B27/18 ,  G03F7/70225

摘要： A projection optical system forms an image of an object in a first plane onto a second plane. The projection optical system has an optical element group including at least one refractive member and plural reflective members, and a plurality of lens-barrel units holding the optical element group divided into a plurality of respective groupings. The reflective members are all held by a single lens-barrel unit of the plurality of lens-barrels units.

摘要翻译： 投影光学系统将第一平面中的物体的图像形成到第二平面上。 投影光学系统具有包括至少一个折射构件和多个反射构件的光学元件组，以及保持被分成多个分组的光学元件组的多个透镜筒单元。 反射构件都由多个透镜筒单元中的单个镜筒单元保持。

公开(公告)号：US06639732B2

公开(公告)日：2003-10-28

申请号：US10310780

申请日：2002-12-06

申请人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li

发明人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li

IPC分类号： G02B1700

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

公开(公告)号：US5835284A

公开(公告)日：1998-11-10

申请号：US882939

申请日：1997-06-26

申请人： Tetsuo Takahashi ,  Yasuhiro Omura

发明人： Tetsuo Takahashi ,  Yasuhiro Omura

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275

摘要： A catadioptric optical system in which a first imaging optical system is constructed of a unidirectional optical apparatus which transmits outgoing light from a first plane in one direction only and a bidirectional optical apparatus for transmitting the light that enters and reflecting the same to form an interim image of the first plane. A light guide guides the light from the interim image to a second imaging optical system through which the interim image is reimaged on a second plane. The unidirectional optical apparatus has an optical axis and at least one lens movable along the optical axis.

摘要翻译： 一种反折射光学系统，其中第一成像光学系统由仅在一个方向上传输来自第一平面的出射光的单向光学装置和用于透射进入并反射其的光的双向光学装置形成临时图像 的第一架飞机。 光引导件将来自中间图像的光引导到第二成像光学系统，通过该第二成像光学系统在第二平面上再次成像临时图像。 单向光学装置具有光轴和至少一个可沿光轴移动的透镜。

公开(公告)号：US06195213B1

公开(公告)日：2001-02-27

申请号：US09328198

申请日：1999-06-08

申请人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li ,  Yutaka Ichihara

发明人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li ,  Yutaka Ichihara

IPC分类号： G02B1700

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

摘要翻译： 本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。 光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统（A）形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。

公开(公告)号：US5835275A

公开(公告)日：1998-11-10

申请号：US883748

申请日：1997-06-27

申请人： Tetsuo Takahashi ,  Yasuhiro Omura

发明人： Tetsuo Takahashi ,  Yasuhiro Omura

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/14 ,  G02B17/00

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/7025 ,  G03F7/70275

摘要： Catadioptric systems are provided, comprising a first imaging system, a plane mirror, and a second imaging system. The first imaging system comprises a single-pass optical system and a double-pass optical system that further comprises a concave mirror and a double-pass lens group. The second imaging system comprises a plane mirror and an aperture. The first imaging system forms an intermediate image of an object; the second imaging system re-images the intermediate image on a substrate. The catadioptric systems satisfy various conditions.

摘要翻译： 提供反射折射系统，包括第一成像系统，平面镜和第二成像系统。 第一成像系统包括单通光学系统和还包括凹面镜和双透镜组的双通光学系统。 第二成像系统包括平面镜和孔。 第一成像系统形成物体的中间图像; 第二成像系统将衬底上的中间图像重新图像。 反射折射系统满足各种条件。

公开(公告)号：US08339578B2

公开(公告)日：2012-12-25

申请号：US12656637

申请日：2010-02-05

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B5/30 ,  G02B27/28 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G02B27/28 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70566 ,  G03F7/70966

摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.

摘要翻译： 基于简单的配置，光学系统能够在抑制光量损失的同时实现透镜孔中的基本方位极化状态。 本发明的光学系统设置有用于实现基本圆周分布或基本上径向分布作为透镜孔径中的快轴分布的双折射元件，以及位于双折射元件后面并适于旋转偏振状态的旋转器 在镜头光圈。 双折射元件具有由单轴晶体材料制成的光学透明构件，其晶轴基本上与光学系统的光轴平行。 呈基本圆形极化状态的大致球形的光束入射到光学透明构件。

公开(公告)号：US08253924B2

公开(公告)日：2012-08-28

申请号：US11919669

申请日：2006-05-23

申请人： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

发明人： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70341 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70558

摘要： An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.

摘要翻译： 曝光装置设置有包括液体的光学系统，用于获取入射在液体上的能量束的能量信息的传感器系统，以及控制器，其预测由于能量而包括液体的光学系统的光学特性的变化 基于使用传感器系统获取的能量信息来吸收液体，并且基于预测结果控制相对于物体的曝光操作。 根据曝光装置，不会受到由液体的能量吸收引起的包括液体的光学系统的光学特性的变化的影响的曝光操作成为可能。

公开(公告)号：US08208119B2

公开(公告)日：2012-06-26

申请号：US10588297

申请日：2005-02-03

申请人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

发明人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/7075 ,  G03F7/70891

摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).

摘要翻译： 曝光装置（EX）通过液体（LQ）在基板（P）上照射曝光光（EL）而曝光基板（P）。 曝光装置（EX）具有用于保持基板（P）的基板保持器（PH），能够移动由基板保持件（PH）保持的基板（P）的基板台（PST）和温度调节系统 60），用于调节衬底保持器（PH）的温度。 控制基板（P）的温度，使得基板（P）和液体（LQ）之间的温度没有差异，从而防止由液体（LQ）的温度变化引起的曝光精度的降低。