Abstract:
An apparatus for melting and dispensing thermoplastic material is provided that includes an un-heated hopper having an inlet for receiving particles of a thermoplastic material and an outlet for discharging the particles and a heated manifold including at least one cavity formed therein and having an inlet and an outlet the inlet communicating with the outlet of the hopper for receipt of the particles from the hopper. The hopper is disposed external of the heated manifold. The heated manifold is effective for melting the particles into molten thermoplastic material therein. The apparatus further includes a pump having an inlet in fluid communication with the cavity. An outlet of the pump is in fluid communication with an inlet of a dispenser and an outlet of the dispenser is effective for dispensing the molten thermoplastic material therethrough.
Abstract:
The present invention provides an adhesive application apparatus that forms a uniform application layer when applying an adhesive to a sheet bundle for a various a length or a width of the sheet bundle. The apparatus includes an applying operation controlling device including a reference value storing device for previously setting and storing a preset reference value of an application length and/or an application width of the sheet bundle, a size recognizing device for identifying an application length and/or an application width of the adhesive applied to the sheet bundle, and an application region comparing device for comparing an identified value of the application length and/or the application width of the adhesive applied to the sheet bundle from the size recognizing device with a preset reference value of the application length and/or the application width of the sheet bundle from the reference value storing device.
Abstract:
A device for discharging a constant amount of a high-viscosity material, capable of accurately discharging the material even if the material is sent under high pressure. A device for discharging a constant amount of a high-viscosity material, provided with: a discharge unit (400) having a discharge opening which discharges the high-viscosity material; a holding unit (300) having a holding area which holds the high-viscosity material, a receiving opening which supplies the high-viscosity material to the holding area, and a delivery opening which delivers the high-viscosity material to the discharge unit; and a high-pressure supply pump (100) for supplying to the holding unit under a first pressure the high-viscosity material having been filled into a container. A liquid sending unit (200) having a pump mechanism and a valve mechanism is provided in the flow path for connecting the high-pressure supply pump (100) and the holding unit (300), and the liquid sending unit sends the high-viscosity material to the holding unit by a second pressure adjusted to a lower pressure than the first pressure.
Abstract:
A supply system for a chambered doctor blade assembly makes possible the sequential use of water-based and non-water-based coating materials through automated functions programmed in a PLC that controls the system. A pair of pneumatically driven diaphragm pumps serve as supply pump and return pump between the doctor blade chamber and a coating reservoir A PLC controls the pulse rate of pneumatic pressure to the pumps to control the rate of flow of the coating material into, and out of the doctor blade chamber. An ultrasonic sensor mounted detects the liquid level in the trough collection area. The PLC is programmed to modify the pulse rate of the supply pump and return pump to maintain the liquid level in the trough collection area above the drain thereof and below the maximum tolerance.
Abstract:
A die coater of the present invention includes: a replaceable-type paste container containing a paste inside thereof and including, in its upper surface, a paste ejection port for ejecting the paste; a buffer tank for storing the paste ejected from the paste ejection port; and a coat-layer formation portion for discharging the paste ejected from the buffer tank onto a substrate through a head to form a coat layer, wherein the paste container is placed such that the upper surface thereof is oriented more downwardly than a vertical plane, in order to cause the paste to be ejected from the paste ejection port due to its weight.
Abstract:
The automated system includes a fluid dispenser having an applicator tip which is used to apply a fluid to an object. A compliance mechanism is utilized to assist in maintaining the applicator tip of the fluid dispenser in contact with the object during the coating operation. A robot can be utilized to advance the object past the applicator tip during the coating operation. The fluid dispenser is mounted on a movable arm to allow the fluid dispenser to be moved or rotated into and away from the position where fluid is applied to the object. The automated system provides a fluid application system that can apply a precise and repeatable layer of fluid to an object. The use of the robot allows larger objects to be easily handled and for the coating process to be done in a rapid fashion. The automated system is flexible and can readily accommodate changes in the object that is to be coated or the configuration of the coating that is to be applied to the object.
Abstract:
Systems and methods are disclosed for an automatic and continuous supply of coating material to a coating applicator in optical fiber fabrication. The present invention switches from one coating reservoir to another by way of a transitional period in which both coating reservoirs are supplying coating material to the coating applicator. For example, while an in-use reservoir is supplying the coating material to the coating applicator, a standby reservoir is being filled, settled to off gas air bubbles and then slowly pressurized. A sized orifice is used to slowly bleed off pressure from the in-use reservoir at a rate that does not allow the pressure in the in-use reservoir from falling out of a desired pressure range. When the in-use reservoir is substantially emptied of coating material and the pressures in both reservoirs are substantially equalized, then both reservoirs simultaneously supply coating material to the coating applicator for a period of time before switching completely over to the standby reservoir.
Abstract:
The automated system includes a fluid dispenser having an applicator tip which is used to apply a fluid to an object. A compliance mechanism is utilized to assist in maintaining the applicator tip of the fluid dispenser in contact with the object during the coating operation. A robot can be utilized to advance the object past the applicator tip during the coating operation. The fluid dispenser is mounted on a movable arm to allow the fluid dispenser to be moved or rotated into and away from the position where fluid is applied to the object. The automated system provides a fluid application system that can apply a precise and repeatable layer of fluid to an object. The use of the robot allows larger objects to be easily handled and for the coating process to be done in a rapid fashion. The automated system is flexible and can readily accommodate changes in the object that is to be coated or the configuration of the coating that is to be applied to the object.
Abstract:
A process solution supplying mechanism for supplying a process solution to a wafer, comprises a source for containing the process solution, a pipe for introducing the process solution from the source to the wafer, a process solution supply driving system for supplying the process solution from the source to the wafer, and a process solution supplying/stopping mechanism for carrying out apply and stop of the process solution, wherein the pipe and the process solution supply driving system are provided separately and the process solution supplying/stopping mechanism is provided to a portion other than the pipe.
Abstract:
A process solution supplying mechanism for supplying a process solution to a wafer, comprises a source for containing the process solution, a pipe for introducing the process solution from the source to the wafer, a process solution supply driving system for supplying the process solution from the source to the wafer, and a process solution supplying/stopping mechanism for carrying out apply and stop of the process solution, wherein the pipe and the process solution supply driving system are provided separately and the process solution supplying/stopping mechanism is provided to a portion other than the pipe.