公开(公告)号：US1499456A

公开(公告)日：1924-07-01

申请号：US49079621

申请日：1921-08-08

Applicant: H S & S MFG CO

Inventor： HARTMANN RICHARD A

IPC: B23Q1/03

CPC classification number: B23Q1/03 ,  Y10T408/5616

公开(公告)号：US1426496A

公开(公告)日：1922-08-22

申请号：US45809121

申请日：1921-04-02

Applicant: CINCINNATI BICKFORD TOOL CO

Inventor： NORRIS HENRY M

IPC: B23Q1/03

CPC classification number: B23Q1/03

公开(公告)号：US20240351154A1

公开(公告)日：2024-10-24

申请号：US18645946

申请日：2024-04-25

Applicant: MetrologyWorks, Inc.

Inventor： Eric S. Becker ,  Joel R. Gorden

IPC: B23Q37/00 ,  B23Q1/03

CPC classification number: B23Q37/005 ,  B23Q1/032

Abstract: A modular fixture plate system includes fixture plates and docking stations for securing the fixture plates to a worksurface. Fixture plates include recessed corners for receiving keystones. A keystone may be used as a docking station in addition to or instead of a corresponding rail system. Fixture plates include magnets for providing a secure attachment to keystones, rails and other fixture plates to allow for rapid loading of parts and plates on any CMM or manufacturing system. Fixture plates are designed to be stacked multiple wide to fill the table and maximize coverage of a work surface. The keystone design allows a user to create L configurations or T configurations of plates from a single docking location.

公开(公告)号：US11969847B2

公开(公告)日：2024-04-30

申请号：US17325198

申请日：2021-05-19

Applicant: MetrologyWorks, Inc.

Inventor： Eric S. Becker ,  Joel R. Gorden

IPC: B23Q37/00 ,  B23Q1/03

CPC classification number: B23Q37/005 ,  B23Q1/032

Abstract: A modular fixture plate system includes fixture plates and docking stations for securing the fixture plates to a worksurface. Fixture plates include recessed corners for receiving keystones. A keystone may be used as a docking station in addition to or instead of a corresponding rail system. Fixture plates include magnets for providing a secure attachment to keystones, rails and other fixture plates to allow for rapid loading of parts and plates on any CMM or manufacturing system. Fixture plates are designed to be stacked multiple wide to fill the table and maximize coverage of a work surface. The keystone design allows a user to create L configurations or T configurations of plates from a single docking location.

公开(公告)号：US20240131646A1

公开(公告)日：2024-04-25

申请号：US18402270

申请日：2024-01-02

Applicant: Plöckl GmbH & Co. Industrieoptik KG

Inventor： Manfred PLÖCKL

IPC: B23Q1/03 ,  B23C1/12 ,  B23C9/00 ,  B23Q1/52 ,  B23Q1/62 ,  B23Q9/00 ,  B25H1/02

CPC classification number: B23Q1/032 ,  B23C1/12 ,  B23C9/00 ,  B23Q1/522 ,  B23Q1/623 ,  B23Q9/0085 ,  B25H1/02 ,  B23C1/20 ,  Y10T409/306608 ,  Y10T409/307672 ,  Y10T409/308176

Abstract: The invention relates to an interchangeable milling adapter (20) for a work table (60), which comprises a receptacle (21) for a milling machine (70) and an angular adjustment (22). At the same time, an angular position (WP1, WP2) of the receptacle (21) in relation to the work table can be adjusted using the angular adjustment (22). Furthermore, a work table, a milling unit and their use for adjusting a milling machine are described.

公开(公告)号：US20230381903A1

公开(公告)日：2023-11-30

申请号：US18323820

申请日：2023-05-25

Applicant: TDK CORPORATION

Inventor： Yohei SATO ,  Hiroshi KOIZUMI ,  Osamu SHINDO ,  Mitsuyoshi MAKIDA ,  Masashi MATSUMOTO

IPC: B23Q1/03

CPC classification number: B23Q1/032

Abstract: A substrate processing apparatus including a lower jig plate for arranging a substrate which is an object to be pressurized, columnar members supporting the lower jig plate, and a heat dissipating column contacting the lower jig plate directly or indirectly and having a higher heat dissipation property than the columnar members.

公开(公告)号：US20230207345A1

公开(公告)日：2023-06-29

申请号：US17561085

申请日：2021-12-23

Applicant: Applied Materials, Inc.

Inventor： Muhannad Mustafa ,  Mario D. Silvetti ,  Michael Jerry Duret ,  Sanjeev Baluja ,  Satish Radhakrishnan ,  Yuan Xiaoxiong

IPC: H01L21/67 ,  B23Q1/03

CPC classification number: H01L21/67103 ,  B23Q1/032

Abstract: Embodiments of the disclosure advantageously provide base plates with decreased metal contamination. Some embodiments of the disclosure advantageously provide base plates with increased edge purge channel uniformity. Some embodiments provide methods of forming base plates. Embodiments of the disclose are directed to a heater pedestal configured to support a substrate during processing. In some embodiments, the heater pedestal includes the base plate described herein.

公开(公告)号：US11673220B2

公开(公告)日：2023-06-13

申请号：US17468715

申请日：2021-09-08

Applicant: Ford Motor Company

Inventor： Erik Riha ,  Michael Dean Blodgett

IPC: B23Q17/22 ,  B23Q1/03 ,  B29C64/245 ,  B33Y80/00 ,  B33Y10/00

CPC classification number: B23Q17/2216 ,  B23Q1/032 ,  B23Q1/037 ,  B29C64/245 ,  B33Y10/00 ,  B33Y80/00

Abstract: A locating fixture includes an adjustable locating member for supporting and restraining a part. The adjustable locating member allows for rotational and translational adjustment for aligning to a particular part configuration. The adjustable locating member utilizes a plurality of indicia and a position indicator to assist in the alignment of the adjustable locating member to a desired position, which is then restrained at a desired position by a restraining element.

公开(公告)号：US20220331917A1

公开(公告)日：2022-10-20

申请号：US17723413

申请日：2022-04-18

Applicant: UTAC Headquarters Pte. Ltd.

Inventor： Enrique Sarile, JR. ,  Chee Kay Chow ,  Dzafir Bin Mohd Shariff

IPC: B23Q1/03 ,  H01L21/683 ,  H01J37/32

Abstract: A wafer adaptor ring assembly for adapting an adapted sized wafer for plasma dicing by a plasma etch chamber designed for dicing a designed sized wafer, which is larger than the adapted sized wafer is disclosed. The wafer adaptor ring assembly includes a primary wafer ring designed for plasma dicing the designed sized wafer by the plasma, an adhesive sheet attached to a bottom surface of the primary wafer ring, and an adapted sized wafer disposed on the adhesive sheet between the primary wafer ring and the adapted sized wafer. A method for forming the wafer adaptor ring assembly is also disclosed.

公开(公告)号：US11446777B2

公开(公告)日：2022-09-20

申请号：US16974135

申请日：2020-10-15

Applicant: Dennis Alan Darling

Inventor： Dennis Alan Darling

IPC: B23Q1/03 ,  A47B37/00 ,  A47B1/05 ,  A47B3/08 ,  A47B13/08

Abstract: A portable cutting table including a top having an upper portion and a lower portion and a table skirt secured to the lower portion of the top. The table includes folding leg assemblies, each having a pair of support legs. Each leg has a distal end defining a bevel having a predetermined angle, and a proximal end defining a compound curve including at least a first curve with a first radius of curvature and a second curve with a second radius of curvature. The first curve defines a notch in an outer face of the leg corresponding to the predetermined angle. The second curve has a midpoint and a center of curvature so the proximal end of each leg defines a pivot point located at least halfway between the midpoint and the center of curvature. Each support leg is pivotably connected at the pivot point to the table skirt.