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公开(公告)号：US20100149405A1
公开(公告)日：2010-06-17
申请号：US12629961
申请日：2009-12-03
申请人： Naoto NAKAHARA , Satoru YAMAGUCHI
发明人： Naoto NAKAHARA , Satoru YAMAGUCHI
CPC分类号： H04N5/232 , H04N5/23293 , H04N5/23296
摘要： A zoom adjustment system, comprising a touch panel, a course detector, and a first zoom adjuster, is provided. The touch panel has an input surface. The touch panel detects a certain location on the input surface when it is touched. The touch panel detects a touched location. The course detector detects a course traced on the input surface by the touched location when the touched location is moved about on the input surface while maintaining continuous contact with the input surface. The first zoom adjuster adjusts a magnification of a photographic optical system according to the traced course detected by the course detector.
摘要翻译： 提供了包括触摸面板，路线检测器和第一变焦调节器的变焦调整系统。 触摸面板具有输入面。 触摸面板在触摸时检测输入表面上的某个位置。 触摸屏检测到触摸的位置。 当触摸的位置在输入表面上移动时，路线检测器检测由触摸位置在输入表面上跟踪的路线，同时保持与输入表面的连续接触。 第一变焦调节器根据由行程检测器检测到的跟踪过程来调整摄影光学系统的放大倍数。
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公开(公告)号：US20100102224A1
公开(公告)日：2010-04-29
申请号：US12651209
申请日：2009-12-31
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
摘要翻译： 一种带电粒子束装置，用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息，测量从 样本和比较与不平坦表面的边缘部分相对应的轮廓波形。
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公开(公告)号：US07652249B2
公开(公告)日：2010-01-26
申请号：US11699065
申请日：2007-01-29
CPC分类号： G01N23/225 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
摘要翻译： 一种带电粒子束装置，用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息，测量从 样本和比较与不平坦表面的边缘部分相对应的轮廓波形。
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公开(公告)号：US07633063B2
公开(公告)日：2009-12-15
申请号：US11599611
申请日：2006-11-15
申请人： Atsushi Takane , Satoru Yamaguchi , Mitsugu Sato
发明人： Atsushi Takane , Satoru Yamaguchi , Mitsugu Sato
CPC分类号： H01J37/1471 , H01J37/265 , H01J2237/1501 , H01J2237/216 , H01J2237/28
摘要： A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.
摘要翻译： 提供一种带电粒子束装置，其可以防止由于图像质量的差异而导致的位置偏移检测的精度降低，使得即使当光学条件改变时带电粒子束的状态改变或光学条件改变时， 轴随时间变化，可以容易且高精度地实现光轴的自动调节。 在带电粒子束装置中，在用于光轴调节的对准偏转器的偏转状态改变之前进行聚焦的评估或调整，或者提供与对准偏转器的偏转条件相对应的焦点调整量表， 改变对准偏转器的偏转状态，根据该表进行焦点调整。
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公开(公告)号：US07504627B2
公开(公告)日：2009-03-17
申请号：US11878361
申请日：2007-07-24
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： G01N23/225
摘要： An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time of preparing a recipe to determine the inspection points and the order of inspection, the sequence of a series of inspection points sequentially inspected is changed to optimize the order of inspection. Not only the sequence which minimizes the covered distance is determined but also the order of inspection of the inspection points is optimized in accordance with the charged state, warping of the wafer, the delivery position and other situations.
摘要翻译： 公开了其中确定检查顺序以缩短检查时间的电子束检查装置。 通过最小化移动时间和检查时间的总和以及简单地优化覆盖距离来确定检查顺序。 在准备确定检验点和检验顺序的配方时，顺序检查的一系列检查点的顺序进行了更改，以优化检验顺序。 不仅确定了覆盖距离最小化的顺序，还根据充电状态，晶圆翘曲，输送位置等情况优化了检查点的检查顺序。
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公开(公告)号：US20070272860A1
公开(公告)日：2007-11-29
申请号：US11878361
申请日：2007-07-24
IPC分类号： G01N23/00
CPC分类号： G01N23/225
摘要： An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time of preparing a recipe to determine the inspection points and the order of inspection, the sequence of a series of inspection points sequentially inspected is changed to optimize the order of inspection. Not only the sequence which minimizes the covered distance is determined but also the order of inspection of the inspection points is optimized in accordance with the charged state, warping of the wafer, the delivery position and other situations.
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公开(公告)号：US07256400B2
公开(公告)日：2007-08-14
申请号：US11099688
申请日：2005-04-06
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： G01N23/225
摘要： An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing the covered distance. At the time of preparing a recipe to determine the inspection points and the order of inspection, the sequence of a series of inspection points sequentially inspected is changed to optimize the order of inspection. Not only the sequence which minimizes the covered distance is determined but also the order of inspection of the inspection points is optimized in accordance with the charged state, warping of the wafer, the delivery position and other situations.
摘要翻译： 公开了其中确定检查顺序以缩短检查时间的电子束检查装置。 通过最小化移动时间和检查时间的总和以及简单地优化覆盖距离来确定检查顺序。 在准备确定检验点和检验顺序的配方时，顺序检查的一系列检查点的顺序进行了更改，以优化检验顺序。 不仅确定了覆盖距离最小化的顺序，还根据充电状态，晶圆翘曲，输送位置等情况优化了检查点的检查顺序。
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公开(公告)号：US20060097158A1
公开(公告)日：2006-05-11
申请号：US11292002
申请日：2005-12-02
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
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89.发明申请Charged particle beam emitting device and method for adjusting the optical axis 有权带电粒子束发射装置和调整光轴的方法公开(公告)号：US20050285036A1
公开(公告)日：2005-12-29
申请号：US11166370
申请日：2005-06-27
申请人： Mitsugu Sato , Makoto Ezumi , Satoru Yamaguchi
发明人： Mitsugu Sato , Makoto Ezumi , Satoru Yamaguchi
IPC分类号： G01N23/225 , H01J37/26 , H01J37/28
CPC分类号： H01J37/265 , H01J2237/1501 , H01J2237/28 , H01J2237/304
摘要： A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative to a sample: A device for causing orbit of the primary beam to pass through off-axes of a plurality of lenses, and controlling off-axis orbit of the primary beam. This device allows the aberration which occurs in the objective lens at the time of beam tilt to be cancelled out by the aberration which occurs in the other lens. Also, there is provided a device for simultaneously modulating excitations of the plurality of lenses including the objective lens.
摘要翻译： 一种带电粒子束发射装置，其包括以下配置装置，使得即使主光束相对于样本倾斜，图像分辨率的降低也将被抑制：用于使一次光束的轨道穿过关闭的装置， 多个透镜的轴，并且控制主光束的离轴轨道。 该装置允许在光束倾斜时在物镜中发生的像差由在另一个透镜中出现的像差抵消。 此外，提供了一种用于同时调制包括物镜的多个透镜的激励的装置。
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公开(公告)号：US20050232493A1
公开(公告)日：2005-10-20
申请号：US11104632
申请日：2005-04-13
申请人： Norio Satou , Akiyuki Sugiyama , Osamu Komuro , Satoru Yamaguchi
发明人： Norio Satou , Akiyuki Sugiyama , Osamu Komuro , Satoru Yamaguchi
CPC分类号： G06T7/001
摘要： According to the pattern search method of the present invention, detection of a detection image region relative to an observation image is performed by a pattern matching. An image whose size is substantially the same as that of the observation image is used as the detection image region. The detection image region is relatively displaced with reference to the observation image, thereby detecting a degree of similarity for a common region which is common to both of the region and the image. Displacement range of the detection image region is set in advance. If area of the common region is larger than a predetermined value, calculating the degree of similarity will be performed.
摘要翻译： 根据本发明的图案搜索方法，通过图案匹配来执行相对于观察图像的检测图像区域的检测。 使用与观察图像基本相同的图像作为检测图像区域。 检测图像区域相对于观察图像相对移位，从而检测对于区域和图像两者共同的公共区域的相似度。 预先设定检测图像区域的位移范围。 如果公共区域的面积大于预定值，则将执行相似度的计算。
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