Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns
    83.
    发明授权
    Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns 有权
    使用曲线图案的集成电路制造和掩模数据准备的方法

    公开(公告)号:US08637211B2

    公开(公告)日:2014-01-28

    申请号:US13269618

    申请日:2011-10-09

    IPC分类号: G03F1/20 G03F9/00

    摘要: A method for manufacturing a semiconductor device is disclosed, wherein during the physical design process, a curvilinear path is designed to represent an interconnecting wire on the fabricated semiconductor device. A method for fracturing or mask data preparation (MDP) is also disclosed in which a manhattan path which is part of the physical design of an integrated circuit is modified to create a curvilinear pattern, and where a set of charged particle beam shots is generated, where the set of shots is capable of forming the curvilinear pattern on a resist-coated surface.

    摘要翻译: 公开了一种用于制造半导体器件的方法,其中在物理设计过程期间,设计曲线路径以表示制造的半导体器件上的互连线。 还公开了一种用于压裂或掩模数据准备(MDP)的方法,其中作为集成电路的物理设计的一部分的曼哈顿路径被修改以产生曲线图案,并且在产生一组带电粒子束照射的情况下, 其中一组镜头能够在抗蚀剂涂覆的表面上形成曲线图案。

    METHOD FOR FRACTURING AND FORMING A PATTERN USING SHAPED BEAM CHARGED PARTICLE BEAM LITHOGRAPHY
    84.
    发明申请
    METHOD FOR FRACTURING AND FORMING A PATTERN USING SHAPED BEAM CHARGED PARTICLE BEAM LITHOGRAPHY 有权
    使用形状束束填充粒子束刻蚀的图案的破碎和形成方法

    公开(公告)号:US20130122406A1

    公开(公告)日:2013-05-16

    申请号:US13723329

    申请日:2012-12-21

    IPC分类号: G03F1/70 G06F17/50

    摘要: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.

    摘要翻译: 在使用成形带电粒子束光刻的半导体生产领域中,公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统,其中为带电粒子束写入器系统确定了一系列曲线角色投影镜头,使得 一组镜头可以在表面上形成可能具有不同宽度的连续轨迹。 还公开了使用一系列曲线角色投影镜头在表面上形成连续轨道的方法。 还公开了用于制造掩模版和用于通过使用一系列曲线字符投影镜在表面上形成连续轨迹来制造诸如硅晶片的基板的方法。

    METHOD FOR FORMING CIRCULAR PATTERNS ON A SURFACE
    85.
    发明申请
    METHOD FOR FORMING CIRCULAR PATTERNS ON A SURFACE 有权
    在表面形成圆形图案的方法

    公开(公告)号:US20130122405A1

    公开(公告)日:2013-05-16

    申请号:US13723181

    申请日:2012-12-20

    IPC分类号: G03F1/70 G06F17/50

    摘要: A method for fracturing or mask data preparation for shaped beam charged particle beam lithography is disclosed, in which a square or nearly-square contact or via pattern is input, and a set of charged particle beam shots is determined which will form a circular or nearly-circular pattern on a surface, where the area of the circular or nearly-circular pattern is within a pre-determined tolerance of the area of the input square or nearly-square contact or via pattern. Methods for forming a pattern on a surface and for manufacturing a semiconductor device are also disclosed.

    摘要翻译: 公开了一种用于成形束带电粒子束光刻的压裂或掩模数据准备的方法,其中输入了正方形或接近平方的接触或通孔图案,并且确定一组带电粒子束射束,其将形成圆形或近似 - 圆形图案,其中圆形或近似圆形图案的面积在输入的正方形或接近平方的接触或通孔图案的面积的预定公差内。 还公开了在表面上形成图案和制造半导体器件的方法。

    Wing cover panel assembly and wing cover panel for an aircraft wing and a method of forming thereof
    86.
    发明授权
    Wing cover panel assembly and wing cover panel for an aircraft wing and a method of forming thereof 有权
    用于飞机机翼的翼盖板组件和翼盖板及其形成方法

    公开(公告)号:US08398024B2

    公开(公告)日:2013-03-19

    申请号:US12302862

    申请日:2007-07-05

    申请人: Michael Tucker

    发明人: Michael Tucker

    IPC分类号: B64C1/00

    摘要: A wing cover panel assembly, wing cover and method of forming thereof are disclosed in which an attachment surface of the wing cover panel is provided with a locating channel into which a wing structural element such as a stringer or spar is captured so as to fix the wing structural element to the wing cover panel.

    摘要翻译: 公开了一种翼盖板组件,翼盖及其成形方法,其中机翼盖板的附接表面设置有定位通道,其中捕获诸如桁条或翼梁的机翼结构元件,以便固定 翼结构元件到翼盖板。

    Sealing lid for a container
    87.
    发明授权
    Sealing lid for a container 有权
    密封盖为容器

    公开(公告)号:US08387822B2

    公开(公告)日:2013-03-05

    申请号:US12832695

    申请日:2010-07-08

    IPC分类号: B65D41/18

    CPC分类号: B65D45/24

    摘要: A lid is provided for engagement with a projecting rim of an opening on a container. The lid includes a covering panel for closing the container opening and a skirt formed on a periphery of the cover and depending therefrom. The skirt overlaps with the container rim when the cover is positioned over the opening. The skirt includes a defined gap therein that is positioned between adjacent gap edges. A clasp is provided on the periphery of the cover adjacent the defined gap. The clasp pivots between an open position and an engaged position. In the engaged position, the clasp engages the gap edges and draws the edges toward one another. The drawing of the gap edges moves the skirt inwardly towards the container rim. The lid may further include a flexing portion defining a connection between the cover panel and the skirt. The engagement of the clasp on the skirt causes compliance of the flexing portion and a corresponding axial movement of the skirt relative to the cover panel.

    摘要翻译: 设置有用于与容器上的开口的突出边缘接合的盖。 盖包括用于封闭容器开口的盖板和形成在盖的周边上并从其中悬垂的裙部。 当盖子位于开口上方时,裙部与容器边缘重叠。 裙部包括位于相邻的间隙边缘之间的限定的间隙。 在盖的周边上设有一个扣环,邻近限定的间隙。 夹具在打开位置和接合位置之间枢转。 在接合位置,扣环接合间隙边缘并将边缘朝向彼此拉出。 间隙边缘的图形将裙部向内朝向容器边缘移动。 盖子还可以包括限定盖板和裙部之间的连接的挠曲部分。 扣环在裙部上的接合导致弯曲部分的顺应性和裙部相对于盖板的相应轴向运动。

    Method, device, and system for forming circular patterns on a surface
    88.
    发明授权
    Method, device, and system for forming circular patterns on a surface 有权
    用于在表面上形成圆形图案的方法,装置和系统

    公开(公告)号:US08354207B2

    公开(公告)日:2013-01-15

    申请号:US13282446

    申请日:2011-10-26

    IPC分类号: G03F1/20

    摘要: A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by using different dosages, and where the size ranges for the two characters is continuous. A method for forming circular patterns on a surface using variable-shaped beam (VSB) shots of different dosages is also disclosed. A method for forming circular patterns on a surface using a set of shots, where all of the shots comprise dosages, is also disclosed.

    摘要翻译: 公开了用于字符投影(CP)带电粒子束光刻的模板和用于制造模版的方法,其中模板包含两个圆形字符,其中每个字符能够通过使用不同的剂量在尺寸范围内的表面上形成图案 ,而两个字符的大小范围是连续的。 还公开了使用不同剂量的可变形波束(VSB)射击在表面上形成圆形图案的方法。 还公开了一种使用一组镜头在表面上形成圆形图案的方法,其中所有的照片包括剂量,也是公开的。