公开(公告)号：US06268906B1

公开(公告)日：2001-07-31

申请号：US09271212

申请日：1999-03-17

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70358 ,  G03F7/70041 ,  G03F7/70558

摘要： In a slit scan type projection exposure apparatus, a predetermined number of pulsed lights are emitted from a pulsed light source to transfer a pattern on a reticle to a wafer while the reticle and the wafer are scanned at a constant speed with respect to an exposure area on the wafer. At that time, not only fluctuations of the energies of the pulsed lights but also fluctuations of light emission timing of the pulsed lights are taken into consideration.

公开(公告)号：US5777724A

公开(公告)日：1998-07-07

申请号：US727761

申请日：1996-10-08

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03F7/20 ,  G03B5/00

CPC分类号： G03F7/70558 ,  G03F7/70358

摘要： An exposure amount control device for controlling an integrated exposure amount of pulsed light to a photosensitive substrate within a predetermined range in which a pattern of a mask is successively exposed on the substrate by synchronously scanning the mask forming the pattern to be exposed and the photosensitive substrate relatively with respect to a predetermined illumination area illuminated with pulsed light from a pulsed light source, satisfies the following relationship: .DELTA.D.sub.12 .gtoreq.D/(2N.sub.min) wherein luminous intensity distribution of the predetermined illumination area in a scan direction is shaped to be a trapezoid, .DELTA.D.sub.12 is an average value of half of the widths of the slope portions on the lateral sides of the trapezoid-shaped luminous intensity distribution in the scan direction, D is the width, at half peak value points, of the luminous intensity distribution on the predetermined illumination area of the substrate in the scan direction and N.sub.min is a minimum number of exposure pulses necessary for controlling an integrated exposure amount at respective points on the substrate within predetermined accuracy.

摘要翻译： 一种曝光量控制装置，用于通过同步扫描形成待曝光图案的掩模和感光基板，在预定范围内控制脉冲光到感光基板的曝光量，其中掩模图案在基板上连续曝光 相对于来自脉冲光源的脉冲光照射的预定照明区域，满足以下关系：DELTA D12> / = D /（2Nmin）其中扫描方向上的预定照明区域的发光强度分布为 梯形，DELTA D12是扫描方向上的梯形发光强度分布的横向侧的倾斜部分的宽度的一半的平均值，D是发光强度的半峰值点处的宽度 在扫描方向上的基板的预定照明区域上的分布，Nmin是e的最小数量 在预定精度内控制基板上的各个点处的积分曝光量所需的曝光脉冲。

公开(公告)号：US5770112A

公开(公告)日：1998-06-23

申请号：US793865

申请日：1997-03-11

申请人： Takayuki Omura ,  Teruhiko Hineno ,  Tomiyuki Nanba ,  Haruo Ogawa ,  Kazuaki Suzuki

发明人： Takayuki Omura ,  Teruhiko Hineno ,  Tomiyuki Nanba ,  Haruo Ogawa ,  Kazuaki Suzuki

IPC分类号： A61K8/894 ,  A61Q5/02 ,  A61Q5/06 ,  B01F17/00 ,  B01F17/54 ,  B01J13/00 ,  A61K7/075 ,  A61K7/08 ,  A61K7/11

CPC分类号： A61K8/894 ,  A61Q5/02 ,  A61Q5/06 ,  B01F17/0071 ,  Y10S514/937 ,  Y10S514/975 ,  Y10S516/925

摘要： The purpose of the present invention is to provide an oil-in-alcohol emulsified composition that the oil phase is uniformly and stably dispersed into an outer phase which is mainly comprised of a lower alcohol. Accordingly, the oil-in-alcohol emulsified composition of the present invention comprising: (a) an oily component, (b) a lower alcohol, (c) water, and (d) an emulsifier which comprising one or more of polyether-modified silicones represented by the following general formula (1), ##STR1## �In the formula: A is a polyalkylene group shown as the general formula: --C.sub.3 H.sub.6 O(C.sub.2 H.sub.4 O).sub.a (C.sub.3 H.sub.6 O).sub.b R' (where R' is a group selected from the group of a hydrogen atom, an acyl group, and alkyl groups having a carbon number of 1 to 4, where a is an integer of 5 to 50, and where b is an integer of 5 to 50.); R is a methyl group or a phenyl group; m is an integer of 50 to 1,000; and n is an integer of 1 to 40.!.

摘要翻译： PCT No.PCT / JP96 / 01939 Sec。 371日期1997年3月11日 102（e）1997年3月11日PCT PCT 1996年7月12日PCT公布。 出版物WO97 / 02888 日本1997年1月30日本发明的目的是提供一种油相均匀稳定地分散在主要由低级醇组成的外层的油包水乳化组合物。 因此，本发明的油包水乳化组合物包含：（a）油性成分，（b）低级醇，（c）水和（d）包含一种或多种聚醚改性的乳化剂 由以下通式（1）表示的硅氧烷，以通式表示的e基团：-​​C 3 H 6 O（C 2 H 4 O）a（C 3 H 6 O）b R'（其中R'为选自氢原子，酰基， 和碳数为1〜4的烷基，其中a为5〜50的整数，b为5〜50的整数。 R是甲基或苯基; m为50〜1000的整数。 n为1〜40的整数。

公开(公告)号：US5683790A

公开(公告)日：1997-11-04

申请号：US514796

申请日：1995-08-14

申请人： Kazuaki Suzuki ,  Makoto Kobayashi ,  Taro Miura ,  Keizou Kawamura

发明人： Kazuaki Suzuki ,  Makoto Kobayashi ,  Taro Miura ,  Keizou Kawamura

IPC分类号： C04B35/64 ,  C04B37/00 ,  H01L21/48 ,  H01P1/203 ,  H01P7/08 ,  H01P11/00 ,  H05K3/46 ,  B32B3/00 ,  B32B15/00 ,  C03C8/22 ,  C03C27/04

CPC分类号： H01L21/4857 ,  H01P11/008 ,  Y10S428/901 ,  Y10T428/12618 ,  Y10T428/24917 ,  Y10T428/24926

摘要： A multilayer ceramic part including dielectric ceramic layers and internal conductor layers is prepared by forming dielectric ceramic layers from an oxide system dielectric ceramic material having a sintering completion temperature between the melting point and the boiling point of the internal conductor. A pattern of internal conductor is formed on dielectric ceramic layers. The dielectric ceramic layers are placed one on another so as to sandwich the internal conductor pattern therebetween. The laminate is fired at or above the melting point of the internal conductor, optionally in an atmosphere having a controlled oxygen partial pressure. Since the dielectric ceramic material has an improved dielectric constant and dielectric loss and the internal conductor is densified and improved in surface property, the part is improved in resonator Q value and other properties. This minimizes the occurrence of defective parts in which the internal conductor is separated from the dielectric ceramic layer and minimizes a failure in the internal conductor layer.

摘要翻译： 通过从具有在内部导体的熔点和沸点之间的烧结完成温度的氧化物系介电陶瓷材料形成介电陶瓷层来制备包括电介质陶瓷层和内部导体层的多层陶瓷部件。 在介电陶瓷层上形成内部导体的图形。 电介质陶瓷层一个接一个地放置在其间夹着内部导体图案。 层压体在内部导体的熔点以上或任意地在具有受控氧分压的气氛中烧制。 由于介电陶瓷材料具有改善的介电常数和介电损耗，并且内部导体致密化并且表面性能得到改善，所以该部件在谐振器Q值和其它性能方面得到改善。 这使得内部导体与介电陶瓷层分离的缺陷部件的发生最小化，并使内部导体层的故障最小化。

公开(公告)号：US5483349A

公开(公告)日：1996-01-09

申请号：US412089

申请日：1995-03-28

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/70

摘要： An apparatus for detecting positions is provided with an auxiliary pattern adjacent to the opaque portion of an index pattern, which has a spatial frequency higher than the insulating spatial frequency of an imaging system in order to obtain a stable signal portion (slope). Using this slope, the positional information of the index pattern is obtained, and on the basis of the positional information, the positions of wafer alignment marks are detected.

摘要翻译： 用于检测位置的装置设置有与索引图案的不透明部分相邻的辅助图案，其具有高于成像系统的绝缘空间频率的空间频率，以便获得稳定的信号部分（斜率）。 使用该斜率，获得索引图案的位置信息，并且基于位置信息，检测晶片对准标记的位置。

公开(公告)号：US5450045A

公开(公告)日：1995-09-12

申请号：US219917

申请日：1994-03-30

申请人： Taro Miura ,  Makoto Kobayashi ,  Kazuaki Suzuki ,  Tadao Fujii

发明人： Taro Miura ,  Makoto Kobayashi ,  Kazuaki Suzuki ,  Tadao Fujii

IPC分类号： H01P1/387

CPC分类号： H01P1/387

摘要： A circulator includes a circulator element (50) with inner conductors (41) having a predetermined pattern and an insulating ferromagnetic material body (40) closely surrounding the inner conductors. The insulating ferromagnetic material body is constituted by a fired single continuous body. The circulator also includes a plurality of terminal electrodes (76) formed on side surfaces of the circulator element and electrically connected to one end of the inner conductors, a plurality of circuit elements (51a, 51b, 51c) electrically connected to the terminal electrodes, and excitation permanent magnets (52, 53) for applying a dc magnetic field to the circulator element.

摘要翻译： 循环器包括具有预定图案的内部导体（41）和紧密围绕内部导体的绝缘铁磁材料体（40）的环行器元件（50）。 绝缘铁磁材料体由烧制的单个连续体构成。 环行器还包括形成在循环器元件的侧表面上并电连接到内导体的一端的多个端电极（76），与端子电极电连接的多个电路元件（51a，51b，51c） 以及用于向循环器元件施加直流磁场的励磁永磁体（52,53）。

公开(公告)号：US4982227A

公开(公告)日：1991-01-01

申请号：US318908

申请日：1989-03-03

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F7/70358 ,  G03F7/70475 ,  G03F9/70

摘要： An exposure apparatus in an exposure operation involving image composing or photocomposing, adapts an alignment method for defining the actual positions of all the shot areas on a wafer by sample alignment prior to the exposure operation. It is assumed that a substrate, such as a wafer, is provided with regularly positioned plural image transfer areas each of which is divided into at least two partial areas, and the apparatus executes superimposed exposures with different of the same patterns respectively by a step-and-repeat or step-and-scan-method.

摘要翻译： 曝光操作涉及图像组合或光电曝光的曝光装置，适用于在曝光操作之前通过样品对准来定义晶片上所有拍摄区域的实际位置的对准方法。 假设诸如晶片的衬底设置有规则定位的多个图像传送区域，每个图像传送区域被划分为至少两个部分区域，并且该设备分别通过步进电路来执行具有相同模式的叠加曝光， 重复或逐步扫描方法。

公开(公告)号：US4920505A

公开(公告)日：1990-04-24

申请号：US390482

申请日：1989-08-02

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： H01L21/30 ,  G03F7/20 ,  G03F7/207 ,  H01L21/027

CPC分类号： G03F7/70891 ,  G03F7/70241 ,  G03F7/70883

摘要： A projection exposure apparatus for manufacturing semiconductor elements has a control system for correcting changes in imaging characteristics with high precision on a real-time basis and for correcting imaging characteristics of a projecting lens on the basis of information associated with the history of light incident on the projection lens, wherein even if the history information of incident light is lost, due to a power failure, for example, or an error occurs in the information, correction control for the imaging characteristics can be restored with high precision.

摘要翻译： 用于制造半导体元件的投影曝光装置具有控制系统，用于以实时的方式高精度地校正成像特性的变化，并且基于与入射到其上的光的历史相关联的信息来校正投影透镜的成像特性 投影透镜，其中即使入射光的历史信息丢失，由于例如电源故障或信息中出现错误，也可以高精度地恢复成像特性的校正控制。

公开(公告)号：US4853745A

公开(公告)日：1989-08-01

申请号：US210808

申请日：1988-06-24

申请人： Saburo Kamiya ,  Kazuaki Suzuki ,  Akikazu Tanimoto

发明人： Saburo Kamiya ,  Kazuaki Suzuki ,  Akikazu Tanimoto

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/70

摘要： An exposure apparatus for exposing to a substrate the image of the desired pattern of a mask having a mark and a desired pattern formed thereon. Light source for illuminating the mask by at least part of the laser light from the light source, a projection optical system, movable stage, position detecting for detecting the relative position of the stage and the mask and outputting a position signal, a fiducial member formed integrally with the stage, the fiducial member having a fiducial pattern disposed thereon. A second illuminating optical system for illuminating the fiducial pattern from the opposite side of the projection optical system with respect to the fiducial member. The second illuminating optical system having a plurality of reflecting members for directing at least part of the laser light from the light source to the fiducial pattern. Normalizing a second detection signal on the basis of a first detection signal, and processing for determining the position of the image of the mark formed on the predetermined surface by the projection optical system, on the basis of a position signal and the second normalized detection signal.

摘要翻译： 一种曝光装置，用于将形成有标记和期望图案的掩模的期望图案的图像曝光于基板。 用于通过来自光源的至少一部分激光照射掩模的光源，投影光学系统，可移动台，用于检测平台和掩模的相对位置并输出位置信号的位置检测，形成的基准部件 与舞台一体地，具有设置在其上的基准图案的基准构件。 第二照明光学系统，用于相对于基准构件从投影光学系统的相对侧照射基准图案。 第二照明光学系统具有多个反射构件，用于将来自光源的至少一部分激光引导到基准图案。 基于第一检测信号对第二检测信号进行归一化，以及基于位置信号和第二归一化检测信号来确定由投影光学系统形成在预定表面上的标记的图像的位置的处理 。

公开(公告)号：US4734746A

公开(公告)日：1988-03-29

申请号：US51236

申请日：1987-05-12

申请人： Kazuo Ushida ,  Satoru Anzai ,  Kazuaki Suzuki ,  Toshio Matsuura ,  Kyoichi Suwa ,  Koichi Matsumoto

发明人： Kazuo Ushida ,  Satoru Anzai ,  Kazuaki Suzuki ,  Toshio Matsuura ,  Kyoichi Suwa ,  Koichi Matsumoto

IPC分类号： G03F7/20 ,  G03B27/32 ,  G03B27/42

CPC分类号： G03F7/70066 ,  G03F7/2022 ,  G03F7/70241 ,  G03F7/70458

摘要： An exposure method for photolithography comprises the steps of forming a pattern on a substrate by the use of a first exposure apparatus including a first imaging optical system having a reduction magnification 1/.beta.1 and an image circle of a diameter .phi.1, and forming a second pattern on the substrate on which the first pattern has been formed, by the use of a second exposure apparatus including a second imaging optical system having a reduction magnification 1/.beta.2 different from the reduction magnification 1/.beta.1 and an image circle of a diameter .phi.2, wherein when N is an integer, the conditions that .beta.1.times..phi.1=.beta.2.times..phi.2 and .phi.1=N.times..phi.2 are satisfied.

摘要翻译： 用于光刻的曝光方法包括以下步骤：通过使用包括具有缩小倍率1 /β1的第一成像光学系统和直径φ1的图像圆的第一曝光装置在基板上形成图案，并且形成 通过使用包括具有不同于缩小倍率1 /β1的缩小倍率1 /β2的第二成像光学系统的第二曝光装置和形成第一图案的图像圆的第二图案， 直径phi 2，其中当N是整数时，满足β1 phi 1 =β2 ph 2和ph 1 = N x ph 2的条件。