公开(公告)号：US08213079B2

公开(公告)日：2012-07-03

申请号：US13008282

申请日：2011-01-18

申请人： Daniel Kraehmer ,  Ralf Mueller

发明人： Daniel Kraehmer ,  Ralf Mueller

IPC分类号： G02B13/14

CPC分类号： G03F7/70966 ,  G02B5/3083 ,  G03F7/70566 ,  Y10S359/90 ,  Y10T29/49908

摘要： A method of manufacturing a polarization-modulating optical element is provided. The element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization. The method includes joining a first component and a second component. A non-plane surface of the first component is provided with a defined height profile is joined with a plane surface of the second component. A mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.

摘要翻译： 提供了一种制造偏振调制光学元件的方法。 该元件对于通过元件的光并由于应力诱导的双折射引起正交偏振态之间的延迟分布。 该方法包括连接第一部件和第二部件。 第一部件的非平面表面设置有限定的高度轮廓，与第二部件的平面连接。 在这种形成的偏振调制光学元件中产生引起应力引起的双折射的机械应力。

公开(公告)号：US20120080437A1

公开(公告)日：2012-04-05

申请号：US13255658

申请日：2010-03-10

申请人： Goetz Guenther ,  Markus Koehler ,  Uwe Lapp ,  Martin Lauer ,  Ralf Mueller ,  Peter Scheunert ,  Wolfgang Schulz ,  Udo Waeber ,  Manfred Weis

发明人： Goetz Guenther ,  Markus Koehler ,  Uwe Lapp ,  Martin Lauer ,  Ralf Mueller ,  Peter Scheunert ,  Wolfgang Schulz ,  Udo Waeber ,  Manfred Weis

IPC分类号： B65D25/04

CPC分类号： A61M1/14 ,  A61M2205/11 ,  A61M2205/122

摘要： Disclosed is a sealing device for sealing at least one first volume of an arrangement for the treatment of at least one medical fluid against at least one second volume, wherein the first volume is provided for receiving at least one external functional device. The sealing device includes at least one first connection device whereby the sealing device may be connected to the arrangement. In addition an arrangement and a method are disclosed.

摘要翻译： 公开了一种用于密封至少一个第一体积的用于至少一个第二体积的至少一种医用流体的治疗的装置的密封装置，其中所述第一容积用于接收至少一个外部功能装置。 密封装置包括至少一个第一连接装置，由此密封装置可以连接到该装置。 此外，公开了一种布置和方法。

公开(公告)号：US08138862B2

公开(公告)日：2012-03-20

申请号：US12516019

申请日：2007-11-08

申请人： Ralf Mueller ,  Frank Hustert ,  Hans-Peter Weyand

发明人： Ralf Mueller ,  Frank Hustert ,  Hans-Peter Weyand

IPC分类号： H01H9/00 ,  H01H75/00 ,  H01H67/02

CPC分类号： H01H71/2409 ,  H01H71/2418 ,  H01H73/045

摘要： An installation switching device having at least one pole current path comprises two stationary contact pieces; a moving contact bridge including two moving contact pieces forming a double-break pole with the two stationary contact pieces; a contact pressure spring exerting a pressure on the moving contact bridge in a closing direction of the moving contact bridge; a pusher configured to act on the moving contact bridge counter to the pressure of the contact pressure spring in an opening direction, the pusher including a slide and a striking pin disposed moveably relative to the moving contact bridge and to one another in a movement direction of the moving contact bridge; a switch latch having a latching point; an operating lever configured to act on the pusher; and an electromagnetic release having an impact armature.

摘要翻译： 具有至少一个极电流路径的安装开关装置包括两个固定接触片; 一个活动接触桥，包括两个活动触点，形成一个具有两个固定接点的双断点; 接触压力弹簧在所述移动接触桥的闭合方向上对所述可动接触桥施加压力; 推动器，其构造成与打开方向上的接触压力弹簧的压力作用在移动接触桥上，推动器包括滑动件和冲击销，该滑动件和冲击销相对于移动接触桥可移动地设置， 移动接触桥; 具有锁定点的开关闩锁; 构造成作用在推动器上的操作杆; 以及具有冲击电枢的电磁释放。

公开(公告)号：US20110075121A1

公开(公告)日：2011-03-31

申请号：US12748862

申请日：2010-03-29

申请人： Alexander Epple ,  Toralf Gruner ,  Ralf Mueller

发明人： Alexander Epple ,  Toralf Gruner ,  Ralf Mueller

IPC分类号： G03B27/72 ,  G02B17/06

CPC分类号： G02B13/143 ,  G02B17/0892 ,  G03F7/70225

摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9), including a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17) and a third partial objective (19) imaging the second intermediate image onto the image field (7). The second partial objective (15) has exactly one concave mirror (21) and at least one lens (23). The minimum distance between an optically utilized region of the concave mirror (21) and an optically utilized region of a surface (25)—facing the concave mirror—of a lens (23) adjacent to the concave mirror is greater than 10 mm.

摘要翻译： 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7），包括对物场进行成像的第一部分物镜（11） 到第一实际中间图像（13），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）和将第二中间图像成像到图像场（7）上的第三部分目标（19） ）。 第二部分物镜（15）具有正好一个凹面镜（21）和至少一个透镜（23）。 凹面镜（21）的光学利用区域与与凹面镜相邻的透镜（23）的凹面镜的表面（25）的光学利用区域之间的最小距离大于10mm。

公开(公告)号：US07837295B2

公开(公告)日：2010-11-23

申请号：US12182215

申请日：2008-07-30

申请人： Rainer Ehresmann ,  Ralf Mueller ,  Wolfgang Muhl ,  Sabine Roth

发明人： Rainer Ehresmann ,  Ralf Mueller ,  Wolfgang Muhl ,  Sabine Roth

IPC分类号： B41J2/165

CPC分类号： B41J2/16588 ,  B41J25/308

摘要： A measuring arrangement and measurement method determine the play of a cartridge pivot unit of an inkjet printing system that has at least one stop for the cartridge pivot unit. The cartridge pivot unit is driven by a first motor via a gear train and is equipped with a first movement sensor to establish a movement of the cartridge pivot unit upon leaving the stop. The cartridge pivot unit moves only when the play of the gear train is overcome. The stop for the cartridge pivot unit is formed by a mobile cleaning and sealing station. A counter is provided to count pulses, the count being representative of the play of the gear train of the cartridge pivot unit counting begins with leaving the mobile stop and continues until the movement of the cartridge pivot unit upon leaving the stop again ensues in conformity with the actuation by the first motor.

摘要翻译： 测量装置和测量方法确定喷墨打印系统的盒枢轴单元的播放，其具有至少一个用于盒枢轴单元的止动件。 盒枢轴单元由第一电动机经由齿轮系驱动，并且配备有第一运动传感器，以在离开止动件时建立盒枢转单元的运动。 只有当克服了齿轮系的弹奏时，盒枢轴单元才移动。 墨盒枢轴单元的止动件由移动清洁和密封站形成。 提供计数器来计数脉冲，代表盒枢轴单元计数的齿轮系的游隙的计数开始于离开移动停止并继续直到在再次离开停止位置时盒枢轴单元的移动符合 由第一马达驱动。

公开(公告)号：US07782443B2

公开(公告)日：2010-08-24

申请号：US12646021

申请日：2009-12-23

申请人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

发明人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

IPC分类号： G03B27/54 ,  G03B27/14 ,  G03B27/12

CPC分类号： G03F7/70208 ,  G03F7/70116

摘要： An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.

摘要翻译： 微光刻投影曝光装置的照明系统包括包括多个光束偏转元件（例如镜子）的光束偏转阵列。 每个光束偏转元件适于使入射光束偏转响应于控制信号而变化的偏转角。 从光束偏转元件反射的光束在系统光瞳表面产生斑点。 在曝光处理期间在掩模被成像在光敏表面上的系统光瞳表面中照亮的光斑的数量大于光束偏转元件的数量。 这可以借助于将来自光束偏转元件反射的光束相乘的光束倍增器单元来实现。 在另一个实施例中，控制光束偏转元件，使得在系统光瞳表面中产生的辐照度分布在曝光过程的两个连续的光脉冲之间变化。

公开(公告)号：US20100157268A1

公开(公告)日：2010-06-24

申请号：US12646021

申请日：2009-12-23

申请人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

发明人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

IPC分类号： G03B27/54

CPC分类号： G03F7/70208 ,  G03F7/70116

摘要： An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.

摘要翻译： 微光刻投影曝光装置的照明系统包括包括多个光束偏转元件（例如镜子）的光束偏转阵列。 每个光束偏转元件适于使入射光束偏转响应于控制信号而变化的偏转角。 从光束偏转元件反射的光束在系统光瞳表面产生斑点。 在曝光处理期间在掩模被成像在光敏表面上的系统光瞳表面中照亮的光斑的数量大于光束偏转元件的数量。 这可以借助于将来自光束偏转元件反射的光束相乘的光束倍增器单元来实现。 在另一个实施例中，控制光束偏转元件，使得在系统光瞳表面中产生的辐照度分布在曝光过程的两个连续的光脉冲之间变化。

公开(公告)号：US20090305101A1

公开(公告)日：2009-12-10

申请号：US12298704

申请日：2006-04-28

申请人： Werner Belschner ,  Matthias Kugel ,  Juergen Leitz ,  Ralf Mueller

发明人： Werner Belschner ,  Matthias Kugel ,  Juergen Leitz ,  Ralf Mueller

IPC分类号： H01M8/04

CPC分类号： H01M8/04992 ,  H01M8/04365 ,  H01M8/04559 ,  H01M8/04589

摘要： A fuel cell apparatus includes at least one busbar for discharging high electrical currents from a high-voltage side of a fuel cell unit and a current sensor that comprises an evaluation electronics unit. A resistance element of the current sensor is integrated in the outgoing electrical conductor.

摘要翻译： 燃料电池装置包括用于从燃料电池单元的高压侧排出高电流的至少一个母线和包括评估电子单元的电流传感器。 电流传感器的电阻元件集成在输出电导体中。

公开(公告)号：US20090083059A1

公开(公告)日：2009-03-26

申请号：US11996080

申请日：2005-07-19

申请人： Ralf Mueller ,  Michael Buser ,  Ludwig Keller ,  Grazyna Saganowska ,  Michael Stengle

发明人： Ralf Mueller ,  Michael Buser ,  Ludwig Keller ,  Grazyna Saganowska ,  Michael Stengle

IPC分类号： G06Q40/00

CPC分类号： G06Q40/08 ,  G06Q10/067 ,  G06Q40/00

摘要： The invention relates to a system and to a method for retroactive, dynamic determination and/or monitoring of low layout heights of technical systems (201, 211, 221). Measuring data can be aggregated and analysed and operation-specific system means (14) can be activated. A parameter (30), which is based on the detected operation-specific data, can be dynamically determined by means of a filter unit (12) for various types of operations. Operational-specific measuring data (31) is analysed and aggregated by means of a static analysis module (10) and, after a request and/or a time interval which can be determined, the corresponding low layout heights (32) are dynamically adapted by means of the control unit (14) and/or operation-specific system means (201, 212, 222) are activated when a definable deviation value is exceeded in relation to the already stored measuring data.

摘要翻译： 本发明涉及一种用于技术系统（201,211,221）的低布局高度的追溯，动态确定和/或监视的系统和方法。 可以聚合和分析测量数据，并且可以激活操作特定的系统装置（14）。 可以通过用于各种类型的操作的滤波器单元（12）来动态地确定基于检测到的操作特定数据的参数（30）。 通过静态分析模块（10）分析和聚合操作特定的测量数据（31），并且在可以确定的请求和/或时间间隔之后，相应的低布局高度（32）通过 当相对于已经存储的测量数据超过可定义的偏差值时，控制单元（14）和/或操作特定系统装置（201,212,222）的装置被激活。

公开(公告)号：US20080297884A1

公开(公告)日：2008-12-04

申请号：US12129161

申请日：2008-05-29

申请人： Ralf Mueller

发明人： Ralf Mueller

IPC分类号： G02B17/08 ,  G02B13/14 ,  G06F17/50

CPC分类号： G02B17/0812 ,  G02B13/143 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70891

摘要： Projection objective, projection exposure apparatuses and related systems and components are disclosed.

摘要翻译： 投影目标，投影曝光装置及相关系统和组件被公开。