-
1.发明授权High transmission, high aperture catadioptric projection objective and projection exposure apparatus 有权高透射率，高孔径反射折射投影物镜和投影曝光装置公开(公告)号：US08345222B2
公开(公告)日：2013-01-01
申请号：US12580369
申请日：2009-10-16
CPC分类号： G03F7/70958 , G02B1/115 , G02B17/0812 , G03F7/70225 , G03F7/70341
摘要： The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
摘要翻译： 本公开提供了投影物镜，其可以用于微光刻投影曝光设备中，以使布置在投影物镜的图像表面区域中的辐射敏感基底与至少一个掩模图案的图像布置在 投影物镜的物体表面。 本公开还提供了包括这种投影目标的投影曝光装置以及相关的部件和方法。
-
2.发明授权公开(公告)号：US07903333B2
公开(公告)日：2011-03-08
申请号：US11739232
申请日：2007-04-24
申请人： Daniel Kraehmer , Ralf Mueller
发明人： Daniel Kraehmer , Ralf Mueller
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B5/3083 , G03F7/70566 , Y10S359/90 , Y10T29/49908
摘要： The disclosure relates to a method of manufacturing a polarization-modulating optical element, wherein the element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization, the method comprising joining a first component and a second component, wherein a non-plane surface of the first component being provided with a defined height profile is joined with a plane surface of the second component, whereby a mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.
摘要翻译： 本发明涉及一种制造偏振调制光学元件的方法，其中，对于通过元件的光并由于应力引起的双折射，元件引起正交偏振态之间的延迟分布，该方法包括将第一 组件和第二部件，其中设置有限定高度轮廓的第一部件的非平面表面与第二部件的平面连接，从而在这种形成的部件中产生引起应力引起的双折射的机械应力 偏振调制光学元件。
-
3.发明申请Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus 审中-公开光学元件，特别是用于微光刻投影曝光装置的物镜或照明系统公开(公告)号：US20070007491A1
公开(公告)日：2007-01-11
申请号：US11414692
申请日：2006-04-28
申请人： Ralf Mueller , Olaf Dittmann , Michael Totzeck , Daniel Kraehmer , Christoph Zaczek , Karl-Heinz Schuster
发明人： Ralf Mueller , Olaf Dittmann , Michael Totzeck , Daniel Kraehmer , Christoph Zaczek , Karl-Heinz Schuster
IPC分类号： C09K19/52
CPC分类号： G02B5/3083 , G02B1/02 , G02B27/281 , G03F7/70966
摘要： The invention concerns an optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus, including a substrate which for light of a predetermined working wavelength which passes through the substrate causes a first retardation between mutually perpendicular polarization states, and a layer which is epitaxially grown on the substrate and which is made from a material with non-cubic crystal structure, which by virtue of natural birefringence causes a second retardation between mutually perpendicular polarization states, which at least partially compensates for the first retardation caused in the substrate.
摘要翻译： 本发明涉及一种光学元件，特别是用于微光刻投影曝光设备的物镜或照明系统，该微光刻投影曝光设备包括用于通过基板的预定工作波长的光的基板，引起相互垂直的偏振状态之间的第一延迟，以及 在衬底上外延生长并且由具有非立方晶体结构的材料制成的层，其由于天然双折射引起相互垂直的极化状态之间的第二延迟，其至少部分地补偿在 底物。
-
4.发明授权公开(公告)号：US08213079B2
公开(公告)日：2012-07-03
申请号：US13008282
申请日：2011-01-18
申请人： Daniel Kraehmer , Ralf Mueller
发明人： Daniel Kraehmer , Ralf Mueller
IPC分类号： G02B13/14
CPC分类号： G03F7/70966 , G02B5/3083 , G03F7/70566 , Y10S359/90 , Y10T29/49908
摘要： A method of manufacturing a polarization-modulating optical element is provided. The element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization. The method includes joining a first component and a second component. A non-plane surface of the first component is provided with a defined height profile is joined with a plane surface of the second component. A mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.
摘要翻译： 提供了一种制造偏振调制光学元件的方法。 该元件对于通过元件的光并由于应力诱导的双折射引起正交偏振态之间的延迟分布。 该方法包括连接第一部件和第二部件。 第一部件的非平面表面设置有限定的高度轮廓，与第二部件的平面连接。 在这种形成的偏振调制光学元件中产生引起应力引起的双折射的机械应力。
-
5.发明申请公开(公告)号：US20070211246A1
公开(公告)日：2007-09-13
申请号：US11739232
申请日：2007-04-24
申请人： Daniel Kraehmer , Ralf Mueller
发明人： Daniel Kraehmer , Ralf Mueller
CPC分类号： G03F7/70966 , G02B5/3083 , G03F7/70566 , Y10S359/90 , Y10T29/49908
摘要： The disclosure relates to a method of manufacturing a polarization-modulating optical element, wherein the element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization, the method comprising joining a first component and a second component, wherein a non-plane surface of the first component being provided with a defined height profile is joined with a plane surface of the second component, whereby a mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.
摘要翻译： 本发明涉及一种制造偏振调制光学元件的方法，其中，对于通过元件的光并由于应力引起的双折射，元件引起正交偏振态之间的延迟分布，该方法包括将第一 组件和第二部件，其中设置有限定高度轮廓的第一部件的非平面表面与第二部件的平面连接，从而在这种形成的部件中产生引起应力引起的双折射的机械应力 偏振调制光学元件。
-
6.发明授权Optimization and matching of optical systems by use of orientation Zernike polynomials 有权通过使用方位泽尔尼克多项式优化和匹配光学系统公开(公告)号：US08126669B2
公开(公告)日：2012-02-28
申请号：US12421996
申请日：2009-04-10
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译： 本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。 在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。 该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。
-
7.发明申请公开(公告)号：US20110109894A1
公开(公告)日：2011-05-12
申请号：US13008282
申请日：2011-01-18
申请人： Daniel Kraehmer , Ralf Mueller
发明人： Daniel Kraehmer , Ralf Mueller
CPC分类号： G03F7/70966 , G02B5/3083 , G03F7/70566 , Y10S359/90 , Y10T29/49908
摘要： The disclosure relates to a method of manufacturing a polarization-modulating optical element, wherein the element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization, the method comprising joining a first component and a second component, wherein a non-plane surface of the first component being provided with a defined height profile is joined with a plane surface of the second component, whereby a mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.
摘要翻译： 本发明涉及一种制造偏振调制光学元件的方法，其中，对于通过元件的光并由于应力引起的双折射，元件引起正交偏振态之间的延迟分布，该方法包括将第一 组件和第二部件，其中设置有限定高度轮廓的第一部件的非平面表面与第二部件的平面连接，从而在这种形成的部件中产生引起应力引起的双折射的机械应力 偏振调制光学元件。
-
8.发明申请HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS 有权高传输，高光电子投影预测目标和投影曝光装置公开(公告)号：US20100097592A1
公开(公告)日：2010-04-22
申请号：US12580369
申请日：2009-10-16
CPC分类号： G03F7/70958 , G02B1/115 , G02B17/0812 , G03F7/70225 , G03F7/70341
摘要： The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
摘要翻译： 本公开提供了投影物镜，其可以用于微光刻投影曝光设备中，以使布置在投影物镜的图像表面区域中的辐射敏感基底与至少一个掩模图案的图像布置在 投影物镜的物体表面。 本公开还提供了包括这种投影目标的投影曝光装置以及相关的部件和方法。
-
9.发明申请SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS 有权通过使用定向ZERNIKE POLYNOMIALS的光学系统的规格，优化和匹配公开(公告)号：US20090306921A1
公开(公告)日：2009-12-10
申请号：US12421996
申请日：2009-04-10
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译： 本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。 在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。 该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。
-
10.发明授权Method of initialising an apparatus for blood treatment in the single-needle mode and apparatus for blood treatment in the single-needle mode 有权在单针模式中初始化血液处理装置的方法和在单针模式下用于血液处理的装置公开(公告)号：US09238098B2
公开(公告)日：2016-01-19
申请号：US13700586
申请日：2011-06-03
申请人： Christoph Bocklet , Ingo Schaefer , Martin Thys , Joachim Noack , Ralf Mueller
发明人： Christoph Bocklet , Ingo Schaefer , Martin Thys , Joachim Noack , Ralf Mueller
摘要： An apparatus and method for blood treatment for the single-needle mode, the apparatus having an extra-corporeal blood circuit with a blood infeed line running to the inlet and a blood return line leading away from the outlet, of a blood treating unit, includes in the blood return line a device, e.g., container, for amassing blood, which is in flow-permitting connection for gas transfer with a device, e.g., container, for storing gas. A pressure is calculated and set in the device for storing gas before the arterial and venous phases are started, with two constraints. First, the pressure should be sufficiently low to ensure both no infusion of air into the patient and also regulated flow of blood into the patient even at opposing pressures lower than ambient pressure. Second, the pressure should be sufficiently high to expel blood from the device for amassing blood into the device for storing gas.
摘要翻译： 一种用于单针模式的血液处理的装置和方法，所述装置具有血液处理单元的离开出口处的入口线和从血液出口导出的血液回流管线的具有血液输入管线的体外血液回路， 在血液返回管路中，用于积聚血液的装置，例如容器，其用于与用于储存气体的装置（例如容器）进行气体转移的流动允许连接。 计算并设置在用于在动脉和静脉期开始之前储存气体的装置中具有两个限制。 首先，压力应该足够低，以确保不向患者输入空气，并且即使在低于环境压力的相对压力下，也将血液调节到患者体内。 第二，压力应该足够高，以将血液从装置中排出以将血液聚集到用于储存气体的装置中。
-
-
-
-
-
-
-
-
-
搜索结果
97 条记录 (耗时 0.018 秒)