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公开(公告)号:US3298785A
公开(公告)日:1967-01-17
申请号:US24657262
申请日:1962-12-21
发明人: FRIEDRICH REUL
CPC分类号: G01N31/12 , F23D91/02 , F23D2206/0094 , G01N21/72
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公开(公告)号:US2800704A
公开(公告)日:1957-07-30
申请号:US47005554
申请日:1954-11-19
发明人: HEINRICH MOHN
CPC分类号: D06B23/023 , B65H27/00 , B65H2404/18 , D06C3/00 , D06C2700/10
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公开(公告)号:US4102666A
公开(公告)日:1978-07-25
申请号:US616522
申请日:1975-09-25
申请人: Peter Baumler , Gerhard Hofer , Tassilo Korner , Heinrich Mohn , Karl Seiler , Fritz Simmat , Karlheinz Rau
发明人: Peter Baumler , Gerhard Hofer , Tassilo Korner , Heinrich Mohn , Karl Seiler , Fritz Simmat , Karlheinz Rau
IPC分类号: C03B23/207 , C03B32/02 , C03C10/00 , C03C17/02 , C03C17/23 , C03C17/34 , C30B31/10 , H01L21/00 , C03C21/00
CPC分类号: C30B31/10 , C03B23/207 , C03B32/02 , C03C10/0009 , C03C17/02 , C03C17/23 , C03C17/3411 , C03C17/3417 , H01L21/00 , C03C2217/213 , C03C2217/24 , C03C2218/17
摘要: Quartz glass element, such as a diffusion tube useful in the production of semiconductor elements, capable of forming an outer layer of uniformly fine crystalline silica such as cristobalite or tridymite when heated to a temperature at which such crystalline silica forms containing crystallization promoting nuclei having a rate of diffusion in quartz glass less than that of sodium at elevated temperatures. Such nuclei are preferably present in the outer half of the element wall. When the quartz glass element is exposed to elevated temperatures, the nuclei promotes the formation of the outer layer of uniformly fine crystalline silica which imparts thermal dimensional stability for extended periods of use at elevated temperatures.
摘要翻译: 石英玻璃元件,例如可用于制造半导体元件的扩散管,当加热至含有结晶促进核的结晶二氧化硅形成的温度时,能够形成均匀细微结晶二氧化硅的外层,例如方石英或鳞石英, 石英玻璃中的扩散速率低于钠在高温下的扩散速率。 这种核优选存在于元件壁的外半部中。 当石英玻璃元件暴露于升高的温度时,核促进了均匀细微结晶二氧化硅的外层的形成,其在高温下赋予长时间使用的热尺寸稳定性。
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公开(公告)号:US3728186A
公开(公告)日:1973-04-17
申请号:US3728186D
申请日:1970-11-27
发明人: MOHN H
CPC分类号: C03B29/02 , C03B23/20 , G02B5/08 , Y10T156/1056
摘要: METHOD OF FORMING A LIGHTWEIGHT OPTICAL STRUCTURE SUCH AS A MIRROR OR WINDOW MADE UP OF AN OPTICAL PLATE OF QUARTZ FUSED TO A PERFORATED SUPPORT PLATE OR QUARTZ OR FUSED SILICA BY PLACING THE OPTICAL PLATE ON THE PERFORATED SUPPORT PLATE IN SUCH POSITION THAT THE REAR SURFACE OF THE OPTICAL PLATE COVERS THE PERFORATION OPENING, AND DIRECTING A HIGH INTENSITY, HIGH TEMPRATURE SOURCE OF RADIANT HEAT ONTO THE OPTICAL SURFACE OF THE OPTICAL PLATE WHEREBY TO PREFERENTIALLY HEAT THE AREAS OF CONTACT BETWEEN THE OPTICAL PLATE AND THE WALLS OF THE PERFORATED SUPPORT TO SELECTIVELY FUSE SUCH AREAS AND TO CAUSE A PORTION OF THE REAR FACE OFTHE OPTICAL PLATE TO DEFORM AND CONVEXEDLY DEPEND INTO THE PERFORATIONS OF THE SUPPORT PLATE. THE RESULTING OPTICAL STRUCTURE IS ALSO DESCRIBED.
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公开(公告)号:US2988803A
公开(公告)日:1961-06-20
申请号:US78030558
申请日:1958-12-15
IPC分类号: B21B39/00
CPC分类号: B21B39/008 , Y10T29/49549
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公开(公告)号:US3957476A
公开(公告)日:1976-05-18
申请号:US370075
申请日:1973-06-14
申请人: Karlheinz Rau
发明人: Karlheinz Rau
CPC分类号: C03C17/25 , C03C21/00 , C03C2217/213 , C03C2217/24 , C03C2218/11 , C03C2218/112
摘要: Quartz glass element, such as a diffusion tube useful in the production of semiconductor elements, capable of forming an outer layer of uniformly fine crystalline silica such as cristobalite or tridymite when heated to a temperature at which such crystalline silica forms containing crystallization promoting nuclei having a rate of diffusion in quartz glass less than that of sodium at elevated temperatures. Such nuclei are present in the outer half of the element wall and the maximum concentration of such nuclei is at the surface of the element and then diminishes inwardly. When the quartz glass element is exposed to elevated temperatures, the nuclei promotes the formation of the outer layer of uniformly fine crystalline silica which imparts thermal dimensional stability for extended periods of use at elevated temperatures.
摘要翻译: 石英玻璃元件,例如可用于制造半导体元件的扩散管,当加热至含有结晶促进核的结晶二氧化硅形成的温度时,能够形成均匀细微结晶二氧化硅的外层,例如方石英或鳞石英, 石英玻璃中的扩散速率低于钠在高温下的扩散速率。 这种核存在于元件壁的外半部分中,并且这种核的最大浓度位于元件的表面,然后向内减小。 当石英玻璃元件暴露于升高的温度时,核促进了均匀细微结晶二氧化硅的外层的形成,其在高温下赋予长时间使用的热尺寸稳定性。
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公开(公告)号:US3927697A
公开(公告)日:1975-12-23
申请号:US38343273
申请日:1973-07-27
发明人: BAUMLER PETER , HOFER GERHARD , KORNER TASSILO , MOHN HEINRICH , SEILER KARL , SIMMAT FRITZ , RAU KARLHEINZ
IPC分类号: C03B23/20 , C03B23/207 , C03B32/02 , C03C10/00 , C03C17/02 , C03C17/23 , C03C17/34 , H01L21/00 , B32B17/06 , F16L9/14
CPC分类号: C03C17/3417 , C03B23/20 , C03B23/207 , C03B32/02 , C03C10/0009 , C03C17/02 , C03C17/23 , C03C17/3411 , C03C2217/213 , C03C2217/24 , C03C2218/17 , H01L21/00 , Y10S65/08 , Y10S65/09 , Y10T428/1317 , Y10T428/24802 , Y10T428/252
摘要: Quartz glass element, such as a diffusion tube useful in the production of semiconductor elements, capable of forming an outer layer of uniformly fine crystalline silica such as cristobalite or tridymite when heated to a temperature at which such crystalline silica forms containing crystallization promoting nuclei having a rate of diffusion in quartz glass less than that of sodium at elevated temperatures. Such nuclei are preferably present in the outer half of the element wall. When the quartz glass element is exposed to elevated temperatures, the nuclei promotes the formation of the outer layer of uniformly fine crsytalline silica which imparts thermal dimensional stability for extended periods of use at elevated temperatures.
摘要翻译: 石英玻璃元件,例如可用于制造半导体元件的扩散管,当加热至含有结晶促进核的结晶二氧化硅形成的温度时,能够形成均匀细微结晶二氧化硅的外层,例如方石英或鳞石英, 石英玻璃中的扩散速率低于钠在高温下的扩散速率。 这种核优选存在于元件壁的外半部中。 当石英玻璃元件暴露于升高的温度时,核促进均匀细小的硅藻土二氧化硅的外层的形成,其在高温下赋予长时间使用的热尺寸稳定性。
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公开(公告)号:US3925583A
公开(公告)日:1975-12-09
申请号:US33013673
申请日:1973-02-06
发明人: RAU KARLHEINZ , SEILER KARL
CPC分类号: C03C17/3411 , C03C17/02 , C03C2217/40 , Y10T428/1317 , Y10T428/2495
摘要: A composite quartz glass body such as a hollow body, e.g., a diffusion tube or ampoule for carrying out diffusion processes for making solid state components includes an inner layer of synthetic quartz glass and an outer layer of quartz glass fused onto the inner layer from quartz crystal granules, the outer layer having a portion thereof which covers or envelops the inner layer and contains diffusion inhibitors of hydroxyl ions, divalent cations or small air bubbles.
摘要翻译: 诸如中空体的复合石英玻璃体,例如扩散管或安瓿,用于进行用于制备固体成分的扩散工艺,包括合成石英玻璃的内层和从石英熔融在内层上的石英玻璃外层 晶体颗粒,外层具有覆盖或包围内层的部分,并且包含羟基离子,二价阳离子或小气泡的扩散抑制剂。
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公开(公告)号:US3882901A
公开(公告)日:1975-05-13
申请号:US38432973
申请日:1973-07-30
发明人: SEILER KARL , RAU KARLHEINZ
IPC分类号: C03B20/00 , C03C3/06 , C03C17/02 , C03C21/00 , C30B31/10 , H01L21/22 , F16L9/14 , B32B17/06 , F16L9/10
CPC分类号: F16L9/105 , C03C3/06 , C30B31/10 , Y10S138/02 , Y10T428/1317
摘要: A tubular quartz glass body useful in carrying out diffusion processes in semiconductor technology has an inner tubular portion of high-purity synthetic quartz glass which is fused to a surrounding portion of fused quartz crystal granules or powder. Then surrounding, enveloping portion has an outer layer of finely crystalline cristobalite or in the outer surface layer thereof, crystallization promoting nuclei capable of forming an outer layer of crystalline silica. The nuclei are not semiconductor poisons and have a rate of diffusion in quartz glass less than that of sodium at elevated temperatures, such as temperatures encountered in diffusion processes which are between 1,200* and 1,380*C.
摘要翻译: 可用于在半导体技术中进行扩散处理的管状石英玻璃体具有与熔融的石英晶体颗粒或粉末的周围部分熔合的高纯度合成石英玻璃的内部管状部分。 然后围绕的包封部分具有精细晶体方英石的外层或其外表面层,能够形成结晶二氧化硅外层的结晶促进核。 细胞核不是半导体毒物,并且在升高的温度下,例如在1,200至1380℃的扩散过程中遇到的温度,石英玻璃中的扩散速率低于钠。
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