公开(公告)号：US20130040856A1

公开(公告)日：2013-02-14

申请号：US13513618

申请日：2010-12-02

申请人： Chad A. Mirkin ,  Adam B. Braunschweig ,  Jinan Chai ,  Dan J. Eichelsdoerfer ,  Louise R. Giam ,  Xing Liao ,  Lu Shin Wong

发明人： Chad A. Mirkin ,  Adam B. Braunschweig ,  Jinan Chai ,  Dan J. Eichelsdoerfer ,  Louise R. Giam ,  Xing Liao ,  Lu Shin Wong

IPC分类号： C40B50/14 ,  C40B50/18 ,  C40B40/18 ,  C40B40/04 ,  C40B30/08 ,  C40B40/00 ,  B82Y5/00

CPC分类号： G03F7/0002 ,  B01J2219/00387 ,  B82Y10/00 ,  B82Y40/00

摘要： The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.

摘要翻译： 本公开涉及一种在衬底表面上形成具有多个尺寸的图案元件的图案的方法，该倾斜笔阵列包括相对于衬底选择笔阵列的倾斜几何形状，从而引起笔之间的倾斜几何形状 阵列和衬底表面，并且用标称笔阵列在衬底表面上形成具有图形元素的图案，由此形成的图案元素的尺寸沿着倾斜的轴线或轴线跨越衬底表面变化。 例如，倾斜几何形状参考衬底表面并且包括相对于衬底的第一轴线的第一角度和相对于衬底的第二轴线的第二角度，第二轴线垂直于第一轴线 并且第一和第二角度中的至少一个是非零。