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公开(公告)号：US20080107820A1
公开(公告)日：2008-05-08
申请号：US11664455
申请日：2005-10-19
IPC分类号： C23C16/513
CPC分类号： C08J7/047 , B05D1/62 , B05D7/02 , B05D2201/02 , B05D2252/02 , C08J2369/00 , C08J2483/00 , C23C16/401
摘要： A process for depositing a layer of a plasma polymerized organosiloxane, siloxane or silicon oxide onto the surface of an organic polymeric substrate by atmospheric pressure glow discharge deposition from a gaseous mixture comprising a silicon containing compound and an oxidant, characterized in that the oxidant comprises N2O.
摘要翻译： 一种通过由包含含硅化合物和氧化剂的气体混合物的大气压辉光放电沉积将等离子体聚合的有机硅氧烷，硅氧烷或氧化硅层沉积在有机聚合物基材的表面上的方法，其特征在于氧化剂包括N 2 O。
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公开(公告)号：US06815014B2
公开(公告)日：2004-11-09
申请号：US10357019
申请日：2003-02-03
IPC分类号： C08F246
CPC分类号： C23C16/45565 , B05D1/62 , C23C16/401 , C23C16/503 , C23C16/509 , C23C16/54
摘要： A process for creating plasma polymerized deposition on a substrate by a corona discharge is described. The corona discharge is created between an electrode and a counterelectrode supporting a substrate. A mixture of a balance gas and a working gas is flowed rapidly through the electrode, plasma polymerized by corona discharge, and deposited onto the substrate as an optically clear coating or to create surface modification. The process, which is preferably carried out at or near atmospheric pressure, can be designed to create an optically clear powder-free or virtually powder free deposit of polymerized plasma that provides a substrate with properties such as surface modification, chemical resistance, and barrier to gases.
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