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公开(公告)号：US20070068657A1
公开(公告)日：2007-03-29
申请号：US11526031
申请日：2006-09-25
IPC分类号： H05K7/20
CPC分类号： H05K7/20336 , F28D15/0233 , F28D15/046 , H01L23/427 , H01L2224/16225
摘要： A sheet-shaped heat pipe including working fluid, a partition plate having a vapor flow path which is formed by a concave portion provided in a spacer and through which vapor of the working fluid passes and a fluid flow path provided on an inner surface of the concave portion through which the working fluid passes, a container with an opening portion, which includes the working fluid and the partition plate inside thereof, and a sealed portion for hermetically sealing the opening portion of the container. Since container has a laminated structure of at least a metal film and a resin film, it realizes a sheet-shaped heat pipe with high flexibility and little deterioration of a sealing performance.
摘要翻译： 一种包括工作流体的片状热管，具有蒸气流路的隔板，该蒸气流路由设置在间隔件中的凹部形成，工作流体的蒸气通过该分隔板和设置在该内壁的内表面的流体流路 工作流体通过的凹部，具有开口部的容器，其内部包括工作流体和分隔板，以及用于气密地密封容器的开口部的密封部。 由于容器具有至少金属膜和树脂膜的层压结构，所以实现了具有高柔性的片状热管，密封性能的劣化很小。
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2.发明申请Sheet type fluid circulating apparatus and electronic device cooler structure using the same 审中-公开片式流体循环装置和使用其的电子装置冷却器结构公开(公告)号：US20070029070A1
公开(公告)日：2007-02-08
申请号：US11493486
申请日：2006-07-27
CPC分类号： F04B43/043 , F04B43/021 , F04B53/1077 , F28D15/0233 , F28D15/0275 , F28D15/043 , H01L23/473 , H01L2924/0002 , H01L2924/00
摘要： A sheet type fluid circulating apparatus includes: a fluid path having a closed structure provided in an inner space of a stacked flexible sheet; fluid filled in the fluid path; a fluid transport unit provided in at least a part of the fluid path of the flexible sheet to circulate the fluid in the fluid path; and a control ciruit unit for controlling the fluid transport unit. A flexible compact light-weight sheet type fluid circulating apparatus can be provided, and a circuit board or a specimen in a biomedical process can be individually and optimally cooled.
摘要翻译： 片状流体循环装置包括：设置在层叠的柔性片的内部空间中的具有封闭结构的流体路径; 填充在流体路径中的流体; 液体输送单元，设置在所述柔性片的所述流体路径的至少一部分中，以使所述流体在所述流体路径中循环; 以及用于控制流体输送单元的控制电路单元。 可以提供柔性紧凑型重量轻的片状流体循环装置，并且生物医学过程中的电路板或试样可以单独和最佳地冷却。
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公开(公告)号：US20050011453A1
公开(公告)日：2005-01-20
申请号：US10920180
申请日：2004-08-18
IPC分类号： C23C16/505 , H01J37/32 , C23C16/00
CPC分类号： H01J37/32623 , C23C16/505
摘要： The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter-electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.
摘要翻译： 通过将特定的气体引入到其中设置有等离子体阱的真空室中，将真空室的内部保持在特定的压力。 同时，通过作为排气装置的泵进行室的抽真空，并且通过对电极使用的高频电源将100MHz的高频功率提供给对电极。 因此，在真空室内产生均匀的等离子体，其中等离子体处理如蚀刻，沉积和表面重整可以与放置在基板电极上的基板均匀地进行。
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公开(公告)号：US06808759B1
公开(公告)日：2004-10-26
申请号：US09511398
申请日：2000-02-23
IPC分类号： H05H146
CPC分类号： H01J37/32623 , C23C16/505
摘要： The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.
摘要翻译： 通过将特定的气体引入到其中设置有等离子体阱的真空室中，将真空室的内部保持在特定的压力。 同时，通过作为排气装置的泵进行室的抽真空，并且通过对电极使用的高频电源将100MHz的高频功率提供给对电极。 因此，在真空室内产生均匀的等离子体，其中等离子体处理如蚀刻，沉积和表面重整可以与放置在基板电极上的基板均匀地进行。
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5.发明授权Apparatus for applying panning effects to musical tone signals and for periodically moving a location of sound image 失效用于对音乐信号应用平移效果并周期性地移动声像的位置的装置
公开(公告)号：US5127306A
公开(公告)日：1992-07-07
申请号：US771516
申请日：1991-10-02
申请人： Akio Mitsuhashi , Teruo Jinbo
发明人： Akio Mitsuhashi , Teruo Jinbo
CPC分类号： G10H7/002 , G10H1/0091 , G10H2210/305 , Y10S84/01
摘要： An apparatus for producing panned tones comprises tone generator for generating a plurality of tone signals, the tone generator including a plurality of channels each for generating one of the plurality of tone signals. The plurality of tone signals generated by the tone generator are grouped into a plurality of groups. A pan setting device is provided for setting, for each of the plurality of groups, a manner of how the respective groups are pan-controlled. A pan effecting device is provided for automatically pan controlling said each of the plurality of groups based on respective settings of the pan setting device so that tone panning effects are produced according to each of the plurality of groups. The pan setting device sets characteristic for each of the plurality of groups to move a location of a formed sound image periodically when the plurality of groups of tone signals is output. A movement speed and a movement range wherein a location of the formed sound image periodically moves around may also be controlled.
摘要翻译： 一种用于产生平移音调的装置包括用于产生多个音调信号的乐音发生器，该音调发生器包括多个通道，每个通道用于产生多个音调信号之一。 由乐音发生器产生的多个音调信号被分组成多组。 提供摇摄设定装置，用于为多个组中的每一组设定如何对各组进行泛控制的方式。 提供摇摄效果装置，用于根据摇摄设定装置的相应设置自动平移控制多个组中的每个组，使得根据多个组中的每个组产生音调平移效果。 平移设定装置为多个组中的每一个设定特征，以在输出多组音调信号时周期性地移动形成的声音图像的位置。 移动速度和运动范围，其中所形成的声像周期性地移动的位置也可以被控制。
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公开(公告)号：US07513214B2
公开(公告)日：2009-04-07
申请号：US10920180
申请日：2004-08-18
CPC分类号： H01J37/32623 , C23C16/505
摘要： The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter-electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.
摘要翻译： 通过将特定的气体引入到其中设置有等离子体阱的真空室中，将真空室的内部保持在特定的压力。 同时，通过作为排气装置的泵进行室的抽真空，并且通过对电极使用的高频电源将100MHz的高频功率提供给对电极。 因此，在真空室内产生均匀的等离子体，其中等离子体处理如蚀刻，沉积和表面重整可以与放置在基板电极上的基板均匀地进行。
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