公开(公告)号：US06620264B2

公开(公告)日：2003-09-16

申请号：US09879545

申请日：2001-06-11

申请人： Andreas A. Kündig ,  William L. Johnson ,  Alex Dommann

发明人： Andreas A. Kündig ,  William L. Johnson ,  Alex Dommann

IPC分类号： C22C4500

CPC分类号： B22D27/04 ,  B22D15/00 ,  C22C45/001 ,  C22C45/10

摘要： A manufacturing process for casting amorphous metallic parts separates the filling and quenching steps of the casting process in time. The mold is heated to an elevated casting temperature at which the metallic alloy has high fluidity. The alloy fills the mold at the casting temperature, thereby enabling the alloy to effectively fill the spaces of the mold. The mold and the alloy are then quenched together, the quenching occurring before the onset of crystallization in the alloy. With this process, compared to conventional techniques, amorphous metallic parts with higher aspect ratios can be prepared.

公开(公告)号：US06501885B2

公开(公告)日：2002-12-31

申请号：US09757914

申请日：2001-01-10

申请人： Reto Holzner ,  Thomas Brunschwiler ,  Josef Wagner ,  Alex Dommann ,  Andreas Mündle ,  Jakob Jütz

发明人： Reto Holzner ,  Thomas Brunschwiler ,  Josef Wagner ,  Alex Dommann ,  Andreas Mündle ,  Jakob Jütz

IPC分类号： G02B626

CPC分类号： G02B6/4249 ,  G02B6/125

摘要： The optical waveguide coupler comprises a structure (1) of a number of elongated narrow optical waveguide strips (2), which consist respectively of a front area (3), a center area (4) and a coupling area (5). The center area (4) has respective transition areas (6) and (7) to the corresponding area (3) or (5). A gap (9) in the front areas (3) provided between two adjoining strips (2) is larger than the thickness of the narrow strips (2). The front faces (8) of the front areas (3), and the front faces of the coupling areas (5) are embodied to be as smooth as possible, wherein all strips form a stack in the coupling area (5). The gaps are pits which result from etching of an Si substrate with the aid of a DRIE etching process.

摘要翻译： 光波导耦合器包括分别由前区域（3），中心区域（4）和耦合区域（5）组成的多个细长窄光波导条（2）的结构（1）。 中心区域（4）具有到相应区域（3）或（5）的各自的过渡区域（6）和（7）。 设置在两个邻接条（2）之间的前区域（3）中的间隙（9）大于窄条（2）的厚度。 前区域（3）的前表面（8）和联接区域（5）的前表面被实施为尽可能平滑，其中所有条带在耦合区域（5）中形成堆叠。 间隙是借助于DRIE蚀刻工艺蚀刻Si衬底产生的凹坑。

公开(公告)号：US06203637B1

公开(公告)日：2001-03-20

申请号：US09172598

申请日：1998-10-15

申请人： Alex Dommann ,  Christoph Benno Luechinger-Bautista ,  Nicolino Onda ,  Juergen Ramm ,  Heinrich Zimmerman

发明人： Alex Dommann ,  Christoph Benno Luechinger-Bautista ,  Nicolino Onda ,  Juergen Ramm ,  Heinrich Zimmerman

IPC分类号： B32B3116

CPC分类号： H01J37/32431 ,  B08B7/0035 ,  B23K1/206 ,  H01J2237/335 ,  H01J2237/338

摘要： A method uses a treatment process for surfaces which subsequently are to be connected by bonding, gluing or molding. The surfaces are exposed to an atmosphere with activated hydrogen. The connection is made a process step for eliminating the conservation treatment. The surfaces can be subjected to a plasma discharge in an atmosphere containing hydrogen. The plasma discharge is operated by a cathode/anode path as a DC discharge, and using a thermionic cathode as the cathode. The workpiece to be stored in air comprises a connection, which by gluing, bonding or molding, is subjectable to substantially higher stress than an identical workpiece which is stored in an identical manner, this being determinable by essentially identical Auger diagrams.

公开(公告)号：US06503351B2

公开(公告)日：2003-01-07

申请号：US09729176

申请日：2000-12-05

申请人： Alex Dommann ,  Christoph Benno Luechinger-Bautista ,  Nicolino Onda ,  Juergen Ramm ,  Heinrich Zimmerman

发明人： Alex Dommann ,  Christoph Benno Luechinger-Bautista ,  Nicolino Onda ,  Juergen Ramm ,  Heinrich Zimmerman

IPC分类号： B32B3116

CPC分类号： H01J37/32431 ,  B08B7/0035 ,  B23K1/206 ,  H01J2237/335 ,  H01J2237/338

摘要： A method uses a treatment process for surfaces which subsequently are to be connected by bonding, gluing or molding. The surfaces are exposed to an atmosphere with activated hydrogen. The connection is made a process step for eliminating the conservation treatment. The surfaces can be subjected to a plasma discharge in an atmosphere containing hydrogen. The plasma discharge is operated by a cathode/anode path as a DC discharge, and using a thermionic cathode as the cathode. The workpiece to be stored in air comprises a connection, which by gluing, bonding or molding, is subjectable to substantially higher stress than an identical workpiece which is stored in an identical manner, this being determinable by essentially identical Auger diagrams.

摘要翻译： 一种方法使用用于通过粘合，胶合或模制连接的表面的处理工艺。 表面暴露于活性氢气氛中。 该连接是消除保护处理的过程步骤。 表面可以在含氢的气氛中进行等离子体放电。 等离子体放电由作为直流放电的阴极/阳极路径操作，并且使用热离子阴极作为阴极。 待储存在空气中的工件包括通过胶合，粘合或模制而形成的连接件，其能够以相同方式存储的相同的工件受到比相同工件大得多的应力，这可通过基本上相同的俄歇图来确定。