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公开(公告)号:US4522149A
公开(公告)日:1985-06-11
申请号:US553962
申请日:1983-11-21
IPC分类号: C23C16/00 , C23C16/44 , C23C16/458 , H01L21/205 , C23C13/08
CPC分类号: C23C16/458
摘要: A reactor for use in a chemical vapor deposition process occurring in a radiant absorption heater system employs a vertical gas flow reaction vessel and a novel substantially solid susceptor configured as a truncated wedge. The susceptor is characterized by a high utilized area, resulting in a high wafer capacity and low power requirement.
摘要翻译: 用于在辐射吸收加热器系统中发生的化学气相沉积工艺的反应器使用垂直气流反应容器和构造为截头楔形物的新颖的基本上固体的基座。 基座的特点是利用率高,导致晶圆容量高,功率要求低。
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公开(公告)号:US4499354A
公开(公告)日:1985-02-12
申请号:US433158
申请日:1982-10-06
IPC分类号: C23C16/46 , B01J19/00 , C23C16/458 , C23C16/48 , C30B25/12 , H01L21/203 , H01L21/205 , H05B6/10
CPC分类号: C30B25/12 , C23C16/4581 , C23C16/481
摘要: A susceptor for use in a chemical vapor deposition process in a radiant absorption heating system comprises a heater adapted to absorb radiant energy and a sheath of high purity quartz completely surrounding the heater. The sheath further comprises dimples inside the sheath spacing the sheath from the heater. The heater may be graphite having a substantially pinhole-free outgas-inhibiting outer-coating such as silicon carbide.
摘要翻译: 在辐射吸收加热系统中用于化学气相沉积工艺的感受体包括适于吸收辐射能的加热器和完全围绕加热器的高纯度石英鞘。 护套还包括护套内部的凹坑,使护套与加热器间隔开。 加热器可以是具有基本上无针孔的抑制气体外涂层(例如碳化硅)的石墨。
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