公开(公告)号：US20130316620A1

公开(公告)日：2013-11-28

申请号：US13479295

申请日：2012-05-24

申请人： André Loebmann ,  Norman Nagel

发明人： André Loebmann ,  Norman Nagel

IPC分类号： H01L21/683

CPC分类号： B24B37/10 ,  B24B7/228 ,  B24B37/042 ,  B24B37/27 ,  B24B37/32

摘要： A retainer ring is provided for use in conjunction with Chemical Mechanical Polishing apparatus which polishing is used to polish a substrate. Particularly, the retainer ring includes an inner surface defining a retainer area, an outer surface, a front surface extending between the inner and outer surface, the front surface being in contact with the polishing pad during polishing and a transition region between the outer surface and the front surface. A CMP apparatus which includes at least a ring having the above features is also provided for.

摘要翻译： 提供了一种用于与化学机械抛光设备结合使用的保持环，抛光用于抛光基底。 特别地，保持环包括限定保持器区域的内表面，外表面，在内表面和外表面之间延伸的前表面，前表面在抛光期间与抛光垫接触，并且在外表面和外表面之间的过渡区域 前面。 还提供了包括至少具有上述特征的环的CMP装置。

公开(公告)号：US09193027B2

公开(公告)日：2015-11-24

申请号：US13479295

申请日：2012-05-24

申请人： André Loebmann ,  Norman Nagel

发明人： André Loebmann ,  Norman Nagel

IPC分类号： B24B37/10 ,  B24B37/04 ,  B24B7/22 ,  B24B37/27 ,  B24B37/32

CPC分类号： B24B37/10 ,  B24B7/228 ,  B24B37/042 ,  B24B37/27 ,  B24B37/32

摘要： A retainer ring is provided for use in conjunction with Chemical Mechanical Polishing apparatus which polishing is used to polish a substrate. Particularly, the retainer ring includes an inner surface defining a retainer area, an outer surface, a front surface extending between the inner and outer surface, the front surface being in contact with the polishing pad during polishing and a transition region between the outer surface and the front surface. A CMP apparatus which includes at least a ring having the above features is also provided for.

摘要翻译： 提供了一种用于与化学机械抛光设备结合使用的保持环，抛光用于抛光基底。 特别地，保持环包括限定保持器区域的内表面，外表面，在内表面和外表面之间延伸的前表面，前表面在抛光期间与抛光垫接触，并且在外表面和外表面之间的过渡区域 前面。 还提供了包括至少具有上述特征的环的CMP装置。