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1.发明授权Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof 有权双层体系包括聚二甲基戊二酰亚胺基底层及其组合物公开(公告)号：US08323868B2
公开(公告)日：2012-12-04
申请号：US12613800
申请日：2009-11-06
发明人： Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Hoa D. Truong
CPC分类号： G03F7/091 , G03F7/0392 , G03F7/095
摘要： Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.
摘要翻译： 双层体系包括由聚二甲基戊二酰亚胺形成的底层，酸不稳定溶解抑制剂和光酸产生剂。 双层系统可以在单一的曝光和开发过程中暴露和发展。
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公开(公告)号：US07993812B2
公开(公告)日：2011-08-09
申请号：US12507968
申请日：2009-07-23
发明人： Luisa D. Bozano , Hiroshi Ito , Linda K. Sundberg
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106
摘要： Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a photoacid generator; and a solvent, and wherein the blend and the photoacid generator are soluble in the solvent. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
摘要翻译： 光致抗蚀剂组合物包括至少一种完全保护的杯[4]间苯二酚和至少一种未保护的杯[4]间苯二酚的共混物，其中完全保护的杯[4]间苯二酚具有用酸不稳定保护基保护的酚基; 光致酸发生器; 和溶剂，并且其中所述共混物和光致酸产生剂可溶于溶剂中。 还公开了使用光致抗蚀剂组合物在衬底上产生抗蚀剂图像的方法。
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