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公开(公告)号:US20060046183A1
公开(公告)日:2006-03-02
申请号:US10927984
申请日:2004-08-26
申请人: Wang Yueh , Shane Nolen , Balijeet Bains , Alison Noble , Rex Frost
发明人: Wang Yueh , Shane Nolen , Balijeet Bains , Alison Noble , Rex Frost
IPC分类号: G03C1/76
CPC分类号: G03F7/322 , G03F7/0046 , G03F7/0048 , G03F7/0392
摘要: A composition including a photoresist formulation and a surfactant additive is described herein.
摘要翻译: 本文描述了包含光致抗蚀剂制剂和表面活性剂添加剂的组合物。