公开(公告)号：US20070089674A1

公开(公告)日：2007-04-26

申请号：US11564276

申请日：2006-11-28

申请人： Bradley Aitchison ,  Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Martti Sonninen ,  Tommy Turkulainen

发明人： Bradley Aitchison ,  Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Martti Sonninen ,  Tommy Turkulainen

IPC分类号： C23C16/00 ,  B01D46/00

CPC分类号： B01D45/06 ,  C23C16/4402 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/4557 ,  C30B25/14 ,  Y10S55/14

摘要： A precursor delivery system includes a flow path from a precursor container to a reaction space of a thin film deposition system, such as an atomic layer deposition (ALD) reactor. At least a portion of the flow path may be formed in one or more blocks of thermally conductive material forming an elongate thermally conductive body extending from the precursor container toward the reaction space. In some embodiments, a heater is thermally associated with the thermally conductive body to inhibit condensation of precursor vapor in the flow path. A high conductivity particle filter having inertial traps is preferably included for filtering particles from the precursor material. The particle filter preferably include a filter passage including turns and inertial traps adjacent the turns. In some embodiments, the filter passage and the inertial traps may be formed in the thermally conductive body between the precursor container and the reaction space.

摘要翻译： 前体递送系统包括从前体容器到诸如原子层沉积（ALD）反应器的薄膜沉积系统的反应空间的流动路径。 流路的至少一部分可以形成在一个或多个导热材料块中，形成从前体容器朝向反应空间延伸的细长导热体。 在一些实施例中，加热器与导热体热关联，以阻止前述流体在流路中的冷凝。 优选包括具有惯性陷阱的高电导率粒子滤波器，用于从前体材料过滤颗粒。 颗粒过滤器优选包括过滤器通道，该过滤器通道包括与匝相邻的匝和惯性掣子。 在一些实施例中，过滤器通道和惯性陷阱可以形成在前体容器和反应空间之间的导热体中。

公开(公告)号：US20060174945A1

公开(公告)日：2006-08-10

申请号：US11278482

申请日：2006-04-03

申请人： Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Bradley Aitchison

发明人： Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Bradley Aitchison

IPC分类号： F16K7/12

CPC分类号： F16K31/0693 ,  F16K7/14 ,  F16K31/06 ,  F16K49/002 ,  Y10T137/6606

摘要： A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a flexible diaphragm operable to flex between an open position whereby a valve passage is at least partially open and a closed position whereby a substantial portion of a first side of the diaphragm is pressed against a valve seat to thereby block the valve passage and facilitate heat transfer between the valve seat and the diaphragm. In some embodiments, a heating body thermally contacts the valve body and extends proximal to a second side of the diaphragm opposite the first side thereof to form a thermally conductive pathway that facilitates maintaining an operating temperature at the diaphragm. A thermally resistive member may be interposed between the valve passage and an actuator, such as a solenoid, for attenuating heat transfer between the valve passage and the actuator.

摘要翻译： 适于在原子层沉积系统中使用的截止型隔膜阀包括可操作以在打开位置之间弯曲的柔性隔膜，由此阀通道至少部分打开，并且闭合位置，从而使第 隔膜被压靠在阀座上，从而阻塞阀通道并促进阀座与隔膜之间的热传递。 在一些实施例中，加热体与阀体热接触并且在隔膜的与其第一侧相对的第二侧附近延伸，以形成便于维持隔膜处的工作温度的导热通路。 可以在阀通道和诸如螺线管的致动器之间插入热阻构件，用于减弱阀通道和致动器之间的热传递。

公开(公告)号：US20050011555A1

公开(公告)日：2005-01-20

申请号：US10609134

申请日：2003-06-26

申请人： Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Bradley Aitchison

发明人： Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Bradley Aitchison

IPC分类号： F16K7/14 ,  F16K31/06 ,  F16K49/00

CPC分类号： F16K31/0693 ,  F16K7/14 ,  F16K49/002 ,  Y10T137/0318 ,  Y10T137/6416 ,  Y10T137/6606

摘要： A diaphragm valve includes a pressure vent communicating with an enclosed space behind the diaphragm for reducing resistance to transitioning of the diaphragm between the open and closed positions. In some implementations, a pump or other source of suction is coupled to the pressure vent to reduce fluid pressure in the enclosed space. When used in an atomic layer deposition (ALD) system, the venting and suction improves the thin film deposition process and prevents leakage through the valve of potentially toxic ALD precursor vapors. Features for thermal management and reliability enhancement are also described.

公开(公告)号：US20070117383A1

公开(公告)日：2007-05-24

申请号：US11564272

申请日：2006-11-28

申请人： Bradley Aitchison ,  Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Martti Sonninen ,  Tommy Turkulainen

发明人： Bradley Aitchison ,  Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Martti Sonninen ,  Tommy Turkulainen

IPC分类号： H01L21/44 ,  C23C16/00

CPC分类号： B01D45/06 ,  C23C16/4402 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/4557 ,  C30B25/14 ,  Y10S55/14

摘要： A precursor delivery system includes a flow path from a precursor container to a reaction space of a thin film deposition system, such as an atomic layer deposition (ALD) reactor. A staging volume is preferably established between the precursor container and the reaction space for receiving at least one dose of the precursor material from the precursor container, and from which pulses are released toward the reaction space. A pulse control device is preferably interposed between the staging volume and the reaction space. A sensor may sense a physical condition in the staging volume for providing feedback to a controller of the precursor delivery system, for performance monitoring and control.

摘要翻译： 前体递送系统包括从前体容器到诸如原子层沉积（ALD）反应器的薄膜沉积系统的反应空间的流动路径。 优选地，在前体容器和反应空间之间建立分级体积，用于从前体容器接收至少一剂量的前体材料，并且从该脉冲向反应空间释放脉冲。 优选地，在分级体积和反应空间之间插入脉冲控制装置。 传感器可以感测分级体积中的物理状况，以向前体递送系统的控制器提供反馈，以进行性能监测和控制。