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公开(公告)号:US06272712B1
公开(公告)日:2001-08-14
申请号:US09612537
申请日:2000-07-07
申请人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw , Michael Ravkin
发明人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw , Michael Ravkin
IPC分类号: A46B1302
CPC分类号: H01L21/67046
摘要: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
摘要翻译: 半导体处理系统,例如用于同时洗涤晶片的两侧的系统,其包括用于与高酸性或其它挥发性化学溶液一起使用的刷盒容纳装置,辊定位装置和(刷)放置 设备。
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公开(公告)号:US5809832A
公开(公告)日:1998-09-22
申请号:US705162
申请日:1996-08-29
申请人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw
发明人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw
CPC分类号: H01L21/67028 , Y10S414/136 , Y10T74/18648
摘要: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
摘要翻译: 半导体处理系统,例如用于同时洗涤晶片的两侧的系统,其包括用于与高酸性或其它挥发性化学溶液一起使用的刷盒容纳装置,辊定位装置和(刷)放置 设备。
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公开(公告)号:US6119295A
公开(公告)日:2000-09-19
申请号:US285356
申请日:1999-04-02
申请人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw
发明人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw
IPC分类号: H01L21/304 , A46B13/02 , B08B1/04 , B24B29/02 , B24B37/04 , H01L21/00 , B08B11/00 , B08B13/00
CPC分类号: H01L21/67046 , B08B1/04 , B24B29/02 , B24B37/04 , H01L21/67028
摘要: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
摘要翻译: 半导体处理系统,例如用于同时洗涤晶片的两侧的系统,其包括用于与高酸性或其它挥发性化学溶液一起使用的刷盒容纳装置,辊定位装置和(刷)放置 设备。
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公开(公告)号:US5794299A
公开(公告)日:1998-08-18
申请号:US705115
申请日:1996-08-29
申请人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw
发明人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw
CPC分类号: H01L21/67772 , H01L21/67046 , H01L21/6719 , Y10S134/902
摘要: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
摘要翻译: 半导体处理系统,例如用于同时洗涤晶片的两侧的系统,其包括用于与高酸性或其它挥发性化学溶液一起使用的刷盒容纳装置,辊定位装置和(刷)放置 设备。
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公开(公告)号:US4435022A
公开(公告)日:1984-03-06
申请号:US342082
申请日:1982-01-25
申请人: Brett A. Whitelaw
发明人: Brett A. Whitelaw
IPC分类号: B62D55/205 , B62D55/20
CPC分类号: B62D55/205
摘要: A track block for a track-laying vehicle. The block is characterized by an elongated unitary beam, with two diverging links extending radially in a common direction from opposite ends of the beam. The links are constructed to straddle, and to be hinged to, the beam in an adjacent block. Cantilevered from a central portion of the beam, and extending generally in the same direction as and coplanar with the links, is a road-wheel bearing plate, through which received road-wheel bearing forces are carried directly to the links solely through the beam.
摘要翻译: 轨道车辆的履带。 该块的特征在于细长的整体梁,其中两个发散连杆从梁的相对端在共同的方向上径向延伸。 连杆被构造成跨越并铰接到相邻块中的梁。 从梁的中心部分悬伸并且大致沿相同方向延伸并且与连杆共同延伸的是车轮轴承板,通过该车轮承载板,接收的车轮承载力仅通过梁直接承载在连杆上。
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公开(公告)号:US5924154A
公开(公告)日:1999-07-20
申请号:US705161
申请日:1996-08-29
申请人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw , Michael Ravkin
发明人: Thomas R. Gockel , Lorin Olson , Lynn Ryle , Brett A. Whitelaw , Michael Ravkin
IPC分类号: H01L21/304 , A46B13/02 , B08B1/04 , B24B29/02 , B24B37/04 , H01L21/00 , B08B11/00 , B08B13/00
CPC分类号: H01L21/67046 , B08B1/04 , B24B29/02 , B24B37/04 , H01L21/67028
摘要: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
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