METHOD FOR FABRICATING FIRST ELECTRODE OF CAPACITOR
    2.
    发明申请
    METHOD FOR FABRICATING FIRST ELECTRODE OF CAPACITOR 审中-公开
    用于制造电容器的第一电极的方法

    公开(公告)号:US20080057640A1

    公开(公告)日:2008-03-06

    申请号:US11559062

    申请日:2006-11-13

    IPC分类号: H01L21/8244

    摘要: A method for fabricating a first electrode of a capacitor is described. A substrate comprising an insulating layer formed thereon is provided. The insulating layer has an opening. A silicon layer is formed on the insulating layer. The silicon layer is transformed to a hemispherical grain layer. An etching process is performed to remove a portion of the hemispherical grain layer outside the opening.

    摘要翻译: 描述制造电容器的第一电极的方法。 提供了包括其上形成的绝缘层的基板。 绝缘层具有开口。 在绝缘层上形成硅层。 将硅层转变为半球形晶粒层。 进行蚀刻处理以去除开口外部的半球形晶粒层的一部分。