摘要:
The present invention relates to a method of fabricating a CMOS transistor which can further reduce the size of a chip since it is not necessary to consider the metal contact process margin since a gate electrode of a PMOS transistor and a gate electrode of an NMOS transistor are directly connected with a polysilicon wiring during a process of forming the gate electrodes, which can prevent the formation of a parasitic transistor by forming a cell space region in an active region below the polysilicon wiring.
摘要:
A voltage generation circuit of a semiconductor memory device has a charge pump circuit for supplying a voltage required to operate the semiconductor memory device; a voltage divide circuit having a plurality of capacitors and connected to the output of the charge pump circuit to divide the output of the charge pump circuit; an initialization means for discharging charges charged to the plurality of capacitors according to a reset signal; and a differential amplifier for controlling the charge pump circuit according to the result of comparison of the voltage divide circuit and a reference voltage.
摘要:
The present invention discloses a flash memory device, a first well and second well are formed in a substrate, a plurality of memory cell are formed in the second well and arranged in an array having a multiplicity of bit lines and word lines. Voltage is applied to the first well and second well, respectively, with time interval so that an over erasing of the memory cell and lowering of cycling characteristic can be prevented.