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    Method for fabricating thin film metallic meshes for use as Fabry-Perot interferometer elements, filters and other devices
    2.
    发明授权
    Method for fabricating thin film metallic meshes for use as Fabry-Perot interferometer elements, filters and other devices 失效
    制造用作法布里 - 珀罗干涉仪元件，滤光片和其他装置的薄膜金属网格的方法

    公开(公告)号：US4818661A

    公开(公告)日：1989-04-04

    申请号：US79962

    申请日：1987-07-21

    申请人： Charles J. Taylor ,  Julius Grossman ,  Jacqueline Fischer ,  Howard A. Smith ,  Martin C. Peckerar ,  Milton L. Rebbert

    发明人： Charles J. Taylor ,  Julius Grossman ,  Jacqueline Fischer ,  Howard A. Smith ,  Martin C. Peckerar ,  Milton L. Rebbert

    IPC分类号： G03F1/20 ,  G03F7/12 ,  G03C5/00

    CPC分类号： G03F1/20 ,  G03F7/12

    摘要： A method of fabricating a free-standing wire mesh grid pattern having a sth, flat surface is disclosed. A thermal oxide is selectively applied to front and back sides of a silicon substrate. A central portion of the oxide on the back side is removed. A resist layer is applied onto the oxide on the front side of the substrate. A resist mesh pattern with a border encompassing that resist mesh pattern is lithographically developed on the resist layer. Chrome and gold layers are sequentially deposited onto the border and into the resist mesh pattern to create a wire mesh pattern within the resist mesh pattern. The resist layer, including the developed resist mesh pattern, is removed to expose the wire mesh pattern from the front side of the substrate. A nickel layer is deposited over the gold layer to develop a wider wire mesh pattern. A second gold layer is then deposited over the nickel layer to form a wire mesh grid pattern composed of chrome, gold, nickel and gold layers. Central portions of the substrate and the oxide on the front side of the substrate are removed to expose the wire mesh grid pattern from the back side of the substrate. Finally, the chrome layer is removed to produce the desired free-standing wire mesh grid pattern supported by the encompassing metal-clad border.

    摘要翻译： 公开了一种制造具有平滑，平坦表面的独立的网状网格图案的方法。 热氧化物选择性地施加到硅衬底的正面和背面。 去除背面上的氧化物的中心部分。 将抗蚀剂层施加到基板正面上的氧化物上。 在抗蚀剂层上光刻地形成具有包围该抗蚀剂网格图案的边界的抗蚀剂网格图案。 铬和金层依次沉积到边界上并进入抗蚀剂网格图案中以在抗蚀剂网格图案内形成丝网图案。 包括显影的抗蚀剂网格图案的抗蚀剂层被去除以从基板的前侧露出丝网图案。 镍层沉积在金层上以形成更宽的丝网图案。 然后将第二金层沉积在镍层上以形成由铬，金，镍和金层组成的丝网格栅图案。 去除衬底的中心部分和衬底正面上的氧化物，以从衬底的背面露出金属丝网格图案。 最后，去除铬层以产生由围绕金属包覆的边界支撑的所需的独立的网状网格图案。