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公开(公告)号：US20110284035A1
公开(公告)日：2011-11-24
申请号：US13205307
申请日：2011-08-08
申请人： Kian-Soong Poh , Jui-Ling Tang , Chong-Tat Lee , Cheng-Chung Lim
发明人： Kian-Soong Poh , Jui-Ling Tang , Chong-Tat Lee , Cheng-Chung Lim
CPC分类号： B08B7/00 , B08B9/00 , C23C16/4405 , F04D19/042 , F04D29/701 , F05D2260/607
摘要： A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes switching off the turbo pump and using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
摘要翻译： 描述了一种清洁涡轮泵的方法。 涡轮泵与沉积材料的CVD室耦合，从而将材料积聚在其中。 该方法包括关闭涡轮泵并使用另一泵泵送反应性气体，该反应气体可通过涡轮泵与材料反应形成气态产物。 由此，在随后的CVD操作中，净化涡轮泵并防止其成为粒子源。
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公开(公告)号：US20080295867A1
公开(公告)日：2008-12-04
申请号：US11754806
申请日：2007-05-29
申请人： Kian-Soong Poh , Jui-Ling Tang , Chong-Tat Lee , Cheng-Chung Lim
发明人： Kian-Soong Poh , Jui-Ling Tang , Chong-Tat Lee , Cheng-Chung Lim
IPC分类号： B08B9/02
CPC分类号： B08B7/00 , B08B9/00 , C23C16/4405 , F04D19/042 , F04D29/701 , F05D2260/607
摘要： A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
摘要翻译： 描述了一种清洁涡轮泵的方法。 涡轮泵与沉积材料的CVD室耦合，从而将材料积聚在其中。 该方法包括使用另一泵来泵送可通过涡轮泵与反应气体反应的气体，其可以与材料反应形成气态产物。 由此，在随后的CVD操作中，净化涡轮泵并防止其成为粒子源。
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公开(公告)号：US20080260946A1
公开(公告)日：2008-10-23
申请号：US11737972
申请日：2007-04-20
申请人： Hwee-Leong Tan , Cheng-Chung Lim , Jui-Lin Tang , Zhao-Jin Sun , Han-Chuan Fang
发明人： Hwee-Leong Tan , Cheng-Chung Lim , Jui-Lin Tang , Zhao-Jin Sun , Han-Chuan Fang
CPC分类号： C23C16/4405
摘要： A method for cleaning a reaction chamber having a pedestal and a carrier ring is provided. First, the pedestal and the carrier ring are cleaned with a high pressure gas. Next, the carrier ring is moved to leave the pedestal, and a low pressure gas is provided to clean the pedestal, the carrier ring, and an area lay between the pedestal and the carrier ring. Thereafter, a full flush is performed to clean the pedestal and the carrier ring.
摘要翻译： 提供了一种用于清洁具有基座和载体环的反应室的方法。 首先，用高压气体清洁基座和承载环。 接下来，移动承载环离开基座，并且提供低压气体以清洁基座，承载环以及位于基座和承载环之间的区域。 此后，进行完全冲洗以清洁基座和承载环。
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公开(公告)号：US08328938B2
公开(公告)日：2012-12-11
申请号：US12196040
申请日：2008-08-21
申请人： Cheng-Chung Lim , Zhao-Jin Sun , Jui-Ling Tang , Chin-Khye Pang , Yu-Heng Liu
发明人： Cheng-Chung Lim , Zhao-Jin Sun , Jui-Ling Tang , Chin-Khye Pang , Yu-Heng Liu
IPC分类号： B05C5/02
CPC分类号： C23C16/448
摘要： A buffer apparatus and a thin film deposition system are provided. The buffer apparatus is connected between a liquid material supply apparatus and a deposition machine. The buffer apparatus includes a container and a baffle. The container is used for containing a liquid material supplied from the liquid material supply apparatus. The top of the container has an input hole and an output hole. The baffle is disposed in the container and located under the input hole.
摘要翻译： 提供缓冲装置和薄膜沉积系统。 缓冲装置连接在液体材料供给装置和沉积机器之间。 缓冲装置包括容器和挡板。 容器用于容纳从液体材料供给装置供给的液体材料。 容器的顶部有一个输入孔和一个输出孔。 挡板设置在容器中并位于输入孔的下方。
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公开(公告)号：US08277567B2
公开(公告)日：2012-10-02
申请号：US13205307
申请日：2011-08-08
申请人： Kian-Soong Poh , Jui-Ling Tang , Chong-Tat Lee , Cheng-Chung Lim
发明人： Kian-Soong Poh , Jui-Ling Tang , Chong-Tat Lee , Cheng-Chung Lim
CPC分类号： B08B7/00 , B08B9/00 , C23C16/4405 , F04D19/042 , F04D29/701 , F05D2260/607
摘要： A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes switching off the turbo pump and using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
摘要翻译： 描述了一种清洁涡轮泵的方法。 涡轮泵与沉积材料的CVD室耦合，从而将材料积聚在其中。 该方法包括关闭涡轮泵并使用另一泵泵送反应性气体，该反应气体可通过涡轮泵与材料反应形成气态产物。 由此，在随后的CVD操作中，净化涡轮泵并防止其成为粒子源。
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公开(公告)号：US08021492B2
公开(公告)日：2011-09-20
申请号：US11754806
申请日：2007-05-29
申请人： Kian-Soong Poh , Jui-Ling Tang , Chong-Tat Lee , Cheng-Chung Lim
发明人： Kian-Soong Poh , Jui-Ling Tang , Chong-Tat Lee , Cheng-Chung Lim
CPC分类号： B08B7/00 , B08B9/00 , C23C16/4405 , F04D19/042 , F04D29/701 , F05D2260/607
摘要： A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
摘要翻译： 描述了一种清洁涡轮泵的方法。 涡轮泵与沉积材料的CVD室耦合，从而将材料积聚在其中。 该方法包括使用另一泵来泵送可通过涡轮泵与反应气体反应的气体，其可以与材料反应形成气态产物。 由此，在随后的CVD操作中，净化涡轮泵并防止其成为粒子源。
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公开(公告)号：US20100043701A1
公开(公告)日：2010-02-25
申请号：US12196040
申请日：2008-08-21
申请人： Cheng-Chung Lim , Zhao-Jin Sun , Jui-Lin Tang , Chin-Khye Pang , Yu-Heng Liu
发明人： Cheng-Chung Lim , Zhao-Jin Sun , Jui-Lin Tang , Chin-Khye Pang , Yu-Heng Liu
IPC分类号： B05C3/02
CPC分类号： C23C16/448
摘要： A buffer apparatus and a thin film deposition system are provided. The buffer apparatus is connected between a liquid material supply apparatus and a deposition machine. The buffer apparatus includes a container and a baffle. The container is used for containing a liquid material supplied from the liquid material supply apparatus. The top of the container has an input hole and an output hole. The baffle is disposed in the container and located under the input hole.
摘要翻译： 提供缓冲装置和薄膜沉积系统。 缓冲装置连接在液体材料供给装置和沉积机器之间。 缓冲装置包括容器和挡板。 容器用于容纳从液体材料供给装置供给的液体材料。 容器的顶部有一个输入孔和一个输出孔。 挡板设置在容器中并位于输入孔的下方。
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