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    Array substrate and manufacturing method thereof
    2.
    发明授权
    Array substrate and manufacturing method thereof 有权
    阵列基板及其制造方法

    公开(公告)号：US08969146B2

    公开(公告)日：2015-03-03

    申请号：US13615661

    申请日：2012-09-14

    申请人： Yi-Chen Chung ,  Chia-Yu Chen ,  Hui-Ling Ku ,  Yu-Hung Chen ,  Chi-Wei Chou ,  Fan-Wei Chang ,  Hsueh-Hsing Lu ,  Hung-Che Ting

    发明人： Yi-Chen Chung ,  Chia-Yu Chen ,  Hui-Ling Ku ,  Yu-Hung Chen ,  Chi-Wei Chou ,  Fan-Wei Chang ,  Hsueh-Hsing Lu ,  Hung-Che Ting

    IPC分类号： H01L21/84

    CPC分类号： H01L27/1288 ,  H01L21/28008 ,  H01L21/31133 ,  H01L27/1222 ,  H01L27/1225 ,  H01L27/124 ,  H01L2227/323

    摘要： A manufacturing method of an array substrate includes the following steps. A gate electrode and a gate insulator layer are successively formed on a substrate. A semiconductor layer, an etching stop layer, a hard mask layer, and a second patterned photoresist are successively formed on the gate insulator layer. The second patterned photoresist is employed for performing an over etching process to the hard mask layer to form a patterned hard mask layer. The second patterned photoresist is employed for performing a first etching process to the etching stop layer. The second patterned photoresist is then employed for performing a second etching process to the semiconductor layer to form a patterned semiconductor layer. The etching stop layer uncovered by the patterned hard mask layer is then removed for forming a patterned etching stop layer.

    摘要翻译： 阵列基板的制造方法包括以下步骤。 在基板上依次形成栅极电极和栅极绝缘体层。 在栅极绝缘体层上依次形成半导体层，蚀刻停止层，硬掩模层和第二图案化光致抗蚀剂。 第二图案化的光致抗蚀剂用于对硬掩模层进行过蚀刻工艺以形成图案化的硬掩模层。 第二图案化光刻胶用于对蚀刻停止层进行第一蚀刻处理。 然后使用第二图案化的光致抗蚀剂来对半导体层执行第二蚀刻工艺以形成图案化的半导体层。 由图案化的硬掩模层未覆盖的蚀刻停止层然后被去除以形成图案化的蚀刻停止层。

    THIN FILM TRANSISTOR AND FABRICATING METHOD THEREOF
    4.
    发明申请
    THIN FILM TRANSISTOR AND FABRICATING METHOD THEREOF 有权
    薄膜晶体管及其制造方法

    公开(公告)号：US20120168743A1

    公开(公告)日：2012-07-05

    申请号：US13097082

    申请日：2011-04-29

    申请人： Liu-Chung Lee ,  Hung-Che Ting ,  Chia-Yu Chen

    发明人： Liu-Chung Lee ,  Hung-Che Ting ,  Chia-Yu Chen

    IPC分类号： H01L29/12 ,  H01L21/336

    CPC分类号： H01L29/7869 ,  H01L29/78693

    摘要： A thin film transistor (TFT) including a gate, a gate insulator, an oxide semiconductor channel layer, a source, and a drain is provided. The gate insulator covers the gate, while the oxide semiconductor channel layer is configured on the gate insulator and located above the gate. The oxide semiconductor channel layer includes a first sub-layer and a second sub-layer located on the first sub-layer. An oxygen content of the first sub-layer is lower than an oxygen content of the second sub-layer. The source and the drain are configured on a portion of the second sub-layer. In addition, a fabricating method of the above-mentioned TFT is also provided.

    摘要翻译： 提供了包括栅极，栅极绝缘体，氧化物半导体沟道层，源极和漏极的薄膜晶体管（TFT）。 栅极绝缘体覆盖栅极，而氧化物半导体沟道层配置在栅极绝缘体上并位于栅极上方。 氧化物半导体沟道层包括位于第一子层上的第一子层和第二子层。 第一子层的氧含量低于第二子层的氧含量。 源极和漏极配置在第二子层的一部分上。 此外，还提供了上述TFT的制造方法。

    Reversible ratchet mechanism for ratchet tools
    5.
    发明授权
    Reversible ratchet mechanism for ratchet tools 失效
    棘轮工具的可逆棘轮机构

    公开(公告)号：US07677137B1

    公开(公告)日：2010-03-16

    申请号：US12358339

    申请日：2009-01-23

    申请人： Chia-Yu Chen

    发明人： Chia-Yu Chen

    IPC分类号： B25B13/46

    CPC分类号： B25B13/465

    摘要： A reversible ratchet mechanism for ratchet tools comprises a positioning portion the middle section of which is formed with a concave U groove. Two sides of the U groove are each formed with a receiving groove to which a wedge flake is wedged. An elastic part is provided in the U groove to elastically push open the wedge flakes. A reversible ring is set around the positioning portion, the inner circumference of which is formed with two stoppers that may drive the wedge flakes to turn. A ratchet is set around the positioning portion, the inner side of which is formed with a gear wedging the wedge flakes. Thus, when turning an angle, the reversible ring may drive one of the wedge flakes to release from the gear and thus make the ratchet clutch in a direction.

    摘要翻译： 用于棘轮工具的可逆棘轮机构包括定位部分，其中间部分形成有凹U槽。 U形槽的两侧分别形成楔形片楔入的容纳槽。 在U形槽中设有弹性部分，以弹性地推开楔形片。 定位部周围设置有可逆环，其内周形成有可以驱动楔形片转动的两个止动件。 棘轮被设置在定位部分周围，定位部分的内侧形成有楔入楔形片的齿轮。 因此，当转动角度时，可逆环可以驱动楔形片之一从齿轮释放，从而使棘轮离合器沿一个方向。

    RATCHET WRENCH ABLE TO AUTOMATICALLY ADJUST ENGAGING TOOTH NUMBER ACCORDING TO EXTENT OF TORSION
    10.
    发明申请
    RATCHET WRENCH ABLE TO AUTOMATICALLY ADJUST ENGAGING TOOTH NUMBER ACCORDING TO EXTENT OF TORSION 审中-公开
    手动扳手可根据扭转范围自动调整牙齿数

    公开(公告)号：US20160375561A1

    公开(公告)日：2016-12-29

    申请号：US14750025

    申请日：2015-06-25

    申请人： Chia-Yu CHEN

    发明人： Chia-Yu CHEN

    IPC分类号： B25B13/46

    CPC分类号： B25B13/463

    摘要： A ratchet wrench able to automatically adjust engaging tooth number according to extent of torsion includes a ratchet block having two ends respectively extending to form an extension portion able to be optionally pushed and stuck between a ratchet ring and the resisting surface of a ratchet moving groove. The engaging surface of the ratchet block is a concave arcuate surface, and the ratio of the radius of the concave arcuate surface and the radius of the ratchet ring is between 1.017 and 1.033. Thus, when the ratchet block bears high torsion, the extension portion will be pushed toward the ratchet ring and the resisting surface of the ratchet moving groove to be pushed by the resisting surface to increase mutually engaging tooth number of the ratchet block and the ratchet ring, thus enabling the ratchet block to automatically adjust engaging tooth number according to extent of torsion.

    摘要翻译： 能够根据扭转程度自动调节啮合齿数的棘轮扳手包括一个棘轮块，其具有分别延伸的两个端部，以形成能够可选地推动并卡在棘轮环与棘轮移动槽的阻力表面之间的延伸部分。 棘轮块的接合表面是凹弧形表面，并且凹弧形表面的半径与棘轮环的半径之比在1.017和1.033之间。 因此，当棘轮块承受高扭转时，延伸部分将被推向棘轮环并且棘轮移动槽的阻力表面被阻力表面推动以增加棘轮块和棘轮环的相互啮合的齿数 从而能够使棘轮块根据扭转的程度自动调节啮合齿数。