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公开(公告)号：US20120264360A1
公开(公告)日：2012-10-18
申请号：US13445316
申请日：2012-04-12
申请人： Stacy Meyer , Young J. Paik , Christopher R. Mahon
发明人： Stacy Meyer , Young J. Paik , Christopher R. Mahon
CPC分类号： B24B37/32 , Y10T29/49826
摘要： A carrier head includes a base, a substrate mounting surface, a retaining ring secured to the base, and a plurality of stacked shims located between the base and the retaining ring. The retaining ring has a bottom surface for contacting a polishing pad during polishing.
摘要翻译： 承载头包括基座，基板安装表面，固定到基座的保持环以及位于基座和保持环之间的多个堆叠的垫片。 保持环具有用于在抛光期间接触抛光垫的底表面。
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公开(公告)号：US20100330879A1
公开(公告)日：2010-12-30
申请号：US12825276
申请日：2010-06-28
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译： 在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在 休息。 在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域 第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。
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公开(公告)号：US08662957B2
公开(公告)日：2014-03-04
申请号：US12825276
申请日：2010-06-28
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译： 在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在 休息。 在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域 第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。
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公开(公告)号：US20130035022A1
公开(公告)日：2013-02-07
申请号：US13560606
申请日：2012-07-27
申请人： Young J. Paik , James Klingler , Stacy Meyer , Christopher R. Mahon , Laxman Murugesh , Ashish Bhatnagar , Padma Gopalakrishnan
发明人： Young J. Paik , James Klingler , Stacy Meyer , Christopher R. Mahon , Laxman Murugesh , Ashish Bhatnagar , Padma Gopalakrishnan
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes a generally annular lower portion and a generally annular upper portion. The lower portion has a bottom surface for contacting a polishing pad during polishing and a top surface. The upper portion has a bottom surface secured to the top surface of the lower portion and a top surface configured to be mechanically affixed to and abut a rigid base of a carrier head. The lower portion is a first plastic, and the upper portion is a different second plastic that is about the same or more rigid than the first plastic.
摘要翻译： 保持环包括大致环形的下部和大致环形的上部。 下部具有用于在抛光期间接触抛光垫的底表面和顶表面。 上部具有固定到下部的顶表面的底表面和被配置为机械地固定到承载头的刚性基座并邻接其的刚性基座的顶表面。 下部是第一塑料，上部是与第一塑料大致相同或更刚性的不同的第二塑料。
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公开(公告)号：US09272387B2
公开(公告)日：2016-03-01
申请号：US13445316
申请日：2012-04-12
申请人： Stacy Meyer , Young J. Paik , Christopher R. Mahon
发明人： Stacy Meyer , Young J. Paik , Christopher R. Mahon
IPC分类号： B24B37/32
CPC分类号： B24B37/32 , Y10T29/49826
摘要： A carrier head includes a base, a substrate mounting surface, a retaining ring secured to the base, and a plurality of stacked shims located between the base and the retaining ring. The retaining ring has a bottom surface for contacting a polishing pad during polishing.
摘要翻译： 承载头包括基座，基板安装表面，固定到基座的保持环以及位于基座和保持环之间的多个堆叠的垫片。 保持环具有用于在抛光期间接触抛光垫的底表面。
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