Strip Process for Superalloys
    1.
    发明申请
    Strip Process for Superalloys 有权
    超合金条带工艺

    公开(公告)号:US20120156366A1

    公开(公告)日:2012-06-21

    申请号:US13331019

    申请日:2011-12-20

    摘要: A process for forming a coated substrate comprises providing a nickel base alloy substrate, depositing a chromium coating onto the nickel base alloy substrate and diffusing chromium from said coating into the substrate, applying a MCrAlY coating onto the nickel base alloy substrate and heat treating the substrate with the deposited chromium and the MCrAlY coating so that chromium diffuses into an outer region of the substrate. Further, in accordance with the present invention, a strip process for removing a coating from a substrate broadly comprises the steps of providing a nickel base alloy substrate having chromium diffused into an outer region and a MCrAlY coating deposited over the substrate with the diffused chromium and removing the MCrAlY coating by immersing the nickel base alloy substrate in an acid solution containing a sulfuric acid—hydrochloric acid mixture in water.

    摘要翻译: 一种形成涂覆基材的方法包括提供镍基合金基材,在镍基合金基材上沉积铬涂层并将铬从所述涂层扩散到基材中,将MCrAlY涂层施加到镍基合金基底上并热处理基板 与沉积的铬和MCrAlY涂层,使得铬扩散到衬底的外部区域。 此外,根据本发明,用于从基底去除涂层的剥离方法广泛地包括以下步骤:提供具有扩散到外部区域的铬的镍基合金基底和在基底上沉积有扩散的铬的MCrAlY涂层和 通过将镍基合金基材浸入含有硫酸 - 盐酸混合物的水溶液的酸溶液中来除去MCrAlY涂层。

    Electrochemical stripping using single loop control
    2.
    发明授权
    Electrochemical stripping using single loop control 有权
    电化学剥离采用单环控制

    公开(公告)号:US07033466B2

    公开(公告)日:2006-04-25

    申请号:US10260055

    申请日:2002-09-27

    IPC分类号: C25F7/00 C25F3/02 C25F3/08

    CPC分类号: C25F5/00

    摘要: The present invention relates to a control loop to be used in a system for stripping a coating from a part. The control loop comprises an electrometer for measuring a potential between the part and a reference electrode and generating a voltage output signal, an operational amplifier for comparing the voltage output signal to a set point voltage and for producing an output signal to be used to reduce the difference between the voltage output signal and the set point voltage, and a high current power transistors for supplying a current to the part.

    摘要翻译: 本发明涉及一种用于从零件剥离涂层的系统中的控制回路。 所述控制回路包括用于测量所述部件和参考电极之间的电位并产生电压输出信号的静电计,用于将所述电压输出信号与设定点电压进行比较的运算放大器,以及用于产生用于减少所述电压输出信号的输出信号 电压输出信号和设定点电压之间的差异,以及用于向该部件提供电流的大电流功率晶体管。

    Strip process for superalloys
    3.
    发明授权
    Strip process for superalloys 有权
    超级合金的剥离工艺

    公开(公告)号:US08475598B2

    公开(公告)日:2013-07-02

    申请号:US13331019

    申请日:2011-12-20

    IPC分类号: C23G1/02 C23C16/00

    摘要: A process for forming a coated substrate comprises providing a nickel base alloy substrate, depositing a chromium coating onto the nickel base alloy substrate and diffusing chromium from said coating into the substrate, applying a MCrAlY coating onto the nickel base alloy substrate and heat treating the substrate with the deposited chromium and the MCrAlY coating so that chromium diffuses into an outer region of the substrate. Further, in accordance with the present invention, a strip process for removing a coating from a substrate broadly comprises the steps of providing a nickel base alloy substrate having chromium diffused into an outer region and a MCrAlY coating deposited over the substrate with the diffused chromium and removing the MCrAlY coating by immersing the nickel base alloy substrate in an acid solution containing a sulfuric acid-hydrochloric acid mixture in water.

    摘要翻译: 一种形成涂覆基材的方法包括提供镍基合金基材,在镍基合金基材上沉积铬涂层并将铬从所述涂层扩散到基材中,将MCrAlY涂层施加到镍基合金基底上并热处理基板 与沉积的铬和MCrAlY涂层,使得铬扩散到衬底的外部区域。 此外,根据本发明,用于从基底去除涂层的剥离方法广泛地包括以下步骤:提供具有扩散到外部区域的铬的镍基合金基底和在基底上沉积有扩散的铬的MCrAlY涂层和 通过将镍基合金基材浸入含有硫酸 - 盐酸混合物的水溶液的酸溶液中来除去MCrAlY涂层。