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1.发明授权Photoelectric conversion device including a switch between reference voltage and a signal processing circuit 有权光电转换装置包括参考电压和信号处理电路之间的开关公开(公告)号：US07692133B2
公开(公告)日：2010-04-06
申请号：US12072943
申请日：2008-02-28
IPC分类号： H01J40/14
摘要： Provided is a photoelectric conversion device for outputting an output voltage according to incident light, including photoelectric conversion unit for holding an optical charge generated by the incident light, a signal processing circuit impressed with a reference voltage for outputting the output voltage according to the incident light by applying a predetermined process to an output signal of the photoelectric conversion unit, and a switch provided between a terminal externally supplied with the reference voltage, and the signal processing circuit.
摘要翻译： 提供了一种用于输出根据入射光的输出电压的光电转换装置，包括用于保持由入射光产生的光电荷的光电转换单元，施加用于根据入射光输出输出电压的基准电压的信号处理电路 通过对光电转换单元的输出信号应用预定处理，以及设置在外部提供参考电压的端子与信号处理电路之间的开关。
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2.发明申请公开(公告)号：US20090225294A1
公开(公告)日：2009-09-10
申请号：US12399541
申请日：2009-03-06
申请人： Daisuke Okano
发明人： Daisuke Okano
CPC分类号： G03F9/7084
摘要： In order to provide a reticle capable of increasing the number of chips per wafer and of enabling highly accurate alignment, and an exposure method using the reticle, a first alignment mark arrangement region (8) and a second alignment mark arrangement region (9) are provided on both sides of a multi-chip region (2) so that a sum of a size of the first alignment mark arrangement region and a size of the second alignment mark arrangement region is made the same as a size of a chip region (1).
摘要翻译： 为了提供能够增加每个晶片的芯片数量并且能够进行高精度对准的掩模版和使用该掩模版的曝光方法，第一对准标记布置区域（8）和第二对准标记布置区域（9）是 设置在多芯片区域（2）的两侧，使得第一对准标记布置区域的尺寸和第二对准标记布置区域的尺寸之和与芯片区域（1）的尺寸相同 ）。
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公开(公告)号：US20080217519A1
公开(公告)日：2008-09-11
申请号：US12070964
申请日：2008-02-22
IPC分类号： H03F3/08
CPC分类号： H03F3/087 , H03F2200/249 , H03F2200/421
摘要： Provide is a photoelectric conversion device capable of correcting an optical signal with high accuracy and more adaptable to high-speed operations, including: an optical signal common output line (10) commonly connected to all the photoelectric conversion units (30), for outputting an amplified optical signal from each of the photoelectric conversion units in chronological order, and having a first parasitic capacitor (31); an initial voltage common output line (11) commonly connected to all the photoelectric conversion units (30), for outputting the amplified initial voltage from each of the photoelectric conversion units (30) in chronological order, and having a second parasitic capacitor (32); and a capacitor group (20) commonly connected to one of the optical signal common output line (10) and the initial voltage common output line (11), which has a capacitance value substantially equal to a differential capacitance value between the first parasitic capacitor (31) and the second parasitic capacitor (32).
摘要翻译： 提供一种能够以高精度校正光信号并更适应于高速操作的光电转换装置，包括：共同连接到所有光电转换单元（30）的光信号公共输出线（10），用于输出 并且具有第一寄生电容器（31）。 通常连接到所有光电转换单元（30）的初始电压公共输出线（11），用于按时间顺序从每个光电转换单元（30）输出放大的初始电压，并具有第二寄生电容器（32） ; 以及电容器组（20），其共同连接到光信号公共输出线（10）和初始电压公共输出线（11）中的一个，其具有基本上等于第一寄生电容器 31）和第二寄生电容器（32）。
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公开(公告)号：US20080236645A1
公开(公告)日：2008-10-02
申请号：US12072943
申请日：2008-02-28
IPC分类号： H01L31/04
摘要： Provided is a photoelectric conversion device for outputting an output voltage according to incident light, including photoelectric conversion unit for holding an optical charge generated by the incident light, a signal processing circuit impressed with a reference voltage for outputting the output voltage according to the incident light by applying a predetermined process to an output signal of the photoelectric conversion unit, and a switch provided between a terminal externally supplied with the reference voltage, and the signal processing circuit.
摘要翻译： 提供了一种用于输出根据入射光的输出电压的光电转换装置，包括用于保持由入射光产生的光电荷的光电转换单元，施加用于根据入射光输出输出电压的基准电压的信号处理电路 通过对光电转换单元的输出信号应用预定处理，以及设置在外部提供参考电压的端子与信号处理电路之间的开关。
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5.发明授权Reticle for projection exposure apparatus and exposure method using the same 有权用于投影曝光装置的掩模版和使用其的曝光方法公开(公告)号：US07951512B2
公开(公告)日：2011-05-31
申请号：US12399541
申请日：2009-03-06
申请人： Daisuke Okano
发明人： Daisuke Okano
CPC分类号： G03F9/7084
摘要： In order to provide a reticle capable of increasing the number of chips per wafer and of enabling highly accurate alignment, and an exposure method using the reticle, a first alignment mark arrangement region (8) and a second alignment mark arrangement region (9) are provided on both sides of a multi-chip region (2) so that a sum of a size of the first alignment mark arrangement region and a size of the second alignment mark arrangement region is made the same as a size of a chip region (1).
摘要翻译： 为了提供能够增加每个晶片的芯片数量并且能够进行高精度对准的掩模版和使用该掩模版的曝光方法，第一对准标记布置区域（8）和第二对准标记布置区域（9）是 设置在多芯片区域（2）的两侧，使得第一对准标记布置区域的尺寸和第二对准标记布置区域的尺寸之和与芯片区域（1）的尺寸相同 ）。
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