Workpiece handling alignment system
    1.
    发明授权
    Workpiece handling alignment system 有权
    工件搬运对准系统

    公开(公告)号:US07321299B2

    公开(公告)日:2008-01-22

    申请号:US11147973

    申请日:2005-06-08

    IPC分类号: G08B19/00

    CPC分类号: H01L21/67259 H01L21/68

    摘要: Method and apparatus for use in setting up workpiece treatment or processing equipment. A disclosed system processes silicon wafers that are treated during processing steps in producing semiconductor integrated circuits. The processing equipment includes a wafer support that supports a wafer in a treatment region during wafer processing. A housing provides a controlled environment within the housing interior for processing the wafer on the wafer support. A mechanical transfer system transports wafers to and from the support. A wafer simulator is used to simulate wafer movement and includes a pressure sensor for monitoring contact between the simulator and the wafer transfer and support equipment. In one illustrated embodiment the wafer simulator is generally circular and includes three equally spaced pressure sensors for monitoring contact with wafer transport and support equipment.

    摘要翻译: 用于设置工件处理或加工设备的方法和装置。 所公开的系统处理在制造半导体集成电路的处理步骤期间处理的硅晶片。 处理设备包括在晶片处理期间在处理区域中支撑晶片的晶片支撑件。 壳体在壳体内部提供受控的环境,用于在晶片支撑件上处理晶片。 机械传输系统将晶片传送到支撑件和从支撑件传送晶片。 使用晶片模拟器来模拟晶片移动,并且包括用于监测模拟器与晶片转移和支撑设备之间的接触的压力传感器。 在一个所示实施例中,晶片模拟器通常是圆形的并且包括三个等间隔的压力传感器,用于监测与晶片输送和支撑设备的接触。

    Remote wafer presence detection with passive RFID
    2.
    发明授权
    Remote wafer presence detection with passive RFID 有权
    无源RFID远程晶片存在检测

    公开(公告)号:US07924159B2

    公开(公告)日:2011-04-12

    申请号:US12022300

    申请日:2008-01-30

    IPC分类号: G08B13/14

    CPC分类号: G08B13/2402

    摘要: The present invention involves a system and method of remotely detecting the presence of a wafer comprising, a passive RFID circuit, wherein the RFID circuit is attached to an end of a transfer arm located inside a vacuum chamber of an ion implantation system, a reader located outside the vacuum chamber, and wherein the RFID tag provides an indication relating to whether or not a wafer is secured by the transfer arm.

    摘要翻译: 本发明涉及远程检测晶片的存在的系统和方法,其包括无源RFID电路,其中RFID电路附接到位于离子注入系统的真空室内的传递臂的端部,位于 在真空室外部,并且其中RFID标签提供与转印臂是否固定晶片有关的指示。

    Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage phase
    3.
    发明授权
    Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage phase 有权
    数字频率和相位合成在高能离子注入机中控制电极电压相的应用,以及电极电压相位精确校准的手段

    公开(公告)号:US07402821B2

    公开(公告)日:2008-07-22

    申请号:US11334265

    申请日:2006-01-18

    IPC分类号: H01J37/317 H05H9/00 G21K5/10

    摘要: An improved HE LINAC-based ion implantation system is disclosed utilizing direct digital synthesis (DDS) techniques to obtain precise frequency and phase control and automated electrode voltage phase calibration. The DDS controller may be used on a multi-stage linear accelerator based implanter to digitally synchronize the frequency and phase of the electric fields to each electrode within each stage of the accelerator. The DDS controller includes digital phase synthesis (DPS) circuits for modulating the phase of the electric field to the electrodes, and a master oscillator that uses digital frequency synthesis or DFS to digitally synthesize a master frequency and phase applied to each of the DPS circuits. Also disclosed are methods for automatically phase and amplitude calibrating the RF electrode voltages of the stages.

    摘要翻译: 公开了一种改进的基于HE LINAC的离子注入系统,其利用直接数字合成(DDS)技术来获得精确的频率和相位控制以及自动电极电压相位校准。 DDS控制器可以用在基于多级线性加速器的注入器上,以将加速器的每个阶段内的电场的频率和相位数字地同步到每个电极。 DDS控制器包括用于调制电极相位的数字相位合成(DPS)电路,以及使用数字频率合成或DFS的主振荡器来数字地合成施加到每个DPS电路的主频率和相位。 还公开了用于自动相位和幅度校准级的RF电极电压的方法。

    REMOTE WAFER PRESENCE DETECTION WITH PASSIVE RFID
    4.
    发明申请
    REMOTE WAFER PRESENCE DETECTION WITH PASSIVE RFID 有权
    使用无源RFID进行远程检测

    公开(公告)号:US20090189766A1

    公开(公告)日:2009-07-30

    申请号:US12022300

    申请日:2008-01-30

    IPC分类号: G08B13/22

    CPC分类号: G08B13/2402

    摘要: The present invention involves a system and method of remotely detecting the presence of a wafer comprising, a passive RFID circuit, wherein the RFID circuit is attached to an end of a transfer arm located inside a vacuum chamber of an ion implantation system, a reader located outside the vacuum chamber, and wherein the RFID tag provides an indication relating to whether or not a wafer is secured by the transfer arm.

    摘要翻译: 本发明涉及远程检测晶片的存在的系统和方法,其包括无源RFID电路,其中RFID电路附接到位于离子注入系统的真空室内的传递臂的端部,位于 在真空室外部,并且其中RFID标签提供与转印臂是否固定晶片有关的指示。