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1.发明授权Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier 有权确定曝光设置的方法，光刻曝光装置，计算机程序和数据载体公开(公告)号：US08208118B2
公开(公告)日：2012-06-26
申请号：US12367191
申请日：2009-02-06
IPC分类号： G03B27/68
CPC分类号： G03B27/32 , G03B27/68 , G03F7/70516
摘要： Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.
摘要翻译： 本发明的实施例涉及一种用于在光刻曝光过程中确定基板上的目标场的曝光设置的方法，包括通过在第二个多个校准位置确定校准场在第一方向上的位置来提供校准数据 和相对于校准场的位置的第三方向。 该方法还包括通过在第二和第三方向上建立目标场的衬底上的位置并且通过在相对于曝光位置的至少一个测量位置处测量第一方向上的曝光场的位置来提供生产数据 场在第二和第三个方向。
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2.发明申请Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier 有权确定曝光设置的方法，平版曝光装置，计算机程序和数据载体公开(公告)号：US20090201473A1
公开(公告)日：2009-08-13
申请号：US12367191
申请日：2009-02-06
CPC分类号： G03B27/32 , G03B27/68 , G03F7/70516
摘要： Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.
摘要翻译： 本发明的实施例涉及一种用于在光刻曝光过程中确定基板上的目标场的曝光设置的方法，包括通过在第二个多个校准位置确定校准场在第一方向上的位置来提供校准数据 和相对于校准场的位置的第三方向。 该方法还包括通过在第二和第三方向上建立目标场的衬底上的位置并且通过在相对于曝光位置的至少一个测量位置处测量第一方向上的曝光场的位置来提供生产数据 场在第二和第三个方向。
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