公开(公告)号：US10002747B2

公开(公告)日：2018-06-19

申请号：US13431950

申请日：2012-03-27

申请人： Iqbal Shareef ,  Evangelos Spyropoulos ,  Mark Taskar

发明人： Iqbal Shareef ,  Evangelos Spyropoulos ,  Mark Taskar

IPC分类号： C23C16/455 ,  C23C16/52 ,  H01J37/32

CPC分类号： H01J37/3244 ,  C23C16/455 ,  C23C16/52 ,  H01J37/32899

摘要： Methods and apparatus for supplying gas in a plasma processing system that employs the single line drop approach wherein a regulator is shared among multiple mass flow controllers. In one or more embodiments, an accumulator is provided and coupled in gaseous communication with a shared manifold to reduce pressure spikes and dips. A filter, which may be replaceable or non-replaceable separate from the accumulator, is integrated with the accumulator in one or more embodiments.

公开(公告)号：US20130255782A1

公开(公告)日：2013-10-03

申请号：US13549344

申请日：2012-07-13

申请人： Iqbal Shareef ,  Piyush Agarwal ,  Evangelos Spyropoulos ,  Mark Taskar

发明人： Iqbal Shareef ,  Piyush Agarwal ,  Evangelos Spyropoulos ,  Mark Taskar

IPC分类号： F17D1/00

CPC分类号： F17D1/00 ,  F17C1/00 ,  F17C2270/0518 ,  Y10T137/0318 ,  Y10T137/87249

摘要： Apparatus and methods for sharing a gas panel among a plurality of multi-zone gas feed chambers of a plasma processing chamber. Each multi-zone gas feed chamber is provided with its own multi-zone gas feed device to adjustably split the incoming gas flow into each chamber and provide the different gas flows to different zones of the multi-zone gas feed chamber.

摘要翻译： 在等离子体处理室的多个多区域气体供给室中共享气体面板的装置和方法。 每个多区气体进料室设置有其自己的多区气体进料装置，以将进入的气流可调节地分流到每个室中，并且将不同的气流提供给多区气体进料室的不同区域。

公开(公告)号：US09091397B2

公开(公告)日：2015-07-28

申请号：US13549344

申请日：2012-07-13

申请人： Iqbal Shareef ,  Piyush Agarwal ,  Evangelos Spyropoulos ,  Mark Taskar

发明人： Iqbal Shareef ,  Piyush Agarwal ,  Evangelos Spyropoulos ,  Mark Taskar

IPC分类号： E03B11/00 ,  F17D1/00

CPC分类号： F17D1/00 ,  F17C1/00 ,  F17C2270/0518 ,  Y10T137/0318 ,  Y10T137/87249

摘要： Apparatus and methods for sharing a gas panel among a plurality of multi-zone gas feed chambers of a plasma processing chamber. Each multi-zone gas feed chamber is provided with its own multi-zone gas feed device to adjustably split the incoming gas flow into each chamber and provide the different gas flows to different zones of the multi-zone gas feed chamber.

摘要翻译： 在等离子体处理室的多个多区域气体供给室中共享气体面板的装置和方法。 每个多区气体进料室设置有其自己的多区气体进料装置，以将进入的气流可调节地分流到每个室中，并且将不同的气流提供给多区气体进料室的不同区域。

公开(公告)号：US20130255883A1

公开(公告)日：2013-10-03

申请号：US13431950

申请日：2012-03-27

申请人： Iqbal A. Shareef ,  Evangelos Spyropoulos ,  Mark Taskar

发明人： Iqbal A. Shareef ,  Evangelos Spyropoulos ,  Mark Taskar

IPC分类号： F16L55/04 ,  B05C11/00

CPC分类号： H01J37/3244 ,  C23C16/455 ,  C23C16/52 ,  H01J37/32899

摘要： Methods and apparatus for supplying gas in a plasma processing system that employs the single line drop approach wherein a regulator is shared among multiple mass flow controllers. In one or more embodiments, an accumulator is provided and coupled in gaseous communication with a shared manifold to reduce pressure spikes and dips. A filter, which may be replaceable or non-replaceable separate from the accumulator, is integrated with the accumulator in one or more embodiments.

摘要翻译： 在采用单线滴落方法的等离子体处理系统中供应气体的方法和装置，其中调节器在多个质量流量控制器之间共享。 在一个或多个实施例中，提供蓄能器并且与共用歧管气体连通地联接以减少压力尖峰和下降。 在一个或多个实施例中，可以与蓄能器分离的可替代或不可更换的过滤器与蓄能器集成。