摘要:
Disclosed are DNA polymerases having increased reverse transcriptase efficiency, mismatch tolerance, extension rate and/or tolerance of RT and polymerase inhibitors relative to a corresponding, unmodified polymerase. The polymerases are useful in a variety of disclosed primer extension methods. Also disclosed are related compositions, including recombinant nucleic acids, vectors, and host cells, which are useful, e.g., for production of the DNA polymerases.
摘要:
Disclosed are mutant DNA polymerases having increased 3′-mismatch discrimination relative to a corresponding, unmodified polymerase. The mutant polymerases are useful in a variety of disclosed primer extension methods. Also disclosed are related compositions, including recombinant nucleic acids, vectors, and host cells, which are useful, e.g., for production of the mutant DNA polymerases.
摘要:
Disclosed are mutant DNA polymerases having increased 3′-mismatch discrimination relative to a corresponding, unmodified polymerase. The mutant polymerases are useful in a variety of disclosed primer extension methods. Also disclosed are related compositions, including recombinant nucleic acids, vectors, and host cells, which are useful, e.g., for production of the mutant DNA polymerases.
摘要:
The invention relates to a method for producing a metallic pressed sheet or an endless strip, whereby a surface structure is produced by applying a mask for partial chemical passivation followed by chemical surface treatment. The invention also relates to a device for implementing said method. In order to significantly improve the reproducibility and the resolution of the mask obtained, the mask is produced from a UV-hardening lacquer which is applied by a suitable device. The resolution is improved by means of a nozzle matrix which sprays the UV-hardening lacquer in dots, the individual dots forming a pattern as a result of the overspraying thereof, thereby forming the mask to be produced. The UV-hardening lacquer is especially advantageous in that it can be removed from the surface very easily after the etching process, and enables a high reproducibility compared to the conventional screen printing methods.
摘要:
The invention relates to a method for producing a metallic pressed sheet or an endless strip, whereby a surface structure is produced by applying a mask for partial chemical passivation followed by chemical surface treatment. The invention also relates to a device for implementing said method. In order to significantly improve the reproducibility and the resolution of the mask obtained, the mask is produced from a UV-hardening lacquer which is applied by a suitable device. The resolution is improved by means of a nozzle matrix which sprays the UV-hardening lacquer in dots, the individual dots forming a pattern as a result of the overspraying thereof, thereby forming the mask to be produced. The UV-hardening lacquer is especially advantageous in that it can be removed from the surface very easily after the etching process, and enables a high reproducibility compared to the conventional screen printing methods.
摘要:
Disclosed are DNA polymerases having increased reverse transcriptase efficiency relative to a corresponding, unmodified polymerase. The polymerases are useful in a variety of disclosed primer extension methods. Also disclosed are related compositions, including recombinant nucleic acids, vectors, and host cells, which are useful, e.g., for production of the DNA polymerases.
摘要:
Disclosed are mutant DNA polymerases having increased 3′-mismatch discrimination relative to a corresponding, unmodified polymerase. The mutant polymerases are useful in a variety of disclosed primer extension methods. Also disclosed are related compositions, including recombinant nucleic acids, vectors, and host cells, which are useful, e.g., for production of the mutant DNA polymerases.
摘要:
Disclosed are mutant DNA polymerases having increased 3′-mismatch discrimination relative to a corresponding, unmodified polymerase. The mutant polymerases are useful in a variety of disclosed primer extension methods. Also disclosed are related compositions, including recombinant nucleic acids, vectors, and host cells, which are useful, e.g., for production of the mutant DNA polymerases.
摘要:
Disclosed are mutant DNA polymerases having increased 3′-mismatch discrimination relative to a corresponding, unmodified polymerase. The mutant polymerases are useful in a variety of disclosed primer extension methods. Also disclosed are related compositions, including recombinant nucleic acids, vectors, and host cells, which are useful, e.g., for production of the mutant DNA polymerases.
摘要:
Disclosed are DNA polymerases having increased reverse transcriptase efficiency, mismatch tolerance, extension rate and/or tolerance of RT and polymerase inhibitors relative to a corresponding, unmodified polymerase. The polymerases are useful in a variety of disclosed primer extension methods. Also disclosed are related compositions, including recombinant nucleic acids, vectors, and host cells, which are useful, e.g., for production of the DNA polymerases.