Truncated dummy plate for process furnace
    3.
    发明申请
    Truncated dummy plate for process furnace 审中-公开
    用于工艺炉的截断虚拟板

    公开(公告)号:US20050124169A1

    公开(公告)日:2005-06-09

    申请号:US11039501

    申请日:2005-01-19

    摘要: A truncated dummy plate which is suitable for promoting substantially uniform flow of process gases among all regions on the surface of a substrate to facilitate deposition of a film having uniform thickness on the substrate. The truncated dummy plate has a circular shape with a flat edge provided in the curved edge of the dummy plate. At least two, and preferably, about three or four of the dummy plates are positioned in the sites on a wafer boat which are in relatively close proximity to a gas outlet in a process furnace typically during a LPCVD process carried out in the furnace. The flat or truncated edges of the dummy plates are disposed on the gas inlet side of the process chamber, with the round edges of the dummy plates disposed on the gas outlet side of the process chamber.

    摘要翻译: 一种截头虚拟板,其适用于在衬底表面上的所有区域中促进基本均匀的工艺气体流动,以便于在衬底上沉积具有均匀厚度的膜。 截头虚拟板具有设置在虚拟板的弯曲边缘中的平坦边缘的圆形形状。 至少两个,优选约三个或四个虚拟板被定位在晶片舟皿上的位置中,其通常在炉中进行的LPCVD工艺期间相对靠近工艺炉中的气体出口。 虚拟板的平面或截头边缘设置在处理室的气体入口侧,虚设板的圆形边缘设置在处理室的气体出口侧。