公开(公告)号：US20070089288A1

公开(公告)日：2007-04-26

申请号：US11257911

申请日：2005-10-24

申请人： Dennis McKean ,  Gary Suzuki

发明人： Dennis McKean ,  Gary Suzuki

IPC分类号： G11B5/127 ,  C23C14/00

CPC分类号： G11B5/102 ,  Y10S438/946 ,  Y10T29/4903 ,  Y10T29/49041 ,  Y10T29/49046 ,  Y10T29/49798

摘要： A method is presented for repairing damaged photomasks for electronic component fabrication processes, particularly for fabrication of the ABS of a disk drive slider. The method includes applying an overcoat of material having index of fraction which is close to the index of refraction of the photoresist material of the damaged photomask to produce a non-scattering boundary surface. The overcoat material preferably includes an overcoat base material which is a polymer having an index of refraction which is in the range of plus or minus 0.1 from the index of refraction of said photoresist material.

摘要翻译： 提出了一种用于修复用于电子元件制造工艺的损坏的光掩模的方法，特别是用于制造磁盘驱动器滑块的ABS。 该方法包括施加具有接近损伤的光掩模的光致抗蚀剂材料的折射率的分数的材料的外涂层以产生非散射边界表面。 外涂层材料优选包括外涂层基材，其是具有折射率的聚合物，其折射率从所述光致抗蚀剂材料的折射率在正或负0.1的范围内。

公开(公告)号：US20060045971A1

公开(公告)日：2006-03-02

申请号：US10928038

申请日：2004-08-27

申请人： Cherngye Hwang ,  Kim Lee ,  Dennis McKean ,  Gary Suzuki

发明人： Cherngye Hwang ,  Kim Lee ,  Dennis McKean ,  Gary Suzuki

IPC分类号： B05D5/00

CPC分类号： G11B5/6005 ,  G11B5/3163 ,  G11B5/3173

摘要： A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.

摘要翻译： 公开了一种用于在单个滑块上创建用于光刻的分割的抗蚀岛的方法。 该方法包括将多个单个滑块的温度升高到低于适当的软烘烤温度的温度。 单个滑块位于分隔器中，分隔器的单个滑块和壁具有沉积在其上的抗蚀剂层。 然后进行粗光刻以从分隔器的壁的上部的部分去除抗蚀剂; 然后将单个滑块，抗蚀剂和分隔器的温度倾斜到适当的软烘烤温度。

公开(公告)号：US07396636B2

公开(公告)日：2008-07-08

申请号：US10928038

申请日：2004-08-27

申请人： Cherngye Hwang ,  Kim Y. Lee ,  Dennis R. McKean ,  Gary Suzuki

发明人： Cherngye Hwang ,  Kim Y. Lee ,  Dennis R. McKean ,  Gary Suzuki

IPC分类号： G03F7/00

CPC分类号： G11B5/6005 ,  G11B5/3163 ,  G11B5/3173

摘要： A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.

摘要翻译： 公开了一种用于在单个滑块上创建用于光刻的分割的抗蚀岛的方法。 该方法包括将多个单个滑块的温度升高到低于适当的软烘烤温度的温度。 单个滑块位于分隔器中，分隔器的单个滑块和壁具有沉积在其上的抗蚀剂层。 然后进行粗光刻以从分隔器的壁的上部的部分去除抗蚀剂; 然后将单个滑块，抗蚀剂和分隔器的温度倾斜到适当的软烘烤温度。