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公开(公告)号:US06635118B2
公开(公告)日:2003-10-21
申请号:US09765015
申请日:2001-01-17
申请人: Harbans S. Sachdev , Richard A. Cormack , Gerard V. Capogna , Felice J. Mancaruso , Krishna Sachdev
发明人: Harbans S. Sachdev , Richard A. Cormack , Gerard V. Capogna , Felice J. Mancaruso , Krishna Sachdev
IPC分类号: B08B702
CPC分类号: C11D3/044 , B08B3/02 , B08B3/12 , C11D1/662 , C11D1/72 , C11D1/722 , C11D1/94 , C11D3/2082 , C11D3/2086 , C11D3/30 , C11D11/0041 , Y10S134/902 , Y10S438/905
摘要: This invention relates to water-based alkaline cleaning solutions and their use as an environmentally safer replacement of organic solvents to remove photoresist, polyimide residue and other interlevel dielectric polymer coating residue from polymer film apply equipment, specifically, spin coater bowl and assembly parts consisting of a teflon top shield, stainless steel plate, and a bottom teflon spin coating bowl used in semiconductor device fabrication processes.