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公开(公告)号：US20140262752A1
公开(公告)日：2014-09-18
申请号：US14234019
申请日：2012-07-23
CPC分类号： C23C14/35 , C23C14/352 , C23C14/505 , C23C14/564 , H01J37/3405 , H01J37/342
摘要： The invention relates to methods and devices for producing one or more low-particle layers on substrates in a vacuum. The layers are deposited onto the substrate from a cylindrical source material, optionally together with a reactive gas component, by means of magnetron sputtering. The layer is deposited against the force of gravity in a sputter-up method. During the method or within the device, the structure or stochiometric atomic composition of the layers can optionally be modified using a plasma source. Multiple sputtering sources with different source materials can be provided in the device such that multiple layers of different compositions can be applied on the substrate at a high speed in one process.
摘要翻译： 本发明涉及在真空中在衬底上生产一个或多个低颗粒层的方法和装置。 这些层通过磁控管溅射从圆柱形源材料，任选地与反应性气体组分一起沉积到衬底上。 该层以溅射方法抵抗重力沉积。 在该方法或器件期间，可以使用等离子体源来任意地修改层的结构或固体原子组成。 可以在器件中提供具有不同源材料的多个溅射源，使得可以在一个工艺中以高速将多层不同的组合物施加在衬底上。
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公开(公告)号：US09803276B2
公开(公告)日：2017-10-31
申请号：US14234019
申请日：2012-07-23
CPC分类号： C23C14/35 , C23C14/352 , C23C14/505 , C23C14/564 , H01J37/3405 , H01J37/342
摘要： The invention relates to methods and devices for producing one or more low-particle layers on substrates in a vacuum. The layers are deposited onto the substrate from a cylindrical source material, optionally together with a reactive gas component, by means of magnetron sputtering. The layer is deposited against the force of gravity in a sputter-up method. During the method or within the device, the structure or stochiometric atomic composition of the layers can optionally be modified using a plasma source. Multiple sputtering sources with different source materials can be provided in the device such that multiple layers of different compositions can be applied on the substrate at a high speed in one process.
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