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公开(公告)号:US08193685B2
公开(公告)日:2012-06-05
申请号:US12666831
申请日:2008-06-30
申请人: Mareike Klee , Ronald Dekker , Harry Van Esch , Marco De Wild , Ruediger Mauczok , Chris Van Heesch , Willem Franke Pasveer , Engel Johannes Knibbe , Remco Alphonsus Hendrikus Breen , Klaus Reimann , Biju Kumar Sreedharan Nair , Roger Peter Anna Delnoij , Henri Marie Joseph Boots , Christina Adriana Renders , Olaf Wunnicke , Derk Reefman , Peter Dirksen
发明人: Mareike Klee , Ronald Dekker , Harry Van Esch , Marco De Wild , Ruediger Mauczok , Chris Van Heesch , Willem Franke Pasveer , Engel Johannes Knibbe , Remco Alphonsus Hendrikus Breen , Klaus Reimann , Biju Kumar Sreedharan Nair , Roger Peter Anna Delnoij , Henri Marie Joseph Boots , Christina Adriana Renders , Olaf Wunnicke , Derk Reefman , Peter Dirksen
IPC分类号: H01L41/08
CPC分类号: B06B1/0603 , B06B1/0292 , G08B13/1645 , H01L27/20 , H01L41/0973 , H01L41/314 , Y10T29/42
摘要: A transducer (800) is provided where a membrane (830) is formed over a front substrate (615); and a piezoelectric layer (820) is formed over the membrane (830) at an active portion (821) and peripheral portions located adjacent the active portion (821). A patterned conductive layer including first and second electrodes (840, 845) is formed over the piezoelectric layer (820). Further, a back substrate structure is provided having supports (822, 824) located at the peripheral portions adjacent the active portion (821). The height (826) of the supports (822, 824) is greater than a combined height (828) of the patterned piezoelectric layer and the patterned conductive layer. Many transducers may be connected to form an array, where a controller may be provided for controlling the array, such as steering a beam of the array, and processing signals received by the array, for presence or motion detection and/or imaging, for example.
摘要翻译: 提供换能器(800),其中膜(830)形成在前基板(615)上方; 并且在有源部分(821)和靠近有效部分(821)的周边部分之间在膜(830)上形成压电层(820)。 包括第一和第二电极(840,845)的图案化导电层形成在压电层(820)上方。 此外,背面基板结构设置有位于与活动部分(821)相邻的周边部分处的支撑件(822,824)。 支撑件(822,824)的高度(826)大于图案化压电层和图案化导电层的组合高度(828)。 可以连接许多换能器以形成阵列,其中可以提供用于控制阵列的控制器,例如转向阵列的波束,以及处理由阵列接收的信号,用于存在或运动检测和/或成像,例如 。
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公开(公告)号:US20100277040A1
公开(公告)日:2010-11-04
申请号:US12666831
申请日:2008-06-30
申请人: Mareike Klee , Klaus Reimann , Biju K. Sreedharan Nair , Roger Peter Anna Delnoij , Henri M. J. Boots , Christina A. Renders , Olaf Wunnicke , Derk Reefman , Peter Dirksen , Ronald Dekker , Harry Van Esch , Marco De Wild , Ruediger Mauczok , Chris Van Heesch , Willem F. Pasveer , Engel Johannes Knibbe , Remco A.H. Breen
发明人: Mareike Klee , Klaus Reimann , Biju K. Sreedharan Nair , Roger Peter Anna Delnoij , Henri M. J. Boots , Christina A. Renders , Olaf Wunnicke , Derk Reefman , Peter Dirksen , Ronald Dekker , Harry Van Esch , Marco De Wild , Ruediger Mauczok , Chris Van Heesch , Willem F. Pasveer , Engel Johannes Knibbe , Remco A.H. Breen
IPC分类号: H01L41/04 , H04R17/00 , H01L41/053
CPC分类号: B06B1/0603 , B06B1/0292 , G08B13/1645 , H01L27/20 , H01L41/0973 , H01L41/314 , Y10T29/42
摘要: A transducer (800) is provided where a membrane (830) is formed over a front substrate (615); and a piezoelectric layer (820) is formed over the membrane (830) at an active portion (821) and peripheral portions located adjacent the active portion (821). A patterned conductive layer including first and second electrodes (840, 845) is formed over the piezoelectric layer (820). Further, a back substrate structure is provided having supports (822, 824) located at the peripheral portions adjacent the active portion (821). The height (826) of the supports (822, 824) is greater than a combined height (828) of the patterned piezoelectric layer and the patterned conductive layer. Many transducers may be connected to form an array, where a controller may be provided for controlling the array, such as steering a beam of the array, and processing signals received by the array, for presence or motion detection and/or imaging, for example.
摘要翻译: 提供换能器(800),其中膜(830)形成在前基板(615)上方; 并且在有源部分(821)和靠近有效部分(821)的周边部分之间在膜(830)上形成压电层(820)。 包括第一和第二电极(840,845)的图案化导电层形成在压电层(820)上方。 此外,背面基板结构设置有位于与活动部分(821)相邻的周边部分处的支撑件(822,824)。 支撑件(822,824)的高度(826)大于图案化压电层和图案化导电层的组合高度(828)。 可以连接许多换能器以形成阵列,其中可以提供用于控制阵列的控制器,例如控制阵列的波束,以及处理由阵列接收的信号,用于存在或运动检测和/或成像,例如 。
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