SEMICONDUCTOR LASER AND METHOD OF MANUFACTURING THE SAME
    1.
    发明申请
    SEMICONDUCTOR LASER AND METHOD OF MANUFACTURING THE SAME 审中-公开
    半导体激光器及其制造方法

    公开(公告)号:US20130070798A1

    公开(公告)日:2013-03-21

    申请号:US13587036

    申请日:2012-08-16

    IPC分类号: H01S5/24 H01L33/02

    摘要: A semiconductor laser includes a semiconductor laser portion including an active layer portion having a p-type cladding layer, an active layer, and an n-type cladding layer on a p-type InP semiconductor substrate; and current confining structures that fill spaces on both sides of the semiconductor laser portion. Each of the current confining structures includes a first p-type InP layer, a Ru-doped InP layer, and a second p-type InP layer. The Ru-doped InP layer is in contact only with the first and second p-type InP layers. To obtain the structure, timing of introduction of a halogen-containing gas is adjusted.

    摘要翻译: 半导体激光器包括在p型InP半导体衬底上包括具有p型覆层,有源层和n型覆层的有源层部分的半导体激光器部分; 以及填充半导体激光器部分两侧的空间的电流限制结构。 每个电流限制结构包括第一p型InP层,Ru掺杂InP层和第二p型InP层。 Ru掺杂的InP层仅与第一和第二p型InP层接触。 为了获得结构,调节含卤素气体的引入时间。