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    Radiation-sensitive positive resist composition
    2.
    发明授权
    Radiation-sensitive positive resist composition 失效
    辐射敏感正光刻胶组合物

    公开(公告)号：US5456996A

    公开(公告)日：1995-10-10

    申请号：US224563

    申请日：1994-04-07

    申请人： Haruyoshi Ozaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    发明人： Haruyoshi Ozaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0236 ,  G03F7/0226

    摘要： A positive resist composition which comprises, in admixture, a photosensitive 1,2-quinone diazide compound, an alkali-soluble resin to bind ingredients and polyphenol compound to control a dissolution rate in a developer having a molecular weight of not more than 550 and represented by the general formula: ##STR1## wherein a, b, c, d, e, and f are the same or different and a number of 0-3, provided that d+f is not less than 1, and provided that if b, d and f are 1, then at least one of a, c, and e is not 0; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or aryl group, wherein an amount of said 1,2-quinone diazide compound is from 5 to 100% by weight and an amount of said polyphenol compound is from 4 to 40% by weight based on the total weight of said alkali-soluble resin, wherein the resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.

    摘要翻译： 一种正性抗蚀剂组合物，其包含光敏1,2-醌二叠氮化合物，碱溶性树脂以结合成分和多酚化合物以控制分子量不大于550的显影剂中的溶解速率，并表示为 其通式如下：其中a，b，c，d，e和f相同或不同，数为0-3，条件是d + f不小于1，条件是如果b ，d和f为1，则a，c和e中的至少一个不为0; R1，R2和R3相同或不同，C1-C18烷基，C1-C18烷氧基，羧基或卤原子; R4是氢原子，C1-C18烷基或芳基，其中所述1,2-醌二叠氮化合物的量为5〜100重量％，所述多酚化合物的量为4〜40体积％ 基于所述碱溶性树脂的总重量，其中抗蚀剂组合物对辐射敏感，并且具有良好的灵敏度平衡，分辨能力和耐热性。