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24 条记录 (耗时 0.015 秒)

    Radiation-sensitive positive resist composition
    1.
    发明授权
    Radiation-sensitive positive resist composition 失效
    辐射敏感正光刻胶组合物

    公开(公告)号：US5456996A

    公开(公告)日：1995-10-10

    申请号：US224563

    申请日：1994-04-07

    申请人： Haruyoshi Ozaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    发明人： Haruyoshi Ozaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0236 ,  G03F7/0226

    摘要： A positive resist composition which comprises, in admixture, a photosensitive 1,2-quinone diazide compound, an alkali-soluble resin to bind ingredients and polyphenol compound to control a dissolution rate in a developer having a molecular weight of not more than 550 and represented by the general formula: ##STR1## wherein a, b, c, d, e, and f are the same or different and a number of 0-3, provided that d+f is not less than 1, and provided that if b, d and f are 1, then at least one of a, c, and e is not 0; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or aryl group, wherein an amount of said 1,2-quinone diazide compound is from 5 to 100% by weight and an amount of said polyphenol compound is from 4 to 40% by weight based on the total weight of said alkali-soluble resin, wherein the resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.

    摘要翻译： 一种正性抗蚀剂组合物，其包含光敏1,2-醌二叠氮化合物，碱溶性树脂以结合成分和多酚化合物以控制分子量不大于550的显影剂中的溶解速率，并表示为 其通式如下：其中a，b，c，d，e和f相同或不同，数为0-3，条件是d + f不小于1，条件是如果b ，d和f为1，则a，c和e中的至少一个不为0; R1，R2和R3相同或不同，C1-C18烷基，C1-C18烷氧基，羧基或卤原子; R4是氢原子，C1-C18烷基或芳基，其中所述1,2-醌二叠氮化合物的量为5〜100重量％，所述多酚化合物的量为4〜40体积％ 基于所述碱溶性树脂的总重量，其中抗蚀剂组合物对辐射敏感，并且具有良好的灵敏度平衡，分辨能力和耐热性。

    Azamethinyl quinoline derivatives
    7.
    发明授权
    Azamethinyl quinoline derivatives 失效
    氮代甲基喹啉衍生物

    公开(公告)号：US5028708A

    公开(公告)日：1991-07-02

    申请号：US179251

    申请日：1988-04-08

    申请人： Takeshi Hioki ,  Kiyoteru Kojima ,  Jun Tomioka

    发明人： Takeshi Hioki ,  Kiyoteru Kojima ,  Jun Tomioka

    IPC分类号： C07C255/61 ,  C07D215/38 ,  C07D215/40 ,  C07D221/10 ,  C07D277/38 ,  C07D277/42 ,  C07D295/12 ,  C07D295/135 ,  C07D333/66 ,  C07D409/12 ,  C07D417/12 ,  G11B7/24 ,  G11B7/244

    CPC分类号： C07D295/135 ,  C07C255/00 ,  C07D215/38 ,  C07D215/40 ,  C07D221/10 ,  C07D277/42 ,  C07D333/66 ,  C07D409/12 ,  C07D417/12 ,  G11B7/244

    摘要： This invention provides azamethine compounds represented by the formula (I): ##STR1## (wherein X represents ##STR2## Y represents C.dbd.O, C.dbd.C(CN).sub.2 or SO.sub.2 ; R.sub.1 to R.sub.4 represent independently a hydrogen atom, an alkyl group which may be substituted, an alkoxyl group which may be substituted, a halogen atom, a nitro group, a cyano group, a hydroxyl group, an amino group which may be substituted, --A--R or ##STR3## R.sub.5 and R.sub.6 represent independently a hydrogen atom, an alkyl group which may be substituted, an aryl group which may be substituted or a cyclohexyl group; R.sub.5 and R.sub.6 may be combined to form a ring or may form a ring with a hetero atom; R.sub.7 and R.sub.8 represent independently a hydrogen atom, an alkyl group which may be substituted, an alkoxyl group which may be substituted, a hydroxyl group, a halogen atom, a nitro group,a cyano group, --A--R or ##STR4## wherein --A represents ##STR5## or ##STR6## represents ##STR7## and R and R' represent independently a hydrogen atom, an alkyl group which may be substituted, an aryl group which may be substituted, a heterocyclic group or a cyclohexyl group; R.sub.9 represents a hydrogen atom, an alkyl group which may be substituted, or an aryl or heteroaryl group which may be substituted; and R.sub.10 to R.sub.12 represent independently a hydrogen atom or an alkyl group), a process for producing such compounds, and a medium for recording optical information using these compounds.

    Radiation-sensitive positive resist composition
    8.
    发明授权
    Radiation-sensitive positive resist composition 失效
    辐射敏感正光刻胶组合物

    公开(公告)号：US5792585A

    公开(公告)日：1998-08-11

    申请号：US217892

    申请日：1994-03-25

    申请人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    发明人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    IPC分类号： C07C39/15 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/022 ,  C07C39/15 ,  G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

    摘要翻译： 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R 1，R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

    Edging mill for section rolling
    9.
    发明授权
    Edging mill for section rolling 失效
    磨边机用于轧制

    公开(公告)号：US5295380A

    公开(公告)日：1994-03-22

    申请号：US928435

    申请日：1992-08-12

    申请人： Takeshi Hioki ,  Toru Ikezaki ,  Yasushi Horiuchi ,  Kazufumi Hirose ,  Yoshun Yamamoto ,  Masanori Fujiwara

    发明人： Takeshi Hioki ,  Toru Ikezaki ,  Yasushi Horiuchi ,  Kazufumi Hirose ,  Yoshun Yamamoto ,  Masanori Fujiwara

    IPC分类号： B21B1/08 ,  B21B27/02 ,  B21B31/26 ,  B21B31/16

    CPC分类号： B21B1/0886 ,  B21B27/028 ,  B21B31/26

    摘要： An edging mill for section rolling has a pair of horizontal rolls, each horizontal roll including a pair of axially spaced horizontal roll segments supported by driven horizontal roll shafts. Eccentric rings are disposed between the two horizontal roll segments making up each horizontal roll and are rotatably mounted on the horizontal roll shaft. The eccentric rings are eccentric to the horizontal rolls. Web-restraining ring rolls each comprise a pair of web-restraining roll segments rotatably fitted over the periphery of the eccentric rings concentrically thereto. A web-restraining ring roll positioning device rotates the eccentric rings. While the horizontal rolls roll the flange edges of the section, the web-restraining ring rolls hold the web of the section therebetween. The position of the web-restraining ring rolls with respect to the horizontal rolls changes with the rotating angle of the eccentric rings. The position of the web-restraining ring rolls is adjusted according to the flange thickness of the section.

    摘要翻译： 用于截面轧制的磨边机具有一对水平辊，每个水平辊包括由从动水平辊轴支撑的一对轴向间隔开的水平辊段。 偏心环设置在构成每个水平辊的两个水平辊段之间并且可旋转地安装在水平辊轴上。 偏心环与水平辊偏心。 卷筒纸限制环卷每一个包括一对卷筒纸限制卷筒部分，其可旋转地装配在与其同心的偏心环的周边上。 卷筒纸限定环辊定位装置使偏心环旋转。 当横向辊滚动该部分的凸缘边缘时，幅材限制环辊保持该部分的腹板。 卷筒纸限制环相对于水平卷筒的位置随偏心环的旋转角度而变化。 纤维网限制环辊的位置根据截面的凸缘厚度进行调整。

    Process for producing O,O-di-lower-alkylchlorothiophosphate
    10.
    发明授权
    Process for producing O,O-di-lower-alkylchlorothiophosphate 失效
    O，O-二低级烷基氯代硫代磷酸酯的制备方法

    公开(公告)号：US4769494A

    公开(公告)日：1988-09-06

    申请号：US11009

    申请日：1987-02-05

    申请人： Motomasa Ohsu ,  Koichi Kamemoto ,  Manabu Yahata ,  Tooru Tokumaru ,  Takeshi Hioki ,  Hiroshi Ueda

    发明人： Motomasa Ohsu ,  Koichi Kamemoto ,  Manabu Yahata ,  Tooru Tokumaru ,  Takeshi Hioki ,  Hiroshi Ueda

    IPC分类号： C07F9/20 ,  C07F9/02

    CPC分类号： C07F9/20

    摘要： A continuous process for producing O,O-di-lower alkylchlorothiophosphate very important as an intermediate for organo-phosphate series agricultural chemicals which comprises continuously reacting phosphorus sulfochloride with a lower alcohol in the presence of caustic soda according to a multi-stage reaction form comprising from 3 to 8 stages in which the following conditions are satisfied:(1) The amounts of caustic soda and a lower alcohol used shall be from 2 to 2.2 moles and 10 moles or more, respectively, based on 1 mole of phosphorus sulfochloride.(2) Caustic soda, water and the lower alcohol shall be used as a caustic soda/water/lower alcohol solution, and besides the caustic soda concentration of the aqueous caustic soda in said solution shall be from 30.0 to 99.5 wt.%.(3) To the 1st reaction stage shall be continuously supplied the whole amount of phosphorus sulfochloride required and from 45 to 85 wt.% each of the amounts of caustic soda and the lower alcohol required; and to the 2nd and subsequent reaction stages shall be continuously supplied the residual caustic soda and lower alcohol in divided portions so that the substantial amounts supplied become successively small toward the final reaction stage.(4) The temperature of the reaction system shall be -5.degree. C. or lower.(5) The residence time in the reaction system shall be within 4 hours.

    摘要翻译： 一种用于生产作为有机磷酸酯系农药的中间体非常重要的O，O-二低级烷基氯硫代磷酸酯的连续方法，其包括在苛性钠存在下，根据多阶段反应形式连续地使磷酰氯与低级醇反应，包括 从3到8个阶段，其中满足以下条件：（1）基于1摩尔磷酰氯，苛性钠和低级醇的用量分别为2至2.2摩尔和10摩尔或更多。 （2）苛性钠，水和低级醇应用作苛性钠/水/低级醇溶液，除了所述溶液中的苛性钠水溶液的苛性钠浓度外还应为30.0至99.5重量％。 （3）向第一反应阶段连续供应所需的全部硫磺磷酸盐和每一种苛性钠和所需的低级醇的45至85重量％; 并且连续向第二和随后的反应阶段连续地供应残留的苛性钠和低级醇，使得所供应的实质量向着最终反应阶段依次小。 （4）反应体系的温度应在-5℃以下。 （5）反应体系中的停留时间应在4小时内。