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公开(公告)号:US20090142916A1
公开(公告)日:2009-06-04
申请号:US11947578
申请日:2007-11-29
申请人: Heike Prenz , Peter Thieme , Peter Lahnor
发明人: Heike Prenz , Peter Thieme , Peter Lahnor
IPC分类号: H01L21/44 , H01B13/00 , B23H3/02 , H01L21/302 , H01L21/306 , C25B9/00
CPC分类号: H01L21/02021 , B24B9/065 , B24B49/00 , H01L21/02024 , H01L22/20
摘要: On aspect is a method to manufacture an integrated circuit including a reshaping process of the wafer edge region and an apparatus to perform the reshaping process.
摘要翻译: 一方面,制造包括晶片边缘区域的重新成形工艺的集成电路的方法以及执行重新成形工艺的装置。