公开(公告)号：US5767948A

公开(公告)日：1998-06-16

申请号：US642010

申请日：1996-05-02

申请人： Erik R. Loopstra ,  Frank B. Sperling ,  Hendricus J.M. Meijer ,  Jan Van Eijk

发明人： Erik R. Loopstra ,  Frank B. Sperling ,  Hendricus J.M. Meijer ,  Jan Van Eijk

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/677 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70833

摘要： A lithographic device includes a machine frame which supports a substrate holder, a focusing system and a mask holder in a vertical direction. The substrate holder is displaceable parallel to a horizontal X-direction and a horizontal Y-direction perpendicular to the X-direction by a first positioning device, and the mask holder is displaceable parallel to the X-direction by a second positioning device. The substrate holder and the mask holder are displaced synchronously parallel to the X-direction during exposure of a semiconductor substrate. The second positioning device is capable of positioning the mask holder also parallel to the Y-direction and of rotating it about a vertical axis of rotation. Therefore, a displacement of the mask holder has a parallelism to the X-direction which is determined by a positioning accuracy of the second positioning device and which is not adversely affected by a deviation from parallelism and straightness of a guide of the second positioning device. An accuracy with which the semiconductor substrate is exposed is improved by a factor corresponding to an optical reduction factor of the focusing system.

摘要翻译： 光刻设备包括在垂直方向上支撑衬底保持器，聚焦系统和掩模保持器的机架。 基板保持器可以通过第一定位装置平行于水平X方向和垂直于X方向的水平Y方向移位，并且掩模保持器可通过第二定位装置平行于X方向移位。 衬底保持器和掩模保持器在半导体衬底的曝光期间与X方向平行地同步移位。 第二定位装置能够将掩模支架定位成平行于Y方向并围绕垂直旋转轴线旋转。 因此，掩模保持架的位移与X方向平行，该X方向由第二定位装置的定位精度确定，并且不受第二定位装置的引导件的平行度和平直度的偏差的不利影响。 通过与聚焦系统的光学降低因子相对应的因子来提高半导体衬底的曝光精度。