公开(公告)号：US5767948A

公开(公告)日：1998-06-16

申请号：US642010

申请日：1996-05-02

申请人： Erik R. Loopstra ,  Frank B. Sperling ,  Hendricus J.M. Meijer ,  Jan Van Eijk

发明人： Erik R. Loopstra ,  Frank B. Sperling ,  Hendricus J.M. Meijer ,  Jan Van Eijk

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/677 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70833

摘要： A lithographic device includes a machine frame which supports a substrate holder, a focusing system and a mask holder in a vertical direction. The substrate holder is displaceable parallel to a horizontal X-direction and a horizontal Y-direction perpendicular to the X-direction by a first positioning device, and the mask holder is displaceable parallel to the X-direction by a second positioning device. The substrate holder and the mask holder are displaced synchronously parallel to the X-direction during exposure of a semiconductor substrate. The second positioning device is capable of positioning the mask holder also parallel to the Y-direction and of rotating it about a vertical axis of rotation. Therefore, a displacement of the mask holder has a parallelism to the X-direction which is determined by a positioning accuracy of the second positioning device and which is not adversely affected by a deviation from parallelism and straightness of a guide of the second positioning device. An accuracy with which the semiconductor substrate is exposed is improved by a factor corresponding to an optical reduction factor of the focusing system.

摘要翻译： 光刻设备包括在垂直方向上支撑衬底保持器，聚焦系统和掩模保持器的机架。 基板保持器可以通过第一定位装置平行于水平X方向和垂直于X方向的水平Y方向移位，并且掩模保持器可通过第二定位装置平行于X方向移位。 衬底保持器和掩模保持器在半导体衬底的曝光期间与X方向平行地同步移位。 第二定位装置能够将掩模支架定位成平行于Y方向并围绕垂直旋转轴线旋转。 因此，掩模保持架的位移与X方向平行，该X方向由第二定位装置的定位精度确定，并且不受第二定位装置的引导件的平行度和平直度的偏差的不利影响。 通过与聚焦系统的光学降低因子相对应的因子来提高半导体衬底的曝光精度。

公开(公告)号：US5953105A

公开(公告)日：1999-09-14

申请号：US776418

申请日：1997-01-30

申请人： Gerard Van Engelen ,  Frank B. Sperling ,  Henricus W. A. Janssen ,  Adianus G. Bouwer ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk ,  Adrianus Van Der Pal

发明人： Gerard Van Engelen ,  Frank B. Sperling ,  Henricus W. A. Janssen ,  Adianus G. Bouwer ,  Cornelis D. Van Dijk ,  Johannes M. M. Van Kimmenade ,  Jan Van Eijk ,  Adrianus Van Der Pal

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/709 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70833 ,  G03F9/70

摘要： A lithographic device comprising a mask table (5), a projection system (3), a substrate table (1) which is displaceable relative to the projection system (3) by means of a drive unit (21), and a measuring system (39) for measuring a position of the substrate table (1) relative to the projection system (3). A stationary part (157) of the drive unit (21) is fastened to a machine frame (85) of the lithographic device, while a stationary part (51, 53, 55) of the measuring system (39) is fastened to a reference frame (89) of the lithographic device which is dynamically isolated from the machine frame (85) by means of dynamic isolators (95). This prevents vibrations caused in the machine frame (85) by reaction forces of the drive unit (21) from being transmitted to the reference frame (89), so that the accuracy of the measuring system (39) is not adversely affected by such vibrations. The mask table (5) is displaceable relative to the projection system (3) by means of a further drive unit (31) having a stationary part (119) fastened to the machine frame (85), and the measuring system comprises a further stationary part (71, 73, 75) for measuring a position of the mask table (5) relative to the projection system (3), said further stationary part (71, 73, 75) being fastened to the reference frame (89).

摘要翻译： PCT No.PCT / IB96 / 00383 Sec。 371日期1997年1月30日 102（e）1997年1月30日PCT PCT 1996年4月29日PCT公布。 出版物WO96 / 38765 日期1996年12月5日一种光刻设备，包括一个掩模台（5），一个投影系统（3），一个通过驱动单元（21）可相对于投影系统（3）移位的衬底台（1） 以及用于测量所述基板台（1）相对于所述投影系统（3）的位置的测量系统（39）。 驱动单元（21）的固定部分（157）被紧固到平版印刷装置的机架（85）上，而测量系统（39）的固定部分（51,53,55）被固定到参考 通过动态隔离器（95）与机架（85）动态隔离的光刻设备的框架（89）。 这防止由驱动单元（21）的反作用力引起的机架（85）的振动传递到参考框架（89），使得测量系统（39）的精度不受这种振动的不利影响 。 掩模台（5）可通过具有固定在机架（85）上的固定部分（119）的另外的驱动单元（31）相对于投影系统（3）移动，并且测量系统包括另外的固定 用于测量掩模台（5）相对于投影系统（3）的位置的部分（71,73,75），所述另外的固定部分（71,73,75）紧固到参考框架（89）。

公开(公告)号：US6054784A

公开(公告)日：2000-04-25

申请号：US103734

申请日：1998-06-24

申请人： Frank B. Sperling ,  Erik R. Loopstra ,  Antonius T. A. Peijnenburg

发明人： Frank B. Sperling ,  Erik R. Loopstra ,  Antonius T. A. Peijnenburg

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H02K41/00 ,  A47B85/00 ,  G05G11/00

CPC分类号： G03F7/70716 ,  Y10T74/20341

摘要： A positioning device is disclosed. The positioning device has a first part and a second part, the second part further has an object table. The second part may be displaced relative to the first part parallel to the XY-plane and may be rotated about the Z-axis by means of three motors. The motors are Lorentz type motors having a permanent magnet system and an electrical coil system cooperating therewith. The electrical coil systems each have windings which are substantially directed parallel to a main axis of the electrical coil system and perpendicular to the Z-axis. According to the invention, the main axis of each of the three motors encloses an angle of substantially 120.degree. with the main axis of each of the two other motors. In this manner, the points of application on the second part of the driving forces of the three motors are uniformly distributed relative to the second part, so that the driving forces can be uniformly transmitted to the object table by means of a relatively light and simple stiffening structure of the second part. In a particular embodiment of the positioning device, the main axes of the three motors are mutually arranged in a star-shaped configuration. In a second embodiment the main axes of the three motors are mutually arranged in a triangular configuration. The positioning device is used in a lithographic projection apparatus according to the invention for displacing a substrate table of the lithographic device relative to a focusing unit of the lithographic projection apparatus.

摘要翻译： 公开了一种定位装置。 定位装置具有第一部分和第二部分，第二部分还具有物体台。 第二部分可以相对于平行于XY平面的第一部分移位，并且可以通过三个马达围绕Z轴旋转。 电动机是具有永久磁铁系统和与其配合的电线圈系统的洛伦兹型电动机。 电线圈系统各自具有基本上定向为平行于电线圈系统的主轴线并且垂直于Z轴的绕组。 根据本发明，三个电动机中的每一个的主轴围绕两个其它电动机的主轴线约120度的角度。 以这种方式，三个电动机的驱动力的第二部分上的施加点相对于第二部分均匀分布，使得驱动力可以通过相对较轻且简单的方式均匀地传递到物体台 第二部分的加强结构。 在定位装置的特定实施例中，三个电动机的主轴相互排列成星形。 在第二实施例中，三个电动机的主轴相互排列成三角形。 定位装置用于根据本发明的光刻投影装置中，用于使光刻设备的衬底台相对于光刻投影装置的聚焦单元移位。

公开(公告)号：US5815246A

公开(公告)日：1998-09-29

申请号：US878362

申请日：1997-06-18

申请人： Frank B. Sperling ,  Henricus W. A. Janssen

发明人： Frank B. Sperling ,  Henricus W. A. Janssen

IPC分类号： B23Q1/62 ,  B23Q11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G03B27/42 ,  G03B27/53

CPC分类号： G03F7/70766 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/709 ,  H01L21/682

摘要： A positioning device with a base and a displaceable unit which is displaceable relative to the base parallel to an X-direction and parallel to a Y-direction by means of an X-actuator and a Y-actuator. The X-actuator and the Y-actuator each have a first part which is coupled to the displaceable unit, seen parallel to the X-direction and Y-direction, respectively, and a second part which is coupled to a common balancing unit, seen parallel to the X-direction and the Y-direction, respectively, which balancing unit is displaceably guided parallel to the X-direction and to the Y-direction along a guide which extends parallel to the X-direction and the Y-direction and which is fastened to the base. During operation the first parts of the X-actuator and the Y-actuator exert on the second parts reaction forces which are directed parallel to the X-direction and to the Y-direction, respectively, whereby the common balancing unit is displaced parallel to the X-direction and the Y-direction, respectively. It is prevented thereby that the reaction forces are transmitted into the base, so that mechanical vibrations of the base are reduced. In a special embodiment, the balancing unit comprises a support body which comprises a surface which extends parallel to the X-direction and the Y-direction and along which the displaceable unit is guided. The positioning device can be used for the displacement and positioning of a substrate holder in a lithographic device for the manufacture of semiconductor substrates.

摘要翻译： 一种具有基座和位移单元的定位装置，其可通过X致动器和Y致动器平行于X方向并平行于Y方向相对于基座移动。 X致动器和Y致动器各自具有分别与可移动单元耦合的第一部分，分别与X方向和Y方向平行，以及耦合到公共平衡单元的第二部分，见 平行于X方向和Y方向分别平行于X方向和Y方向的平行单元沿着与X方向和Y方向平行延伸的引导部可移动地引导， 被固定在基座上。 在操作期间，X致动器和Y致动器的第一部分分别对与X方向和Y方向平行的第二部分反作用力施加，从而共用平衡单元平行于 X方向和Y方向。 因此防止反作用力传递到基座中，从而减小基座的机械振动。 在一个特殊的实施例中，平衡单元包括支撑体，该支撑体包括平行于X方向和Y方向延伸的表面，可移动单元沿着该表面被引导。 定位装置可以用于基板保持器在用于制造半导体基板的光刻装置中的位移和定位。

公开(公告)号：US5456134A

公开(公告)日：1995-10-10

申请号：US106153

申请日：1993-08-12

申请人： Adrianus G. Bouwer ,  Frank B. Sperling

发明人： Adrianus G. Bouwer ,  Frank B. Sperling

IPC分类号： B23Q1/62 ,  F16H25/20 ,  G03F7/20 ,  H02K49/00 ,  H02K49/10 ,  F16H25/24 ,  G05G11/00

CPC分类号： H02K49/102 ,  B23Q1/621 ,  F16H25/24 ,  G03F7/70716 ,  F16H2025/2075 ,  Y10S74/04 ,  Y10T74/18568 ,  Y10T74/19712 ,  Y10T74/20354

摘要： A transmission mechanism for converting a rotary movement into a translatory movement includes an internal and an external coupling member which have cooperating double thread systems made of a magnetizable material. The external coupling member includes a series of permanent magnets which are polarized in an axial direction and are provided at regular intervals between the individual threads of the thread system so that the individual threads each form a common pole shoe for the permanent magnets providing a maximum magnetic flux density along the portion of the thread system containing the permanent magnets. The presence of a non-magnetizable material between the threads provides that the mutually facing walls of the coupling members are smooth, and a static gas bearing can be applied between these walls. A suitable application of the transmission mechanism is in a positioning device which in turn is eminently suitable for use in an optical lithographic device for the manufacture of semiconductor substrates.

摘要翻译： 用于将旋转运动转换成平移运动的传动机构包括具有由可磁化材料制成的协作双线系统的内部和外部联接构件。 外部耦合构件包括一系列在轴向上被偏振并且以规则间隔设置在螺纹系统的各个螺纹之间的永磁体，使得各个螺纹各自形成用于永磁体的公共极靴，从而提供最大磁 沿着包含永磁体的螺纹系统的部分的通量密度。 在螺纹之间存在不可磁化的材料使得联接构件的相互面对的壁是平滑的，并且可以在这些壁之间施加静态气体轴承。 传输机构的合适应用在定位装置中，该定位装置又优选地适用于用于制造半导体衬底的光学光刻装置。