公开(公告)号：US20120021288A1

公开(公告)日：2012-01-26

申请号：US13146000

申请日：2010-01-21

申请人： Kyu Ho Song ,  Soo Yong Han ,  Ho Seong Nam ,  Eui Yong Bang ,  Se Jin Oh ,  In Jae Baek ,  So Yeon Kim ,  Kyoo Seung Han

发明人： Kyu Ho Song ,  Soo Yong Han ,  Ho Seong Nam ,  Eui Yong Bang ,  Se Jin Oh ,  In Jae Baek ,  So Yeon Kim ,  Kyoo Seung Han

IPC分类号： H01M4/38 ,  H01M4/485 ,  H01M4/505 ,  H01M4/525

CPC分类号： H01M4/5825 ,  C01B25/45 ,  C04B35/447 ,  C04B35/62695 ,  C04B2235/3203 ,  C04B2235/3272 ,  C04B2235/79 ,  H01M4/136 ,  H01M10/052

摘要： The invention provides an anion-deficient lithium transition-metal phosphate as an electrode-active material, which is represented by the chemical formula Li1−xM(PO4)1−y (0≦x≦0.15, 0≦y≦0.05). The invention provides a method for preparing said Li1−xM(PO4)1−y, which comprises preparing a precursor of lithium transition-metal phosphate; mixing said precursor with water under reaction conditions of 200˜700 and 180˜550 bar to produce an anion-deficient lithium transition-metal phosphate; and calcining, or granulating and calcining the resultant compound. The invention also provides electrochemical devices employing said Li1−xM(PO4)1−y as an electrode-active material.

摘要翻译： 本发明提供一种阴离子缺陷型锂过渡金属磷酸盐作为电极活性材料，由化学式Li1-xM（PO4）1-y（0＆nlE; x＆nlE; 0.15,0和nlE; y＆nlE; 0.05）表示。 本发明提供了制备所述Li1-xM（PO4）1-y的方法，该方法包括制备过渡金属磷酸锂的前体; 在200〜700和150〜550巴的反应条件下将所述前体与水混合以产生阴离子缺乏的锂过渡金属磷酸盐; 并煅烧或造粒和煅烧所得化合物。 本发明还提供使用所述Li1-xM（PO4）1-y作为电极活性材料的电化学装置。

公开(公告)号：US06835468B2

公开(公告)日：2004-12-28

申请号：US09947208

申请日：2001-09-04

申请人： Hyun Nam Cho ,  Young Chul Kim ,  Jae-Min Hong ,  Jong-Bok Kim ,  Doo Kyung Moon ,  Young Sei Park ,  Ho Seong Nam

发明人： Hyun Nam Cho ,  Young Chul Kim ,  Jae-Min Hong ,  Jong-Bok Kim ,  Doo Kyung Moon ,  Young Sei Park ,  Ho Seong Nam

IPC分类号： H05B3314

CPC分类号： H01L51/0043 ,  C08G61/02 ,  C08L65/00 ,  C09K11/06 ,  H01L51/0035 ,  H01L51/0038 ,  H01L51/0039 ,  Y10S428/917

摘要： A fluorene-based polymer of the following Formula (I) and electroluminescent devices using the same. wherein, R1, R2, R3 and R4 are same or different and represent hydrogen, aliphatic or alicyclic alkyl or alkoxy groups containing 1 to 22 carbon atoms, aryl or aryloxy group containing 6 to 18 carbon atoms, cyano, cyanoethyl, or an alkyl or aryl derivative of silicon, tin or germanium; X represents diacetylene, diethynyl aryl, divinylaryl group or a single bond; and n is an integer equal to or greater than 1.

摘要翻译： 下述式（I）的芴系聚合物和使用其的电致发光元件，其中R1，R2，R3和R4相同或不同，代表氢，含有1至22个碳原子的脂族或脂环族烷基或烷氧基， 含有6〜18个碳原子的芳基或芳氧基，氰基，氰基乙基或硅，锡或锗的烷基或芳基衍生物; X表示乙炔基，二乙炔基芳基，二乙烯基芳基或单键; n为1以上的整数。

公开(公告)号：US20070220813A1

公开(公告)日：2007-09-27

申请号：US10594537

申请日：2005-03-24

申请人： Ho-Seong Nam ,  Jin-Seo Lee ,  Gui-Ryong Ahn

发明人： Ho-Seong Nam ,  Jin-Seo Lee ,  Gui-Ryong Ahn

IPC分类号： C09G1/02

CPC分类号： H01L21/31053 ,  C09G1/02

摘要： The present invention is related to a chemical-mechanical polishing slurry for shallow trench isolation, more concretely, to a chemical-mechanical polishing slurry comprising an aqueous abrasive solution comprised of deionized water, polishing particles, and a polishing particle dispersant; and an aqueous additive solution comprised of a carboxylic acid polymer compound, a nitrogen-containing organic cyclic compound, and an amine-group compound. The removal selectivity of the slurry may be improved by significantly lowering the speed of polishing of nitride film by adding a nitrogen-containing organic cyclic compound to an acrylic acid polymer compound, and by increasing the speed of removal of silicon oxide film by adding an amine-group compound, which is an accelerator of hydrolysis of silicon oxide film.

摘要翻译： 本发明涉及用于浅沟槽隔离的化学机械抛光浆料，更具体地涉及包含由去离子水，抛光颗粒和抛光颗粒分散剂组成的含水磨料溶液的化学机械抛光浆料。 和由羧酸高分子化合物，含氮有机环状化合物和胺基化合物组成的添加剂水溶液。 通过向丙烯酸类高分子化合物中添加含氮有机环状化合物，通过添加胺来提高氧化硅膜的除去速度，可以显着降低氮化膜的研磨速度，从而提高浆料的除去选择性 - 基团化合物，其是氧化硅膜的水解促进剂。

公开(公告)号：US07497966B2

公开(公告)日：2009-03-03

申请号：US10594537

申请日：2005-03-24

申请人： Ho-Seong Nam ,  Jin-Seo Lee ,  Gui-Ryong Ahn

发明人： Ho-Seong Nam ,  Jin-Seo Lee ,  Gui-Ryong Ahn

IPC分类号： C09K13/00

CPC分类号： H01L21/31053 ,  C09G1/02

摘要： The present invention is related to a chemical-mechanical polishing slurry for shallow trench isolation, more concretely, to a chemical-mechanical polishing slurry comprising an aqueous abrasive solution comprised of deionized water, polishing particles, and a polishing particle dispersant; and an aqueous additive solution comprised of a carboxylic acid polymer compound, a nitrogen-containing organic cyclic compound, and an amine-group compound. The removal selectivity of the slurry may be improved by significantly lowering the speed of polishing of nitride film by adding a nitrogen-containing organic cyclic compound to an acrylic acid polymer compound, and by increasing the speed of removal of silicon oxide film by adding an amine-group compound, which is an accelerator of hydrolysis of silicon oxide film.

摘要翻译： 本发明涉及用于浅沟槽隔离的化学机械抛光浆料，更具体地涉及包含由去离子水，抛光颗粒和抛光颗粒分散剂组成的含水磨料溶液的化学机械抛光浆料。 和由羧酸高分子化合物，含氮有机环状化合物和胺基化合物组成的添加剂水溶液。 通过向丙烯酸类高分子化合物中添加含氮有机环状化合物，通过添加胺来提高氧化硅膜的除去速度，可以显着降低氮化膜的研磨速度，从而提高浆料的除去选择性 - 基团化合物，其是氧化硅膜的水解促进剂。