公开(公告)号：US09304400B2

公开(公告)日：2016-04-05

申请号：US13038453

申请日：2011-03-02

申请人： Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

发明人： Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

IPC分类号： G03B27/54 ,  G03F7/20 ,  G02B17/06 ,  G02B27/00

CPC分类号： G03F7/70083 ,  G02B17/0605 ,  G02B17/0647 ,  G02B27/0043 ,  G03F7/70033 ,  G03F7/70075

摘要： An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.

摘要翻译： 用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。 照明系统的照明光学器件用于将来自光源的照明光引导到物场。 照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。 其结果是改善了物场照明的均匀性的照明系统。

公开(公告)号：US06642525B2

公开(公告)日：2003-11-04

申请号：US09949193

申请日：2001-09-07

申请人： Oliver Kienzle ,  Holger Weigand

发明人： Oliver Kienzle ,  Holger Weigand

IPC分类号： H01J3700

CPC分类号： H01J37/3007 ,  H01J37/1474 ,  H01J2237/3175

摘要： A magnetic lens assembly for providing a magnetic deflection field for a beam of charged particles is disclosed. The assembly includes a focusing lens device for providing a magnetic field which has substantially rotational symmetry in respect of a symmetry axis of the assembly and acts on the beam traversing the magnetic field as a focusing lens with an optical axis, and includes an axis shifting device for producing a corrective magnetic field which is superposable on the magnetic field provided by the focusing lens device and acts on the beam such that the optical axis is shiftable parallel to the symmetry axis of the assembly. The axis shifting device includes a first set of axially spaced apart rings which are positioned concentrically in respect of the symmetry axis and are made of a material which is substantially not electrically conductive and has a high magnetic permeability. At least one axis shifting coil is provided with a plurality of current conductor windings for producing the corrective magnetic field. The current conductor windings of the axis shifting coil engage around at least one of the rings of the first ring set.

公开(公告)号：US20110177463A1

公开(公告)日：2011-07-21

申请号：US13038453

申请日：2011-03-02

申请人： Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

发明人： Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70083 ,  G02B17/0605 ,  G02B17/0647 ,  G02B27/0043 ,  G03F7/70033 ,  G03F7/70075

摘要： An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.

摘要翻译： 用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。 照明系统的照明光学器件用于将来自光源的照明光引导到物场。 照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。 其结果是改善了物场照明的均匀性的照明系统。