摘要:
Disclosed herein is an apparatus for continuously producing and pelletizing gas hydrates. The apparatus includes a gas supply unit, a water supply unit and a reactor. Gas and water are respectively supplied from the gas supply unit and the water supply unit into the reactor. The gas and water react with each other in the reactor. The reactor includes a dual cylinder unit which forms a gas hydrate in such a way as to squeeze a slurry of reaction water formed by the reaction between the gas and water. The dual cylinder unit includes an upper cylinder, a lower cylinder and a connection pipe which connects the upper cylinder to the lower cylinder. The connection pipe has passing holes through which the reaction water in the reactor flows into and out of the connection pipe.
摘要:
The present invention relates to a chemical mechanical polishing (CMP) pad with a micro-mold, and a production method thereof. More particularly, the present invention relates to a CMP pad with a micro-mold, in which the surface of the CMP pad is uniformly formed so as to avoid the glazing of the polishing pad, prevent a change in slurry flow and maintain the contact area between the polishing pad and a semiconductor wafer constant, thus allowing the wafer to be polished in a continuous and stable manner, and permitting the semiconductor wafer to be polished into the desired shape, as well as a production method thereof.
摘要:
Disclosed herein is an apparatus for continuously producing and pelletizing gas hydrates. The apparatus includes a gas supply unit, a water supply unit and a reactor. Gas and water are respectively supplied from the gas supply unit and the water supply unit into the reactor. The gas and water react with each other in the reactor. The reactor includes a dual cylinder unit which forms a gas hydrate in such a way as to squeeze a slurry of reaction water formed by the reaction between the gas and water. The dual cylinder unit includes an upper cylinder, a lower cylinder and a connection pipe which connects the upper cylinder to the lower cylinder. The connection pipe has passing holes through which the reaction water in the reactor flows into and out of the connection pipe.