公开(公告)号：US4759958A

公开(公告)日：1988-07-26

申请号：US76764

申请日：1987-07-23

申请人： Shunichi Numata ,  Ikeda Takayoshi ,  Koji Fujisaki ,  Takao Miwa ,  Noriyuki Kinjo

发明人： Shunichi Numata ,  Ikeda Takayoshi ,  Koji Fujisaki ,  Takao Miwa ,  Noriyuki Kinjo

IPC分类号： B32B27/34 ,  B05D7/24 ,  C08G73/10 ,  C23C14/12 ,  C23C14/24 ,  H01L21/312 ,  C23C16/00

CPC分类号： B05D1/60 ,  H01L21/312

摘要： A method for forming a polyimide film on a substrate surface by chemical vapor deposition comprises evaporating an aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group, such as esters of 4-amino phthalic acid, and 4-(p-anilino) phthalic acid, thus a high strength polyimide is obtained represented by the general formula having its imide groups being unidirectionally arranged in its backbone chain: ##STR1## wherein R is nil or divalent aliphatic or aromatic group and n is an integer.

摘要翻译： 通过化学气相沉积在基板表面上形成聚酰亚胺膜的方法包括蒸发具有一个氨基和两个相邻羧基或其衍生基团的芳族单体化合物，例如4-氨基邻苯二甲酸的酯和4-（p - 苯胺基）邻苯二甲酸，因此由其酰亚胺基团单向排列在其主链中的通式表示的高强度聚酰亚胺：其中R为零或二价脂族或芳族基团，n为整数。